$N_2/CH_4$ 가스비에 따른 Hydrogenated Amorphous Carbon Nitride 박막의 특성
(Hydrogeneted Amorphous Carbon Nitride Films on Si(100) Deposited by DC Saddle Field Plasma Enhanced Chemical Vapor Deposition)
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- 한국진공학회지
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- 제7권3호
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- pp.242-247
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- 1998