• 제목/요약/키워드: $Ar^+$ Ion

검색결과 635건 처리시간 0.029초

이온 플레이팅에 의한 Nd계 희토류 영구자석의 Al 증착 특성 (Chararcteristice of Al Depositon on Nd-based Permanent Magnet Prepared by Ion Plating)

  • 여현동;백운승;권식철;장도연;공곤승;박동원;김대룡
    • 한국표면공학회지
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    • 제31권4호
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    • pp.181-190
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    • 1998
  • Al ion plating was carried to improve corrosion resistance of Nd-based permanent magnet made by prwder molding method. The effects of applied votage, pressyre and temperature were investigated to find the reation between coating parameters and their properties. Density of coating layer increased with voltage and thus corrosion resistance improved. However when voltage was applied more than 1000V, corrosion resistance whet down because of resputtering effect. Good corrosion resistance was acquired when gas pressure was $5.0\times10^-2$>torr, which is satisfied momentum energy of Ar, Al ions as well as quantity of plasma. The layer coated in low temperature range have better surface density and corrosion resistance than in high temperature. This result is seemed due to the characteristics of substrate itself. All coating layers were showed stong adhesion with substrate.

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n형 GaN의 doping 농도에 따르는 건식 식각 손상 (Doping-level dependent dry-etch damage of in n-type GaN)

  • 이지면
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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    • pp.417-420
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    • 2004
  • The electrical effects of dry-etch on n-type GaN by an inductively coupled $Cl_2/CH_4/H_2/Ar$ plasma were investigated as a function of ion energy, by means of ohmic and Schottky metallization method. The specific contact resistivity(${\rho}_c$) of ohmic contact was decreased, while the leakage current in Schottky diode was increased with increasing ion energy due to the preferential sputtering of nitrogen. At a higher rf power, an additional effect of damage was found on the etched sample, which was sensitive to the dopant concentration in terms of the ${\rho}_c$ of ohmic contact. This was attributed to the effects such as the formation of deep acceptor as well as the electron-enriched surface layer within the depletion layer. Furthermore, thermal annealing process enhanced the ohmic and Schottky property of heavily damaged surface.

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Eosin을 첨가한 Boric-Acid Glass의 비선형 광학적 특성 (Nonlinear Optical Properties of Eosin-Doped Boric Acid Glass)

  • 유연석
    • 한국광학회지
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    • 제2권3호
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    • pp.133-138
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    • 1991
  • Eosin을 첨가한 boric acid 유리질 포화흡수체의 포화세기는 비교적 낮은 것으로(약 700 mW/$\textrm{cm}^2$) 측정되었고, 세기가 낮은 경우에서도 축퇴4광파혼합에 의해 광학적 위상공액파를 발생시킬 수 있었다. 파장이 488nm인 Ar-ion laser를 사용하여 이 매질에서 DFWM에 의한 위상공액파의 편광특성을 보였고, 위상공액 반사율의 빛의 세기와 파장에 대한 의존성을 측정하였다. 이 매질에서 비축퇴2광파혼합에 의한 에너지 교환은 두 광속의 주파수차가 약 100 Hz 정도인 경우에 최대가 되었다.

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3D Plasma simulation을 이용한 Cylindrical Rotating Magnetron Sputtering Cathode 개발

  • 천용환;오지영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.179.1-179.1
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    • 2013
  • Cylindrical Rotating Magnetron Sputtering Cathode (이하 Rotary Cathode)는 기존에 사용 되던 rectangular type 보다 Target 사용 효율이 높다는 큰 이점을 가지고 있다. 높은 Target 사용 효율은 비용 절감 효과와 직접적으로 관련 된다. 이번 연구는 3D Plasma simulation(PIC-MCC)을 통한 Target 사용 효율 80% 이상의 Rotary Cathode 개발을 목적으로 한다. Plasma simulation에 External Magnetic fields를 접목하여 Electron의 이동 궤적을 제어하였고, 생성된 Ion (Ar+)의 밀도 및 속도로 Plasma의 안정성과 Erosion 계산 구간을 선정 하였다. Target Erosion Profile은 Sputtering yield Data와 Target에 충돌한 Ion 정보를 사용하여 산출 하였으며, Sputtered Particles의 Deposition Profile은 계산된 Target Erosion Profile과 The cosine law of emission을 이용하여 계산 하였다. 실험 조건은 Plasma simulation의 초기조건 바탕으로 하여 2G size의 ITO Target을 대상으로 실험 하였다. 비 Erosion 영역 최소화하기 위해 Magnet Length를 변경하여 제작 적용 하였다. Simulation 계산 시간의 제약으로 인하여 simulation에서 생성된 최대 이온 밀도는 일반적으로 알려진 값 보다 적게 계산 되었지만, Simulation으로 예측한 Erosion Profile 및 Deposition Profile은 실험 값과 유사한 형태를 나타났으며, 실험 결과는 Target 사용 효율 80%이상의 결과를 보였다.

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Determination of Copper in Uniformly-Doped Silicon Thin Films by Isotope-Dilution Inductively Coupled Plasma Mass Spectrometry

  • 박창J.;차명J.;이동S.
    • Bulletin of the Korean Chemical Society
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    • 제22권2호
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    • pp.205-209
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    • 2001
  • Uniformly-doped silicon thin films were fabricated by ion beam sputter deposition. The thin films had four levels of copper dopant concentration ranging between 1 ${\times}$1019 and 1 ${\times}$ 1021 atoms/cm3 . Concentrations of Copper dopants were determined by the isotope dilution inductively coupled plasma mass spectrometry (ICP-MS) to provide certified reference data for the quantitative surface analysis by secondary ion mass spectrometry (SIMS). The copper-doped thin films were dissolved in a mixture of 1 M HF and 3 M HNO3 spiked with appropriate amounts of 65 Cu. For an accurate isotope ratio determination, both the detector dead time and the mass discrimination were appropriately corrected and isobaric interference from SiAr molecular ions was avoided by a careful sample pretreatment. An analyte recovery efficiency was obtained for the Cu spiked samples to evaluate accuracy of the method. Uncertainty of the determined copper concentrations, estimated following the EURACHEM Guide, was less than 4%, and detection limit of this method was 5.58 ${\times}$ 1016 atoms/cm3.

이온빔조사에 의한 생분해성 차폐막의 세포부착력 증진에 관한 연구 (Improved cell adhesion to ion beam-irradiated biodegradable membranes)

  • 이용무;박윤정;이승진;구영;류인철;한수부;최상묵;정종평
    • Journal of Periodontal and Implant Science
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    • 제28권4호
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    • pp.601-611
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    • 1998
  • Ion irradiation is a very promising tool to modify the chemical structure and physical properities of polymers. This study was aimed to evaluate the cellular adhesion to ion beam-irradiated surface of biodegradable poly-l-lactide(PLLA) membrane. The PLLA membrane samples were irradiated by using 35 KeV $Ar^+$ to fluence of $5{\times}10^{13}$, $5{\times}10^{14}$ and $5{\times}10^{15}\;ion/cm^2$. Water contact angles to control and each dose of ion beam-irradiated PLLA membranes were measured. Cultured fetal rat calvarial osteoblasts were seeded onto control and each dose of ion beam-irradiated PLLA membranes and cultured. After 24 hours, each PLLA membranes onto which osteoblasts attached were examined by scanning electron microscopy(SEM). Osteoblasts were removed from each PLLA membrane and then, the vitality and the number of cells were calibrated. Alkaline phosphatase of detached cells from each PLLA membranes were measured. Ion beam-irradiated PLLA membranes showed no significantly morphological change from control PLLA membranes. In the measurement of water contact angle to each membrane, the dose range of ion beam employed in this study reduced significantly contact angles. Among them, $5{\times}10^{14}\;ion/cm^2$ showed the least contact angle. The vitalities of osteoblastes detached from each membranes were confirmed by flow cytometer and well attached cells with their own morphology onto each membranes were observed by SEM. A very strong improvement of the cell adhesion and proliferation was observed for ion beam-irradiated surfaces of PLLA membranes. $5{\times}10^{15}\;ion/cm^2$ exhibited the most strong effect also in cellular adherence. ALPase activities also tended to increase in ion beam-irradiated membranes but statistical differences were not found. These results suggested that ion beam irradiation is an effective tool to improve the adhesion and spreading behaviour of the cells onto the biodegradable PLLA membranes for the promotion of membrane-tissue integration.

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Y2O3 세라믹스의 미세구조 및 플라즈마 저항성 (Microstructure and plasma resistance of Y2O3 ceramics)

  • 이현규;이석신;김비룡;박태언;윤영훈
    • 한국결정성장학회지
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    • 제24권6호
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    • pp.268-273
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    • 2014
  • $Y_2O_3$ 세라믹 소결체를 제작하기 위해, $Y_2O_3$ 분말을 분산한 상태에서 슬러리에 pH 조절제인 NaOH를 첨가하였으며 결합제로는 PVA, 가소제로는 PEG를 첨가하여 열분무 건조 공정을 거쳐 $Y_2O_3$ 과립형 분말을 제조하였다. ${\phi}14mm$ 크기의 $Y_2O_3$ 세라믹 성형체를 성형하고, $1650^{\circ}C$의 온도에서 소결하여 $Y_2O_3$ 세라믹 소결체를 제작하였다. $Y_2O_3$ 소결체의 미세구조, 밀도 및 내플라즈마 특성이 성형압력 및 소결시간에 따라 분석되었다. $Y_2O_3$ 소결체는 $CHF_3/O_2/Ar$ 플라즈마에 노출시켜, $Ar^+$ 이온빔에 의한 물리적반응 식각과 $CHF_3$로부터 분해된, $F^-$ 이온에 의한 화학적반응 식각에 의한 건식 식각 처리가 이루어졌다. 본 연구에서 $Y_2O_3$ 소결체 소결시간의 증가에 따라, 비교적 높은 밀도를 나타내었으며, 내플라즈마 특성이 향상되는 것으로 나타났다.

활성탄 슬러리를 이용한 $SO_2$ 가스의 흡착 및 산화반응 속도 (Adsorption and Oxidation Reaction Rate of $SO_2$ in Slurries of Activated Carbon)

  • 최용택;신창섭;이태희
    • 한국대기환경학회지
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    • 제3권1호
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    • pp.41-46
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    • 1987
  • Adsorption and reaction studies were made for the catalytic oxidation in aqueous slurries of activated carbon at room temperature and atmospheric pressure. In order to analyze the reaction rate, the mechanism was assumed by the steps of nonhomogeneous catalytic reaction. The experimental result show that oxidation rate was controlled by the reaction between adsorbed molecular oxygen and sulfur dioxide on the catalyst surface. Ar room temperature, the equat5ion of reaction rate was given as $ro_2 = 2.49 \times 10^{-7} P_O_2^{0.604}$.

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