• 한국전기전자재료학회논문지
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• 제19권5호
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• pp.432-436
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• 2006

The $ZnGa_2O_4$ and Mn, Cr-doped $ZnGa_2O_4$ Phosphors were synthesized through conventional solid state reactions. The XRD patterns show that the $ZnGa_2O_4$ has a (3 1 1) main peak and a spinel phase. The emission wavelength of $ZnGa_2O_4$ showed main peak of 420 nm and maximum intensity at the sintering temperature of $1100^{\circ}C$. In the crystalline $ZnGa_2O_4$, the Mn shows green emission (510 nm, $^4T_1-^6A_1$) with a quenching concentration of 0.6 mol%, and the Cr shows red emission (705 nm, $^4T_2-^4A_2$) with a quenching concentration of 2 mol%. These results indicate that $ZnGa_2O_4$ Phosphors hold promise for potential applications in field emission display devices with high brightness operating in full color regions.

• Bulletin of the Korean Chemical Society
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• 제35권11호
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• pp.3261-3266
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• 2014

A pellet of polycrystalline $CuGaO_2$ with a delafossite structure was prepared from $Ga_2O_3$ and CuO by high-temperature solid-state synthesis. The $CuGaO_2$ pellet was a p-type semiconductor for which the electrical conductivity, carrier density, carrier mobility and Seebeck coefficient were $5.34{\times}10^{-2}{\Omega}^{-1}cm^{-1}$, $3.5{\times}10^{20}cm^{-3}$, $9.5{\times}10^{-4}cm^2V^{-1}s^{-1}$ at room temperature, and $+360{\mu}V/K$, respectively. It also exhibited two optical transitions at about 2.7 and 3.6 eV. The photoelectrochemical properties of the $CuGaO_2$ pellet electrode were investigated in aqueous electrolyte solutions. The flat-band potential of this electrode, determined using a Mott-Schottky plot, was +0.18 V vs SCE at pH 4.8 and followed the Nernst equation with respect to pH. Under UV light illumination, a cathodic photocurrent developed, and molecular hydrogen simultaneously evolved on the surface of the electrode due to the direct reduction of water without deposition of any metal catalyst.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.350.2-350.2
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• 2014

We investigated the structural and optical evolution of Ga2O3 thin films on glass substrates deposited using radio frequency magnetron sputtering. Initially, amorphous Ga2O3 thin film is grown, and then, surface humps and nanowire (NW) bundles are gradually formed as the film thickness increases. The surface humps are Ga-rich and provide nucleation sites for NWs through a self-catalytic vapor-liquid-solid mechanism with self-assembled Ga droplets. Both the surface humps and the NWs induce variation of the optical properties such as the optical bandgap and refractive index by absorbing light in the ultraviolet region.

• 전자공학회논문지A
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• 제29A권4호
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• pp.22-27
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• 1992

The cyclic voltammogram characteristics at the magnetized SrO${\cdot}6Fe_{2}O_{3}$ ceramics/(($10^{-3}$M KCI + p-Si powders) and /(($10^{-4}$M CsNO$_3$ + n-GaAs powders) suspension interfaces have been studied using the microelectrophoresis and the cyclic voltammetric method. The negatively charged ions are specifically absorbed on the virgin and the magnetized SrO${\cdot}6Fe_{2}O_{3}$ ceramics surfaces. The zeta potentials of the p-Si and n-GaAs colloidal semiconductors are + 41mV and -44.8mV, respectively. The magnetization effects act as potential barriers at the magnetized SrO${\cdot}6Fe_{2}O_{3}$ interfaces. The positivelely charged p-Si and the negatively charged n-GaAs colloidal semiconductors act as potential barriers at the virgin SrO${\cdot}6Fe_{2}O_{3}$ interfaces. On the other hand, the charged p-Si and n-GaAs colloidal semiconductors act as potential barrier scavengers at the magnetized SrO${\cdot}6Fe_{2}O_{3}$ interfaces. The magnetization effects and the charged colloidal semiconductor effects are irreversible and interdependent.

• 한국전기전자재료학회논문지
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• 제36권4호
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• pp.413-417
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• 2023

Gallium Oxide (Ga₂O₃) is preferred as a material for next generation power semiconductors. The Ga₂O₃ should solve the disadvantages of low thermal resistance characteristics and difficulty in forming an inversion layer through p-type ion implantation. However, Ga₂O₃ is difficult to inject p-type ions, so it is being studied in a heterojunction structure using p-type oxides, such as NiO, SnO, and Cu₂O. Research the lateral-type FET structure of NiO/Ga₂O₃ heterojunction under the Gate contact using the Sentaurus TCAD simulation. At this time, the VG-ID and VD-ID curves were identified by the thickness of the Epi-region (channel) and the doping concentration of NiO of 1×10¹⁷ to 1×10¹⁹ cm-3. The increase in Epi region thickness has a lower threshold voltage from -4.4 V to -9.3 V at I_D = 1×10^-8 mA/mm, as current does not flow only when the depletion of the PN junction extends to the Epi/Sub interface. As an increase of NiO doping concentration, increases the depletion area in Ga₂O₃ region and a high electric field distribution on PN junction, and thus the breakdown voltage increases from 512 V to 636 V at I_D =1×10^-3 A/mm.

• 한국재료학회:학술대회논문집
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• 한국재료학회 1992년도 추계학술발표강연 및 논문개요집
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• pp.107-108
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• 1992

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 하계학술대회 논문집
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• pp.851-854
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• 2001

Europium-activated Ga$_2$O$_3$powders were prepared by modified "Pechini method" from mixed aqueous solutions of gallium nitrate, europium nitrate, ethylene glycol and citric acid. The formation process and structure of the phosphor powders were investigated by means of TG/DTA, XRD and SEM. It has been found that the phosphor powders were amorphous up to 50$0^{\circ}C$ and changed into crystalline $\beta$-Ga$_2$O$_3$phase above $600^{\circ}C$. The resulting nano-sized powders were obtained. Red luminescence in emission spectra were observed at room temperature.

• 한국재료학회지
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• 제8권6호
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• pp.526-531
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• 1998

HVPE(hydride vapor phase epitaxy)법으로 (111) $MgAl_2O_4$기판 위에 $10~240\mu{m}$두께의 GaN를 성장하고, GaN의 두께에 따 광학적 성질을 조사하였다. $MgAl_2O_4$기판 위에 성장된 GaN의 PL 특성은 결정성장온도에서 기판으로부터 Mg이 out-diffusion하여 auto-doping 됨으로써 불순물이 첨가된 GaN의 PL 특성을 나타내었다. 10K의 온도데서 측정된 PL 스펙트럼은 자유여기자와 속박여기자의 재결합천이에 의한 피크들과 불순물과 관련된 도너-억셉터 쌍 사이의 재결합 및 이의 포논 복제에 의한 발광으로 구성되었으며, 깊은 준위로부터의 발광은 나타나지 않았다. 중성 도너에 속박된 여기자 발광 에너지와 라만 $E_2$모드 주파수는 GaN의 두께가 증가함에 따라 지수 함수적으로 감소하였으며, GaN 내의 잔류 응력에 대하여 라만 E2 모드 주파수는$\Delta$$\omega$=3.93$\sigma$($cm^{-1}$/GPa)의 관계로 변화하였다.

• 한국결정학회지
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• 제5권1호
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• pp.24-32
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• 1994

(0001),(1012) 및 (1120)면 sapphire 기판위에 성장되는 (0001), (1120) 및 (1011)면 GaN epitaxy 박막을 Ga/HCI/NH3/He 계를 사용한 HVPE(halide vapor phase epitaxy)방법에 의하여 성장시키는 연구를 수행하였다. 박막의 표면조직과 결정구조는 XRD, RHEED와 SEM으로 분석하였으며, 성장된 막의 화학적 조성은 XPS로 관찰되었다. (1120) sapphire위에는 각각 (0001)과 (1120) GaN epitaxy 박막의 두가지 배향관계가 관찰되었다. (0001)면 GaN epitaxy 박막은 (0001)과 (1120)면 sapphire 기판위에서 1050℃ 의 고온으로 성장시킬 때 이차원적인 성장구조를 보여주였으며, (1120) sapphire 기판위에 성장된 (1011) GaN 박막이 주사전자현미경과 RHEED 분석결과 가장 좋은 표면조직과 결정구조를 보여주었다.

• 한국광학회:학술대회논문집
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• 한국광학회 2008년도 동계학술발표회 논문집
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• pp.403-405
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• 2008

Solid state lighting 용 적색 형광체로 적용하기 위하여 $BaTiO_3$:$Pr^{3+}$:$Ga^{3+}$를 다음과 같이 합성하였다. 출발 물질로 $BaCO_3$,$Pr(NO_3)_3$ $6H_2O$, $TiO_2$, $Ga_2O_3$을 사용 하였으며, $BaTiO_3$:$Pr^{3+}\;_x$(x=$0.001{\sim}0.2$):$Ga^{3+}\;_y$(y=0.05, 0.1, 0.5 1, 2, 3)를 각각의 조성대로 혼합한 후 $600^{\circ}C$에서 10시간 전처리 하였다. 전처리한 시료를 시편으로 제조하여 $1200^{\circ}C$ 공기중에 4시간 소성하여 최종물질인 $BaTiO_3$:$Pr^{3+}\;_x$:$Ga^{3+}\;_y$을 얻었다. 이 화합물을 X-선 회절 분석 결과 공간군 P4MM을 갖는 페로브스카이트임을 알 수 있었다. 이 화합물을 적색형광체로 적용하기 위해 PL과 PLE측정을 통하여 형광특성을 알아본 결과 618nm에서 x=0.011, y=1.0 일 때 특성이 가장 우수한 것으로 나타났다.