• 한국재료학회지
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• 제19권11호
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• pp.581-587
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• 2009

Fe powders with elongated and aggregated structure as heat pellet material for thermal battery applications were prepared by spray pyrolysis under various preparation conditions. The precursor powders with spherical shapes and hollow morphologies turned into Fe powders after reduction at a temperature of 615$^{\circ}C$ under 20% $H_2$/Ar gas. The powders had pure Fe crystal structures irrespective of the preparation conditions of the precursor powders in the spray pyrolysis. The morphologies and mean sizes of the Fe powders are affected by the preparation conditions of the precursor powders in the spray pyrolysis. Therefore, the ignition sensitivities and the burn rates of the heat pellets formed from the Fe powders prepared by spray pyrolysis are affected by the preparations of the precursor powders. The Fe powders prepared under the optimum preparation conditions have a BET surface area of 2.9 $m^2g^1$. The heat pellets prepared from the Fe powders with elongated and aggregated structure have a good ignition sensitivity of 1.1W and a high burn rate of 18 $cms^1$.

• 한국표면공학회지
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• 제48권6호
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• pp.297-302
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• 2015

Nanocrystalline diamond(NCD) coated aluminium plates were prepared and applied as heat sinks for LED modules. NCD films were deposited on 1 mm thick Al plates for times of 2 - 10 h in a microwave plasma chemical vapor deposition reactor. Deposition parameters were the microwave power of 1.2 kW, the working pressure of 90 Torr, the $CH_4/Ar$ gas ratio of 2/200 sccm. In order to enhance diamond nucleation, DC bias voltage of -90 V was applied to the substrate during deposition without external heating. NCD film was identified by X-ray diffraction and Raman spectroscopy. The Al plates with about 300 nm thick NCD film were attached to LED modules and thermal analysis was carried out using Thermal Transient Tester (T3ster) in a still air box. Thermal resistance of the module with NCD/Al plate was 3.88 K/W while that with Al plate was 5.55 K/W. The smaller the thermal resistance, the better the heat emission. From structure function analysis, the differences between junction and ambient temperatures were $12.1^{\circ}C$ for NCD/Al plate and $15.5^{\circ}C$ for Al plate. The hot spot size of infrared images was larger on NCD/Al than Al plate for a given period of LED operation. In conclusion, NCD coated Al plate exhibited better thermal spreading performance than conventional Al heat sink.

• Journal of Plant Biotechnology
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• 제47권1호
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• pp.100-106
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• 2020

Coix lacryma-jobi (Hanjeli) is known to posses anti-microbial properties. Therefore, phytochemical compounds of C. lacryma-jobi have been studied to produce novel antimicrobial agents as treatments against antibiotic-resistant bacteria.The objective of this study was to determine the phytochemical composition and antibacterial activity of the C. lacryma-jobi oil against Escherichia coli, Staphylococcus aureus, and Bacillus subtilis. The phytochemical composition of the oil was determined via gas chromatography mass spectrophotometry (GC-MS). Moreover, agar disk and agar well diffusion were employed to screen the antibacterial activity of the oil. An agar well diffusion test was implemented to determinate MIC's (minimum inhibitory concentrations). Dodecanoic acid, tetradecanoic acid, 2,3-dihydroxypropylester, 1,3-dioctanoin, N-methoxy-N-methyl-3,4-dihydro-2H-thiopyran6-carboxamide, propanamide, 5-Amino-1-(quinolin-8-yl)-1,2,3-triazole-4-carboxamide, and pyridine were identified in the C. lacryma-jobi oil. The MIC value of the oil was 0.031 g/L and the MBC of the oil was 0.125 g/L effective in all test bacteria. Dodecanoic acid displayed inhibitory activity against gram-positive and gram-negative bacteria. Therefore, our research demonstrated C. lacryma-jobi (Hanjeli) oil exhibited antibacterial activity against E. coli, S. aureus, and B. subtilis. These research suggest that C. lacryma-jobi root oil could be used for medicinal purposes; however clinical and in vivo tests must be performed to evaluate its potential as an antibacterial agent.

• 한국자기학회지
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• 제16권4호
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• pp.197-200
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• 2006

RF magnetron reactive sputtering법으로 CoFeHfO 박막을 상온에서 제작하여 산소분압에 따른 포화자화, 보자력, 이방성자계를 조사하였다. 최적조건인 산소분압 8%에서 제조한 $Co_{39}Fe_{34}Hf_{9.5}O_{17.5}$ 박막은 포자자속밀도($4{\pi}M_s$) 19kG, 보자력($H_c$) 0.37Oe, 이방성자계($H_k$) 48.62Oe의 우수한 연자성을 나타내었다. CoFeHfO 박막의 전기비저항은 산소분압이 늘어남에 따라 증가하는 경향을 나타내었으며 우수한 연자기적 성질을 가지는 $Co_{39}Fe_{34}Hf_{9.5}O_{17.5}$ 박막의 경우, 300 ${\mu}{\Omega}cm$의 높은 전기비저항과 48.62 Oe의 높은 이방성자계 때문에 $Co_{39}Fe_{34}Hf_{9.5}O_{17.5}$박막이 고주파에서 우수한 연자기 특성을 가지는 것으로 사료된다.

• 한국진공학회지
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• 제18권3호
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• pp.229-235
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• 2009

본 연구에서는 철(Fe)을 촉매금속으로 사용하고 마이크로웨이브 플라즈마 화학기상증착법(microwave plasma CVD)을 이용하여 얇은 다중벽 탄소나노튜브를 합성하였다. 촉매금속으로 사용된 철은 직류 마그네트론 스퍼터를 사용하여 증착하였으며, 탄소나노튜브의 합성에는 플라즈마 공급원인 수소($H_2$), 탄소 공급원인 메탄($CH_4$)과 함께 미량의 산소($O_2$) 또는 아르곤(Ar)과 함께 물을 수증기의 형태로 사용하였다. 산소 또는 수증기의 추가에 따른 탄소나노튜브의 성장률의 변화를 주사전자현미경으로 조사하였으며, 결정구조를 투과전자 현미경을 통해 관찰하였다. 또한 라만 분광법을 이용하여 추가 주입 기체의 종류에 따른 탄소나노튜브의 결정성의 변화를 분석하였다. 실험결과, 산소를 추가로 주입하였을 때 성장률이 가장 컸고 결정성도 개선되는 것을 확인하였다. 최종적으로 150 분 동안 합성하여 기판 위에 2.7 mm 이상의 수직 정렬된 얇은 다중벽 탄소나노튜브(thin-multiwalled CNTs)를 합성할 수 있었다.

• 대한용접접합학회:학술대회논문집
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• 대한용접접합학회 2009년 추계학술발표대회
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• pp.7-7
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• 2009

TIG 용접에서는 후판 용접의 경우 용입의 한계 때문에 깊고 넓은 그루브 가공을 하여 다층 용접을 한다. 이 때, 그루브를 채우는 용착금속에 의한 응고 수축과 과대한 입열로 인한 변형이 문제시 되고 있다. 변형을 줄이기 위해서는 용착금속의 양과 입열량을 줄여야 한다. 이러한 문제를 해결하기 위해 그루브의 루트패이스를 두껍게 하고 그루브각을 줄여서 용착량을 줄인다. 이때, 좁은 그루브에서 두꺼운 루트패이스를 완전 용입할 수 있는 용접 프로세스가 필요하다. 비드가 좁고 깊은 용입 특성을 가지는 Plasma welding(PAW) 경우에는 좁은 그루브 속에 토치가 접근하기 어려워 적용하기 어렵다. 따라서 접근성이 용이한 TIG 용접에서 높은 용입형상비를 가지는 용접공정 개발이 필요하다. 선행연구로 높은 용입 형상비를 가지는 Active flux Tungsten Inert Gas(ATIG) 용접이 연구되었다. ATIG의 용입 증가 메커니즘으로는 Marangoni effect, 음이온들로 인한 아크 수축 효과, 절연 플럭스에 의한 아크 수축효과 등으로 알려져 있다. 또한 선행연구에서 ATIG에서 Ar가스에 He 또는 $H_2$ 가스를 첨가하면 용입이 더욱 증가하는 것을 확인하였다. 본 연구에서는 A-TIG에 He 가스를 적용하고 아크길이 0.5mm, 1.0mm, 2.0mm와 전극 선단각 30도, 60도, 90도에 따른 용입 형상비와 변형량을 검토하기 위해 실험을 하였다. 실험 결과는 아크길이가 감소할수록 전극 선단각이 증가할수록 용입 형상비는 증가하였고, 변형량은 감소하였다.

• 한국세라믹학회지
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• 제49권6호
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• pp.620-624
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• 2012

The role of moisture remaining inside the deposition chamber during the formation of the cubic boron nitride (c-BN) phase in BN film was investigated. BN films were deposited by an unbalanced magnetron sputtering (UBM) method. Single-crystal (001) Si wafers were used as substrates. A hexagonal boron nitride (h-BN) target was used as a sputter target which was connected to a 13.56 MHz radiofrequency electric power source at 400 W. The substrate was biased at -60 V using a 200 kHz high-frequency power supply. The deposition pressure was 0.27 Pa with a flow of Ar 18 sccm - $N_2$ 2 sccm mixed gas. The inside of the deposition chamber was maintained at a moisture level of 65% during the initial stage. The effects of the evacuation time, duration time of heating the substrate holder at $250^{\circ}C$ as well as the plasma treatment on the inside chamber wall on the formation of c-BN were studied. The effects of heating as well as the plasma treatment very effectively eliminated the moisture adsorbed on the chamber wall. A pre-deposition condition for the stable and repeatable deposition of c-BN is suggested.

• 한국분말재료학회지
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• 제26권4호
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• pp.282-289
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• 2019

Ti has received considerable attention for aerospace, vehicle, and semiconductor industry applications because of its acid-resistant nature, low density, and high mechanical strength. A common precursor used for preparing Ti materials is $TiCl_4$. To prepare high-purity $TiCl_4$, a process based on the removal of $VOCl_3$ has been widely applied. However, $VOCl_3$ removal by distillation and condensation is difficult because of the similar physical properties of $TiCl_4$ and $VOCl_3$. To circumvent this problem, in this study, we have developed a process for $VOCl_3$ removal using Cu powder and mineral oil as purifying agents. The effects of reaction time and temperature, and ratio of purifying agents on the $VOCl_3$ removal efficiency are investigated by chemical and structural measurements. Clear $TiCl_4$ is obtained after the removal of $VOCl_3$. Notably, complete removal of $VOCl_3$ is achieved with 2.0 wt% of mineral oil. Moreover, the refined $TiCl_4$ is used as a precursor for the synthesis of Ti powder. Ti powder is fabricated by a thermal reduction process at $1,100^{\circ}C$ using an $H_2-Ar$ gas mixture. The average size of the Ti powder particles is in the range of $1-3{\mu}m$.

• 한국분말재료학회지
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• 제17권5호
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• pp.365-372
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• 2010

The evolution of sinterability, microstructure and mechanical properties for the spark plasma sintered(SPS) Ti from commercial pure titanium(CP-Ti) was studied. The densification of titanium with 200 mesh and 400 mesh pass powder was achieved by SPS at $750{\sim}1100^{\circ}C$ under 10 MPa pressure and the flowing $H_2$+Ar mixed gas atmosphere. The microstructure of Ti sintered up to $800^{\circ}C$ consisted of equiaxed grains. In contrast, the growth of large elongated grains was shown in sintered bodies at $900^{\circ}C$ with the 400 mesh pass powder and the lamella grains microstructure had been developed by increasing sintering temperature. The Vickers hardness of 240~270 HV and biaxial strength of 320~340 MPa were found for the specimen prepared at $950^{\circ}C$.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.448-448
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• 2010

Magnetic random access memory (MRAM) has made a prominent progress in memory performance and has brought a bright prospect for the next generation nonvolatile memory technologies due to its excellent advantages. Dry etching process of magnetic thin films is one of the important issues for the magnetic devices such as magnetic tunneling junctions (MTJs) based MRAM. CoFeB is a well-known soft ferromagnetic material, of particular interest for magnetic tunnel junctions (MTJs) and other devices based on tunneling magneto-resistance (TMR), such as spin-transfer-torque MRAM. One particular example is the CoFeB - MgO - CoFeB system, which has already been integrated in MRAM. In all of these applications, knowledge of control over the etching properties of CoFeB is crucial. Recently, transferring the pattern by using milling is a commonly used, although the redeposition of back-sputtered etch products on the sidewalls and the low etch rate of this method are main disadvantages. So the other method which has reported about much higher etch rates of >$50{\AA}/s$ for magnetic multi-layer structures using $Cl_2$/Ar plasmas is proposed. However, the chlorinated etch residues on the sidewalls of the etched features tend to severely corrode the magnetic material. Besides avoiding corrosion, during etching facets format the sidewalls of the mask due to physical sputtering of the mask material. Therefore, in this work, magnetic material such as CoFeB was etched in an ICP etching system using the gases which can be expected to form volatile metallo-organic compounds. As the gases, carbon monoxide (CO) and ammonia ($NH_3$) were used as etching gases to form carbonyl volatiles, and the etched features of CoFeB thin films under by Ta masking material were observed with electron microscopy to confirm etched resolution. And the etch conditions such as bias power, gas combination flow, process pressure, and source power were varied to find out and control the properties of magnetic layer during the process.