Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2001.02a
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- Pages.167-168
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- 2001
Reactive Ion Etching of InP and InGaP using $Cl_{2}$ gas with $CH_{4}$ and Ar Addition
- Yu, Jae-Su (Department of Information & Communications, Kwanju Institute of Science & Technology) ;
- Song, Jin-Dong ;
- Bae, Seong-Ju (Department of Information & Communications, Kwanju Institute of Science & Technology) ;
- Kim, Jong-Min (Department of Information & Communications, Kwanju Institute of Science & Technology) ;
- Lee, Yong-Tak (Department of Information & Communications, Kwanju Institute of Science & Technology)
- Published : 2001.02.22
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