• Korean Journal of Materials Research
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• v.33 no.11
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• pp.491-496
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• 2023

As the demand for p-type semiconductors increases, much effort is being put into developing new p-type materials. This demand has led to the development of novel new p-type semiconductors that go beyond existing p-type semiconductors. Copper iodide (CuI) has recently received much attention due to its wide band gap, excellent optical and electrical properties, and low temperature synthesis. However, there are limits to its use as a semiconductor material for thin film transistor devices due to the uncontrolled generation of copper vacancies and excessive hole doping. In this work, p-type CuI semiconductors were fabricated using the chemical vapor deposition (CVD) process for thin-film transistor (TFT) applications. The vacuum process has advantages over conventional solution processes, including conformal coating, large area uniformity, easy thickness control and so on. CuI thin films were fabricated at various deposition temperatures from 150 to 250 ℃ The surface roughness root mean square (RMS) value, which is related to carrier transport, decreases with increasing deposition temperature. Hall effect measurements showed that all fabricated CuI films had p-type behavior and that the Hall mobility decreased with increasing deposition temperature. The CuI TFTs showed no clear on/off because of the high concentration of carriers. By adopting a Zn capping layer, carrier concentrations decreased, leading to clear on and off behavior. Finally, stability tests of the PBS and NBS showed a threshold voltage shift within ±1 V.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.14-15
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• 2007

Proton irradiation technology was used for improvement of switching characteristics of the PT-IGBT. The proton irradiation was carried out at 5.56 MeV energy from the back side of processed wafers and at 2.39 MeV energy from the front side of the wafers. The on-state and off-state I-V characteristics and switching properties of the device were analyzed and compared with those of un-irradiated device and e-beam irradiated device which was conventional method for minority carrier lifetime reduction. The proton irradiated device by 5.56 MeV energy was superior to e-beam irradiated device for the on-state and off-state I-V characteristics, nevertheless turn-off time of proton irradiated device was superior to that of the e-beam irradiated device.

• Journal of information and communication convergence engineering
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• v.5 no.2
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• pp.116-120
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• 2007

In this paper, the image sensor using the a-Si:H TFT is proposed. The optimum amorphous silicon thin film is deposited using plasma enhanced chemical vapor deposition (PECVD). TFT and photodiode both with the thin film are fabricated and form image sensor. The photodiode shows that $I_{dark}\;is\;{\sim}10^{-13}\;A,\;I_{photo}\;is\;{\sim}10^{-9}\;A\;and\;I_{photo}/I_{dark}\;is\;{\sim}10^4$, respectively. In the case of a-Si:H TFT, it indicates that $I_{on}/I_{off}\;is\;10^6$, the drain current is a few ${\mu}A\;and\;V_{th}\;is\;2{\sim}4$ volts. For the analysis on the fabricated image sensor, the reverse bias of -5 volts in ITO of photodiode and $70 {\mu}sec$ pulse in the gate of TFT are applied. The image sensor with good property was conformed through the measured photo/dark current.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.04a
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• pp.26-26
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• 2007

ALD는 저온 증착과 대면적에의 증착 균일도에 있어 디스플레이 소자의 제조에 유용한 특성을 지니고 있다. ZnO TFT는 차세대 디스플레이의 구동 소자의 한 후보로, 본 연구에서는 기존의 다른 연구와는 달리 ALD를 이용한 ZnO TFT의 제조에 관해 연구하였다. ZnO를 sputtering과 ALD 두가지 방법으로 증착하여 각각의 물성 및 전기적 특성 연구를 진행하였다. ALD ZnO의 경우 TEZ와 물을 이용한 증착방법으로는 높은 캐리어 농도로 인해 TFT에의 적용이 어려웠으므로 질소 도핑을 통해 캐리어 농도를 조절하여 소자 특성을 확보할 수 있었다. 이 경우 $I_{off}$, $I_{on}/I_{off}$, mobility, sub-threadshold swing 등과 같은 특성이 매우 향상됨을 확인하였다.

• Proceedings of the IEEK Conference
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• 1999.06a
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• pp.773-776
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• 1999

For providing good quality power steadily, it is required that operators manipulate the control system of power plant with the good knowledge of power plant system and the control strategies, and cope with accidents effectively. With those requirements, it is general to train operators in power plant control room using full-scope simulator. A full scope simulator adopts the I&C instruments in the main cotrol room, so has to include I/O interface system to interface the simulation computer with I&C instruments in main control room. In already developed simulators, most of I/O interface systems are closed. vendor-dependent. proprietary systems. so have the many disadvantages in terms of cost and maintenance. In this paper. we suggest the method to configure I/O interface system for Thermal Power Plant Simulator based on standard technology which gives the advantages of ease-of-use. cost effectiveness, and simplicity of maintenanceuse by using off-the-shelf products for system integration.

• Korean Journal of Optics and Photonics
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• v.8 no.6
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• pp.500-505
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• 1997

Experimental amorphous photodiode is fabricated on CMOS IC using a-Si:H p-i-n structure. Amorphous photodiode is scuccessfully integrated on CMOS IC using amorphous Si produced by PECVD system. The PECVD system can deposit a-Si:H at low temperature so that photodiode can be integrated with CMOS IC structure without any process incompatibility. The fabricated amorphous photodiode has a breakdown voltage of below -20 V, a leakage current of about 1 $\mu\textrm{A}$, and turn-on voltage of 0.6~0.8 V. It is demonstrated that the photocurrent of optical signal can be turned on and off by a small voltage and the fabricated amorphous p-i-n photodiode can be used as an optical switch.

• Proceedings of the KIEE Conference
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• 2009.07a
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• pp.1336_1337
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• 2009

본 논문에서는 유기 박막 트랜지스터의 전극을 잉크젯 프린팅과 스크린 프린팅 방법을 이용하여 유기 박막 트랜지스터를 제작하였다. 전극으로 PEDOT:PSS와 Ag 잉크를 사용하였고, 게이트 절연막으로 polymethyl methacrylate (PMMA)와 poly(4-vinylphenol) (PVP)를 사용하였다. 유기물 활성층으로 pentacene을 진공 증착하였다. 잉크젯 프린팅 방법을 이용하여 제작한 유기 박막 트랜지스터는 전계이동도 (${\mu}_{FET}$) $0.068\;cm^2$/Vs, 문턱전압 ($V_{th}$) -15 V, 전류 점멸비 ($I_{on}/I_{off}$ current ratio) >$10^4$의 전기적 특성을 보였고, 스크린 인쇄 방법을 이용하여 제작한 유기 박막 트랜지스터는 전계이동도 (${\mu}_{FET}$) $0.016\;cm^2$/Vs, 문턱전압 ($V_{th}$) 6 V, 전류 점멸비 ($I_{on}/I_{off}$ current ratio) >$10^4$의 전기적 특성을 보였다. 이를 통하여 프린팅 방법을 이용한 유기 박막 트랜지스터 단일 소자 및 유기 전자 회로 제작의 가능성을 확인 하였다.

• Journal of IKEEE
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• v.21 no.2
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• pp.146-149
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• 2017

In this paper, we propose a wide-range radiation measurement system using GM Tube and NaI(TI) detector. The proposed system is designed as a small module optimized to control and count the detector signal of NaI(Tl) Detector and GM Tube. The radiation dose is measured in a wide-range 0.1uSv/h to 10mSv/h in conjunction with two detectors, and two detectors operate simultaneously at 10uSv/h to 100uSv/h, where the measurement interval overlaps. The radiation dose was selected using a wide-range radiation measurement algorithm that controls the on/off function of the detector in the appropriate interval for the overlapped radiation measurable interval. In order to evaluate the performance of the proposed system, it has been confirmed that the measurement uncertainty of each section is measured as ${\pm}7.5%$ and it operates normally under ${\pm}15%$ of the international standard.

• Journal of Navigation and Port Research
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• v.34 no.2
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• pp.117-122
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• 2010

Since fuzzy controllers are nonlinear, it is more difficult to set the controller gains and to analyse the stability compared to conventional PID controllers. This paper proposes a fuzzy PD+I controller for tracking control which uses a linear fuzzy inference(product-sum-gravity) method based on a conventional linear PID controller. In this scheme the fuzzy PD+I controller works similar to the control performance as the linear PD plus I(PD+I) controller. Thus it is possible to analyse and design an fuzzy PD+I controller for given systems based on a linear fuzzy PD controller. The scaling factors tuning scheme, another topic of fuzzy controller design procedure, is also introduced in order to fine performance of the fuzzy PD+I controller. The scaling factors are adjusted by a real-coded genetic algorithm(RCGA) in off-line. The simulation results show the effectiveness of the proposed fuzzy PD+I controller for tracking control problems by comparing with the conventional PID controllers.

• Journal of the Institute of Electronics and Information Engineers
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• v.53 no.5
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• pp.69-76
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• 2016

Current driving capability of MCT (MOS Controlled Thyristor) is determined by turn-off capability of conducting current, that is off-FET performance of MCT. On the other hand, having a good turn-on characteristics, including high peak anode current ($I_{peak}$) and rate of change of current (di/dt), is essential for pulsed power system which is one of major application field of MCTs. To satisfy above two requirements, careful control of on/off-FET performance is required. However, triple diffusion and several oxidation processes change surface doping profile and make it hard to control threshold voltage ($V_{th}$) of on/off-FET. In this paper, we have demonstrated the effect of $V_{th}$ adjustment ion implantation on the performance of MCT. The fabricated MCTs (active area = $0.465mm^2$) show forward voltage drop ($V_F$) of 1.25 V at $100A/cm^2$ and Ipeak of 290 A and di/dt of $5.8kA/{\mu}s$ at $V_A=800V$. While these characteristics are unaltered by $V_{th}$ adjustment ion implantation, the turn-off gate voltage is reduced from -3.5 V to -1.6 V for conducting current of $100A/cm^2$ when the $V_{th}$ adjustment ion implantation is carried out. This demonstrates that the current driving capability is enhanced without degradation of forward conduction and turn-on switching characteristics.