• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.160-160
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• 2011

I-III-VI족 화합물 반도체인 $CuInS_2$(CIS) 박막은 Cu(In,Ga)$Se_2$에 비해서 독성원소를 사용하지 않으므로 환경 친화적이고 Ga, Se를 사용하지 않아 조성의 조절이 쉬우며 태양전지의 이상적인 밴드갭인 1.5 eV에 근접한 1.53 eV의 직접천이형 에너지 밴드갭을 가지고 있어 태양전지의 광흡수층으로써 유망한 재료이다. CIS 박막 증착에는 다양한 방법이 있으며 본 연구에서는 chamber를 진공으로 만들고 CIS를 구성하는 용액으로부터 미립자화 된 입자를 노즐을 통하여 팽창시켜 에어로졸을 생성하고 입자들의 운동에너지를 증착에 직접 이용 할 수 있는 Aerosol Jet Deposition (AJD)라는 방법을 이용하려고 한다. 이 방법은 높은 증착속도로 우수한 박막을 성장시킬 수 있는 저비용 및 단순공정으로 CIS를 증착 할 수 있는 새로운 방법이다. 물을 용매로 하여 수용액 상태의 $CuCl_2{\cdot}2H_2O$, $InCl_3$, $(NH_2)_2CS$를 혼합하여 CIS 용액을 제조하고 carrier gas를 주입하여 CIS 용액을 노즐로 이동시켜 팽창시킨다. 용액이 팽창되면서 온도가 감소하여 응축이 일어나며 이 응축된 용액이 가열된 기판 위에 충돌하여 용매가 증발하면서 결정화된 CIS가 증착이 된다. CIS의 특성은 용액의 전구체 비율, 기판 온도, 팽창 전 압력, chamber 압력 등의 영향을 받는데 본 연구에서는 기판 온도를 증착변수로 선택하여 CIS 박막을 증착하고 박막의 특성을 고찰하고자 한다.

• Transactions on Electrical and Electronic Materials
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• v.11 no.2
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• pp.81-84
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• 2010

Al-doped ZnO (AZO) films were prepared by an Ar:$H_2$ gas radio frequency (RF) magnetron sputtering system with a AZO ($2\;wt{\cdot}%\;Al_2O_3$) ceramic target at the low temperature of $100^{\circ}C$ and annealed in hydrogen ambient at the temperature of $300^{\circ}C$. To investigate the influence of the $H_2$ flow ratio on the properties of the AZO films, the $H_2$ flow ratio was changed from 0.5% to 2%. As a result, the AZO films, deposited with a 1% $H_2$ addition, showed a resistivity of $11.7\;{\times}\;10^{-4}\;{\Omega}{\cdot}cm$. When the AZO films were annealed at $300^{\circ}C$ for 1 hour in a hydrogen atmosphere, the resistivity decreased from $11.7\;{\times}\;10^{-4}\;{\Omega}{\cdot}cm$ to $5.63\;{\times}\;10^{-4}\;{\Omega}{\cdot}cm$. The lowest resistivity of $5.63\;{\times}\;10^{-4}{\Omega}{\cdot}cm$ was obtained by adding 1% hydrogen gas to the deposition and annealing process. The X-ray diffraction patterns of all the films showed a preferable growth orientation in the (002) plane. The spectrophotometer measurements showed that the transmittance of 85% was obtained by the film deposited with the $H_2$ flow ratio of 1% at 940 nm for GaAs/GaAlAs LEDs.

• Journal of the Korean Magnetics Society
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• v.9 no.2
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• pp.91-97
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• 1999

YIG $(Y_3Fe_5O_{12})$ films with 4~80 ${\mu}{\textrm}{m}$ thickness were epitaxially grown on GGG $(Gd_3Ga_5O_{12})$ substrates by LPE (liquid phase epitaxy) techniques. Using various melts having different chemical composition the growth temperature was varied as a parameter. Growth rate, surface morphology, chemical composition, lattice constant, saturation magnetization, and magnetic resonance of the films were investigated. Lattice mismatch between the substrate and film Δa, saturation magnetization, and magnetic resonance line width ΔH increased, decreased, and increased, respectively, as undercooling temperature ΔT increased. The films grown by using the melt with larger R$_1$and smaller R$_3$had smaller ΔH. The major origin of the increase of ΔH was the increase of Δa. It is considered that the magnetic field in the film became locally inhomogeneous with the increase of Δa due to the increase of inhomogenity in stress distribution to the film depth direction. Therefore, in order to grow YIG films with small microwave loss it is necessary to grow films at small ΔT using the melt with large R$_1$and small R$_3$resulting in a small Δa.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.30 no.6
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• pp.372-375
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• 2017

ZnO thin films were deposited by RF magnetron sputtering and then diffused by using an As source in the ampouletube. Also, the ZnO p-n homojunction was made by using As-doped ZnO thin films, and its properties were analyzed. After the As doping, the surface roughness increased, the crystal quality deteriorated, and the full width at half maximum was increased. The As-doped ZnO thin films showed typical p-type properties, and their resistivity was as low as $2.19{\times}10^{-3}{\Omega}cm$, probably because of the in-diffusion from an external As source and out-diffusion from the GaAs substrate. Also, the ZnO p-n junction displayed the typical rectification properties of a p-n junction. Therefore, the As diffusion method is effective for obtaining ZnO films with p-type properties.

• Applied Microscopy
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• v.38 no.1
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• pp.63-72
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• 2008

The iterative wave-function reconstruction (IWFR) method developed by Allen et al. (2004) was reviewed with concern for its applicability. The high resolution transmission electron microscopy (HRTEM) studies of the materials such as GaAs, $YBa_2Cu_3O_7$ and $Al_2CuMg$ reported in the literature were utilized in this review. In this process the basis of validity, the limiting conditions and the information limit of this method were discussed. It was particularly noted that the phase contrast image of the exit plane wave evaluated from this method reveals not only $C_s$-corrected atomic resolution within information limit, but also strong tendency of contrast proportional to the magnitude of the atomic number of compositional atoms in a crystal.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.183-184
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• 2013

Two main MBE growth techniques have been used: plasma-assisted MBE (PA-MBE), which utilizes a rf plasma to supply active nitrogen, and ammonia MBE, in which nitrogen is supplied by pyrolysis of NH3 on the sample surface during growth. PA-MBE is typically performed under metal-rich growth conditions, which results in the formation of gallium droplets on the sample surface and a narrow range of conditions for optimal growth. In contrast, high-quality GaN films can be grown by ammonia MBE under an excess nitrogen flux, which in principle should result in improved device uniformity due to the elimination of droplets and wider range of stable growth conditions. A drawback of ammonia MBE, on the other hand, is a serious memory effect of NH3 condensed on the cryo-panels and the vicinity of heaters, which ruins the control of critical growth stages, i.e. the native oxide desorption and the surface reconstruction, and the accurate control of V/III ratio, especially in the initial stage of seed layer growth. In this paper, we demonstrate that the reliable and reproducible growth of GaN on Si (110) substrates is successfully achieved by combining two MBE growth technologies using rf plasma and ammonia and setting a proper growth protocol. Samples were grown in a MBE system equipped with both a nitrogen rf plasma source (SVT) and an ammonia source. The ammonia gas purity was ＞99.9999% and further purified by using a getter filter. The custom-made injector designed to focus the ammonia flux onto the substrate was used for the gas delivery, while aluminum and gallium were provided via conventional effusion cells. The growth sequence to minimize the residual ammonia and subsequent memory effects is the following: (1) Native oxides are desorbed at $750^{\circ}C$ (Fig. (a) for [$1^-10$] and [001] azimuth) (2) 40 nm thick AlN is first grown using nitrogen rf plasma source at $900^{\circ}C$ nder the optimized condition to maintain the layer by layer growth of AlN buffer layer and slightly Al-rich condition. (Fig. (b)) (3) After switching to ammonia source, GaN growth is initiated with different V/III ratio and temperature conditions. A streaky RHEED pattern with an appearance of a weak ($2{\times}2$) reconstruction characteristic of Ga-polarity is observed all along the growth of subsequent GaN layer under optimized conditions. (Fig. (c)) The structural properties as well as dislocation densities as a function of growth conditions have been investigated using symmetrical and asymmetrical x-ray rocking curves. The electrical characteristics as a function of buffer and GaN layer growth conditions as well as the growth sequence will be also discussed. Figure: (a) RHEED pattern after oxide desorption (b) after 40 nm thick AlN growth using nitrogen rf plasma source and (c) after 600 nm thick GaN growth using ammonia source for (upper) [110] and (lower) [001] azimuth.

• Proceedings of the Optical Society of Korea Conference
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• 2000.02a
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• pp.256-257
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• 2000

유전체 덮개층을 이용한 impurity free vacancy disordering (IFVD) 기술에 의한 양자우물구조의 밴드갭 조절기술은 양자우물을 갖는 광소자의 제작 및 광소자들의 한판 집적에 광범위하게 적용되어 왔다$^{(1-3)}$ . IFVD 기술의 핵심은 유전체 덮개층의 종류 및 그 특성을 적절히 조절함으로써 양자우물의 밴드갭 및 굴절율을 양자우물 기판상에서 공간적으로 조절하는 기술에 있다. 이러한 목적을 위해 SiN$_{x}$ , SiO$_2$, SrF$_2$ 및 WN$_{x}$ 와 같은 많은 유전체 덮개층에 관한 실험들이 진행되었다 $^{(1-6)}$ . (중략)

• Korean Journal of Soil Science and Fertilizer
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• v.20 no.1
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• pp.55-61
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• 1987

A series of laboratory experiments were carried out to find the effects of soil organic matter contents, soil temperature, pH values, kinds and amount of nitrogen fertilizers on the denitrification-$N_2O$ gas evolution-. The results obtained were summarized as follows: 1. Denitrification rate, amount of $N_2O$ gas evolution, was influenced the order of organic matter contents>soil temperature>pH values>kinds of N-fertilizer>levels of N-fertilizer. 2. The highest dentrification rate was observed in organic matter content of 3.0%, pH values at 6.0 with application of $KNO_3$ at levels of 20 mgN/100g soil. 3. For the evolution of I mole $N_2O$ gas, averaged carbon consumption was obtained as 0.5 mole in all these experiment condition. However, the highest carbon consumption rate was obtained in organic matter contents for 1.0% with application of $(NH_4)_2SO_4$ at levels of 10 mgN/100g soil (1.06 mole) while lowest carbon consumption rate was obtained in organic matter contents for 3.0% with application of $KNO_3$ at levels of 20 mgN/100g soil (0.13 mole). 4. According to Michaelis-Menten's equation, the V/2 values for evolution of $N_2O$ gas was estimated by progress curve. The results obtained was as 550 ug for $(NH_2)_2CO$ and 1100 ug $N_2O/100g$ soil by application of $KNO_3$ in organic matter contents of 1.0% soil. On the other hand, when the application $(NH_4)_2SO_4$ the V/2 values of $N_2O$ gas was obtained as the amount of 490 ug/100g soil while V/2 values of $N_2O$ gas by application of $KNO_3$ was on the linear line in soil organic matter contents of 3.0%.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.11a
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• pp.191-194
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• 2004

Ferroelectric $Pb(Zr_{0.52}Ti_{0.48})O_3$ (PZT) 박막을 $Pt(111)/Ti/SiO_2/Si$ 기판위에 증착되었고, 수소 후열처리 후의 특성변화를 연구하였다. 동시에 10 nm의 $(Pb_{0.72}La_{0.28})Ti_{0.94}O_3$ (PLT) buffer를 사용한 PZT 박막의 수소 후열처리 효과를 관찰하였다. PZT 박막의 경우, 수소 후열처리 전과 후에 강유전 특성이 현저하게 감소한 반면, PLT buffer가 사용된 PZT 박막의 경우, 강유전 특성에 거의 변화가 없었다. 이는 PLT buffer를 사용함으로써 PZT 박막의 배향성이 향상되고, 이에 따라 forming gas에 의한 수소원자가 박막 내로의 침투가 어렵게 된다. 따라서 수소원자에 대한 PZT 박막의 열화되는 현상이 buffer를 사용하는 경우, 거의 나타나지 않게 된다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.2
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• pp.102-107
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• 2003

This study puts focus on the optimization of growth temperature of CIGS absorber layer which affects severely the performance of solar cells. The CIGS absorber layers were prepared by three-stage co-evaporation of metal elements in the order of In-Ga-Se. The effect of the growth temperature of 1st stage was found not to be so important, and 350$^{\circ}C$ to be the lowest optimum temperature. In the case of growth temperature at 2nd/3rd stage, the optimum temperature was revealed to be 550$^{\circ}C$. The XRD results of CIGS films showed a strong (112) preferred orientation and the Raman spectra of CIGS films showed only the Al mode peak at 173cm$\^$-1/. Scanning electron microscopy results revealed very small grains at 2nd/3rd stage growth temperature of 480$^{\circ}C$. At higher temperatures, the grain size increased together with a reduction in the number of the voids. The optimization of experimental parameters above mentioned, through the repeated fabrication and characterization of unit layers and devices, led to the highest conversion efficiency of 15.4% from CIGS-based thin film solar cell with a structure of Al/ZnO/CdS/CIGS/Mo/glass.