• 한국표면공학회지
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• 제55권1호
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• pp.24-31
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• 2022

This study investigated the effect of pre-treatment on the PEO film formation of AZ91 Mg alloy. The pre-treatment was conducted for 10 min at room temperature in 0.5 M oxalic acid (C₂H₂O₄) solution containing various ammonium fluoride (NH₄F) concentrations. The pre-treated AZ91 Mg specimens were anodized at 100 mA/cm² of 300 Hz AC for 2 min in 0.1 M NaOH + 0.4 M Na₂SiO₃ solution. When AZ91 Mg alloy was pretreated in 0.5 M oxalic acid with NH₄F concentration less than 0.3 M, continuous dissolution of the AZ91 Mg alloy occurred together with the formation of black smuts and arc initiation time for PEO film formation was very late. It was noticed that corrosion rate of the AZ91 Mg alloy became faster if small amount of NH₄F concentration, 0.1 M, is added. The fast corrosion is attributable to fast formation of porous fluoride together with porous oxides in the reaction products. On the other hand, when AZ91 Mg alloy was pretreated in 0.5 M oxalic acid with sufficient NH₄F more than 0.3 M, a thin and dense protective film was formed on the AZ91 Mg alloy surface which resulted in faster initiation of arcs and formation of PEO film.

• 한국진공학회지
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• 제17권6호
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• pp.528-537
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• 2008

ICP-CVD를 사용하여 수소화된 비정질 실리콘(a-Si:H)을 60 nm 또는 20 nm 두께로 성막 시키고, 그 위에 전자총증착장치(e-beam evaporator)를 이용하여 30 nm Ni 증착 후, 최종적으로 30 nm Ni/(60 또는 20 nm a-Si:H)/200 nm $SiO_2$/single-Si 구조의 시편을 만들고 $200{\sim}500^{\circ}C$ 사이에서 $50^{\circ}C$간격으로 40초간 진공열처리를 실시하여 실리사이드화 처리하였다. 완성된 니켈실리사이드의 처리온도에 따른 면저항값, 상구조, 미세구조, 표면조도 변화를 각각 사점면저항측정기, HRXRD, FE-SEM과 TEM, SPM을 활용하여 확인하였다. 60 nm a-Si:H 기판 위에 생성된 니켈실리사이드는 $400^{\circ}C$이후부터 저온공정이 가능한 면저항값을 보였다. 반면 20 nm a-Si:H 기판 위에 생성된 니켈실리사이드는 $300^{\circ}C$이후부터 저온공정이 가능한 면저항값을 보였다. HRXRD 결과 60 nm 와 20 nm a-Si:H 기판 위에 생성된 니켈실리사이드는 열처리온도에 따라서 동일한 상변화를 보였다. FE-SEM과 TEM 관찰결과, 60 nm a-Si:H 기판 위에 생성된 니켈실리사이드는 저온에서 고저항의 미반응 실리콘이 잔류하고 60 nm 두께의 니켈실리사이드를 가지는 미세구조를 보였다. 20 nm a-Si:H 기판위에 형성되는 니켈실리사이드는 20 nm 두께의 균일한 결정질 실리사이드가 생성됨을 확인하였다. SPM 결과 모든 시편은 열처리온도가 증가하면서 RMS값이 증가하였고 특히 20 nm a-Si:H 기판 위에 생성된 니켈실리사이드는 $300^{\circ}C$에서 0.75 nm의 가장 낮은 RMS 값을 보였다.

• 한국재료학회지
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• 제21권7호
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• pp.384-390
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• 2011

Ti-6Al-4V ELI (Extra Low Interstitial) alloy has been widely used as an alternative to bone due to its excellent biocompatibility. However, it still has many problems, including a high elastic modulus and toxicity. Therefore, nontoxic biomaterials with a low elastic modulus should be developed. However, the fabrication of a uniform coating is challenging. Moreover, the coating layer on Ti and Ti alloy substrates can be peeled off after implantation. To overcome these problems, it is necessary to produce bulk Ti and Ti alloy with hydroxyapatite (HA) composites. In this study, Ti, Nb, and Zr powders, which are biocompatible elements, were milled in a mixing machine (24h) and by planetary mechanical ball milling (1h, 4h, and 6h), respectively. Ti-35%Nb-7%Zr and Ti-35%Nb-7%Zr-10%HA composites were fabricated by spark plasma sintering (SPS) at $1000^{\circ}C$ under 70MPa using mixed and milled powders. The effects of HA addition and milling time on the biocompatibility and physical and mechanical properties of the Ti-35%Nb-7%Zr-(10%HA) alloys have been investigated. $Ti_2O$, CaO, $CaTiO_3$, and $Ti_xP_y$ phases were formed by chemical reaction during sintering. Vickers hardness of the sintered composites increases with increased milling time and by the addition of HA. The biocompatibilty of the HA added Ti-Nb-Zr alloys was improved, but the sintering ability was decreased.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2016년도 추계학술대회 논문집
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• pp.199-199
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• 2016

Commercially pure titanium (cp-Ti) and Ti alloys (typically Ti-6Al-4V) display excellent corrosion resistance and biocompatibility. Although the chemical composition and topography are considered important, the mechanical properties of the material and the loading conditions in the host have, conventionally. Ti and its alloys are not bioactive. Therefore, they do not chemically bond to the bone, whereas they physically bond with bone tissue. The electrochemical deposition process provides an effective surface for biocompatibility because large surface area can be served to cell proliferation. Electrochemical deposition method is an attractive technique for the deposition of hydroxyapatite (HAp). However, the adhesions of these coatings to the Ti surface needs to be improved for clinical used. Plasma electrolyte oxidation (PEO) enables control in the chemical com position, porous structure, and thickness of the $TiO_2$ layer on Ti surface. In addition, previous studies h ave concluded that the presence of $Ca^{+2}$ and ${PO_4}^{3-}$ ion coating on porous $TiO_2$ surface induced adhesion strength between HAp and Ti surface during electrochemical deposition. Silicon (Si) in particular has been found to be essential for normal bone and cartilage growth and development. Zinc (Zn) plays very important roles in bone formation and immune system regulation, and is also the most abundant trace element in bone. The objective of this work was to study electrochemical characteristcs of Zn and Si coating on Ti-6Al-4V by PEO treatment. The coating process involves two steps: 1) formation of porous $TiO_2$ on Ti-6Al-4V at high potential. A pulsed DC power supply was employed. 2) Electrochemical tests were carried out using potentiodynamic and AC impedance methoeds. The morphology, the chemical composition, and the micro-structure an alysis of the sample were examined using FE-SEM, EDS, and XRD. The enhancements of the HAp forming ability arise from $Si/Zn-TiO_2$ surface, which has formed the reduction of the Si/Zn ions. The promising results successfully demonstrate the immense potential of $Si/Zn-TiO_2$ coatings in dental and biomaterials applications.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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• pp.99-99
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• 1999

투명전도막인 Ito(Indium Tin Oxide)는 flat panel display 와 solar cell 같은 optoelectronic 이나 microelectronic device에서 널리 이용되어 지고 있다. 현재 상용화되고 있는 거의 대부분의 ITO 박막은 sputtering법에 의해 제조되고 있으나 공정상의 이유로 15$0^{\circ}C$이상의 기판온도가 요구되어진다. 그런, 실제 display device 제조공정에서는 비정질 실리콘 박막이나 유기막 위에 ITO박막을 제작할 필요성이 증대되어 지고 있고, 또한 다른 전자소자에 있어서도 상온 ITO 박막 형성 공정에 대한 필요성이 증대되고 있다. 이러한 이유로 본 실험에서는 IBAE(Ion Beam Assisted Evsporation)을 이용하여 저온 ITO박막을 유기막 위에 증착하는 공정에 대한 연구를 수행하였다. 이렇게 증착된 ITO 박막의 결정성은 비정질이었다. 또한, 모든 display device 제작에는 식각공정이 필수인데 기존에 사용되고 있는 wet etching 법은 등방성 식각특성 때문에 미세 pattern 형성에 부적합？, 따라서 비등방성 식각에 용이한 plasma etching법을 사용하여 저온 증착된 ITO 박막의 식각특성을 알아보았다. 실험에 사용된 식각장비는 자장 강화된 유도결합형 플라즈마 식각장비(MEICP)를 사용하였으며, 13.56MHz의 RF power를 사용하였다. 식각조건으로 source power는 600W~1000W, 기판 bias boltage는 -100V~-250V를 가하였으며, Ar, CH4, O2, H2, BCl3의 식각 gases, 5mTorr~30mTorr의 working pressure 변화 그리고 기판 온도에 따른 식각특성을 관찰하였다. ITO 가 증착된 기판으로는 유기물 중 투명전도성 박막에 기판으로서 사용가능성이 클 것으로 기대되어지는 PET(polyethylene-terephtalate), PC(polycarbonate), 아크릴을 사용하여 기판 변화가 식각특성에 미치는 영향에 대해서 각각 관찰하였다. 식각속도의 측정은 stylus profiler를 이용하여 측정하였으며 식각후에 표면상태는 scanning electron spectroscopy(SEM)을 이용하여 관찰하였다.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2007년도 추계종합학술대회
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• pp.747-750
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• 2007

본 연구는 부식을 방지하기 위해서는 metal line식각 후 염소 잔유물 과 plasma charge up을 식각 조건, PR strip조건 및 후속 세정 조건을 최적화함으로써 제거해야 한다고 제안 하였다. Metal line에 다량 분포하는 charge up은 후속 세정의 적정 PH와 만났을 때, 하부 tungsten plug의 부식을 유발 하게 된다. Metal line식각 및 PR strip후 세정에 있어 약액의 종류는 부식에 결정적인 영향을 미친다. Galvanic corrosion을 최소화하기 위한 적정 PH, metal attack을 최소화 할 수 있는 chemistry선택, 높은 식각 부산물 제거 효율의 약액, 최적의 $H_2O$처리 조건 등이 metal부식방지에 있어 결정적인 요소임을 확인하였다.

• Current Optics and Photonics
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• 제1권4호
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• pp.402-411
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• 2017

Combined LIBS-Raman spectroscopy has been widely studied, due to its complementary capabilities as an elemental analyzer that can acquire signals of atoms, ions, and molecules. In this study, the classification of polymorphs was performed by laser-induced breakdown spectroscopy (LIBS) to overcome the limitation in molecular analysis; the results were verified by Raman spectroscopy. LIBS signals of the $CaCO_3$ polymorphs calcite and aragonite, and $CaSO_4{\cdot}2H_2O$ (gypsum) and $CaSO_4$ (anhydrite), were acquired using a Nd:YAG laser (532 nm, 6 ns). While the molecular study was performed using Raman spectroscopy, LIBS could also provide sufficient key data for classifying samples containing different molecular densities and structures, using the peculiar signal ratio of $5s{\rightarrow}4p$ for the orbital transition of two polymorphs that contain Ca. The basic principle was analyzed by electronic motion in plasma and electronic transition in atoms or ions. The key factors for the classification of polymorphs were the different electron quantities in the unit-cell volume of each sample, and the selection rule in electric-dipole transitions. The present work has extended the capabilities of LIBS in molecular analysis, as well as in atomic and ionic analysis.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.323-323
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• 2010

Saw damage of crystalline silicon wafer is unavoidable factor. Usually, alkali treatment for removing the damage has been carried out as the saw damage removal (SDR) process for priming the alkali texture. It usually takes lots of time and energy to remove the sawed damages for solar grade crystalline silicon wafers We implemented two different mixed acidic solution treatments to obtain the improved surface structure of silicon wafer without much sacrifice of the silicon wafer thickness. At the first step, the silicon wafer was dipped into the mixed acidic solution of $HF:HNO_3$=1:2 ration for polished surface and at the second step, it was dipped into the diluted mixed acidic solution of $HF:HNO_3:H_2O$=7:3:10 ratio for porous structure. This double treatment to the silicon wafer brought lower reflectance (25% to 6%) and longer carrier lifetime ($0.15\;{\mu}s$ to $0.39\;{\mu}s$) comparing to the bare poly-crystalline silicon wafer. With optimizing the concentration ratio and the dilution ratio, we can not only effectively substitute the time consuming process of SDR to some extent but also skip plasma enhanced chemical vapor deposition (PECVD) process. Moreover, to conduct alkali texture for pyramidal structure on silicon wafer surface, we can use only nitric acid rich solution of the mixed acidic solution treatment instead of implementing SDR.

• Asian-Australasian Journal of Animal Sciences
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• 제23권11호
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• pp.1462-1468
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• 2010

The effects of vitamin C and vitamin E with selenium on acid-base balance and some stress hormones were evaluated during heat stress in goats. Goats, 1.5 years of age, were divided into control, heat stress and antioxidant treatment groups 1, 2 and 3. Except for the control, all groups were exposed to a temperature of $40{\pm}2^{\circ}C$ with a relative humidity of 30% for 5 h/d for 21 days in a psychrometric chamber. Rectal temperature and respiratory rates were recorded daily post exposure. Blood samples were collected on every 3rd day for estimation of plasma vitamins C and E, total antioxidant activity and hormones, and separate blood samples were taken to estimate acid-base status. The rectal temperature and respiratory rates were increased (p<0.05) in the heat stress group only. Except for pH and $pO_2$, which were increased significantly (p<0.05) other parameters of acid-base balance such as $pCO_2$, $HCO_3^-$, $TCO_2$, BEb, BEcef, PCV and Hb were significantly decreased (p<0.05) in the heat stress group. An improvement in acid-base status was noted in the antioxidant supplemented groups. Prolactin and cortisol levels were significantly (p<0.05) higher and free T3 and T4 levels were significantly (p<0.05) lower in the heat stress group. Levels of prolactin and cortisol were decreased and free T3 and T4 were increased in antioxidant treatment groups. Different levels of antioxidant supplementation resulted in similar protection against heat stress.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1998년도 제14회 학술발표회 논문개요집
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• pp.94-94
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• 1998

최근 a-CH:N (hydrogenated amorphous carbon nitride)가 a-CH 보다 팡학적, 기계객성 질이 우수하므로 이에 대한 연구가 활발하게 진행되고 있다. 본 실험에선 원료 가스의 유량 은 5 sccm으로 고정시킨 채 원료가스내의 질소 대 메탄 혼합비 (N2ICHa)훌 O 에서 4 까지 변 화시 키 띤서 DC saddle-field PECVD (plasma enhanced chemical vapour d야Xlsition)훌 이 용하여 a-CH:N 박막융 제작하여, 가스 혼합비가 박막의 미세구조와 광학척 성질에 미치는 영향올 연구하였다. 박막 성장시 진공조 내의 압력온 throttle valve롤 사용하여 90 mTorr로 일정하게 유지하였으며 양극 전압과 기판전업은 각각 500 V, 200 V로 고청하고 상온에서 중 착하였다. a a -step으로 측정 한 a-C:H:N 박막의 두께는 혼합가스내의 질소의 양이 증가할수륙 4800 A에서 2000 A로 두께가 감소하였지만 표면 rot핑비less는 혼합가스내의 질소의 양이 중가할 수록 중가함을 AFM (atomic force mi$\alpha$'0 scopy) 으로 관찰하였다. 박막내의 C와 N의 정량 분석은 RES (Rutherford back scattering s야ctroscopy) 핵공명법을 이용하여 분석하였다. X XPS (X -ray photoelectron spec$\sigma$oscopy) 와 FT-IR (Fo삐er transform-infrared s spectrometry)로 미세구조률 측정한 결과 혼합가스내의 질소의 양이 충가할수록 C-H기는 감 소하였지 만 C르N, N-H기 는 늘어 났다. 또한 PL (photoluminescence) 측정 결과 웬료가스 내 메탄과 질소의 비율이 1:1일 때 최대의 발광올 보였고 UVS (비없 vi이et spec$\sigma$orne$\sigma$y)으 로 측정한 광학쩍 에너지 캡은 혼합비내의 질소의 양이 증가할수록 2.53 eV에서 2.3 eV로 감 소하였다. 이를 결과로부터 원료가스내의 N2ICHa의 중가에 따른 박막의 미세구조 변화와 광학척 생 질의 상관 관계가 고찰될 것이다.