• 한국재료학회지
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• 제12권8호
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• pp.676-681
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• 2002

Microstructure, mechanical properties, and oxidation resistance of TiAIN thin films deposited on quenched and tempered STD61 tool steel by arc ion plating were studied using XRD, XPS and micro-balance. The TiAIN film was grown with the (200) orientation. The grain size of TiAIN thin film decreased with increasing Al contents, while chemical binding energy increased with Al contents. When hard coating films were oxidized at $850^{\circ}C$ in air, oxidation resistance of both TiN and TiCN films became relatively lower since the surface of films formed non-protective film such as $TiO_2$. However, oxidation resistance of TiAIN film was excellent because its surface formed protective layer such as $_A12$$O_3$ and $_Al2$$Ti_{7}$$O_{15}$, which suppressed oxygen intrusion.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제50권5호
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• pp.221-225
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• 2001

The effect of $Al_2O_3+Y_2O_3$ additives on fracture toughness of ${\beta}-SiC-TiB_2$ composites by hot-pressed sintering was investigated. The ${\beta}-SiC-TiB_2$ ceramic composites were hot-press sintered and pressureless-annealed by adding 16, 20, 24 wt% ${\beta}-SiC-TiB_2$(6:4 wt%) powder as a liquid forming additives at low temperature(1800 $^{\circ}C$) for 4 h. Phase analysis of composites by XRD revealed mostly of ${\alpha}$-SiC(6H), $TiB_2$, and YAG($Al_5Y_3O_{12}$). The relative density was over 95-88 % of the theoretical density, and the porosity increased with increasing $Al_2O_3+Y_2O_3$ contents because of the increasing tendency of pore formation. The fracture toughness showed the highest value of 5.88 MPa${\cdot}m^{1/2}$ for composites added with 20 wt% $Al_2O_3+Y_2O_3$ additives at room temperature. The electrical resistivity showed the lowest value of $5.22{\times}10^{-4}\;{\Omega}\;{\cdot}\;cm$ for composite added with 20 wt% $Al_2O_3+Y_2O_3$ additives at room temperature, and was all positive temperature coefficeint resistance(PTCR) against temperature up to 900 $^{\circ}C$.

• 한국재료학회지
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• 제28권6호
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• pp.361-364
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• 2018

Binary Ti-Al alloys below 51.0 mass%Al content exhibit a breakaway, transferring from parabolic to linear rate law. The second $Al_2O_3$ layer might have some protectiveness before breakaway. Ti-63.1 mass%Al oxidized at 1173 K under parabolic law. Breakaway oxidation is observed in every alloy, except for Ti-63.1 mass%Al. After breakaway, oxidation rates of the binary TiAl alloys below 34.5 mass%Al obey almost linear kinetics. The corrosion rate of Ti-63.1 mass%Al appears to be almost parabolic. As content greater than 63.0 mass% is found to be necessary to form a protective alumina film. Addition of Mo improves the oxidation resistance dramatically. No breakaway is observed at 1123 K, and breakaway is delayed by Mo addition at 1173 K. At 1123 K, no breakaway, but a parabolic increase in mass gain, are observed in the Mo-added TiAl alloys. The binary Ti-34.5 mass%Al exhibits a transfer from parabolic to linear kinetics. At 1173 K, the binary alloys show vary fast linear oxidation and even the Mo-added alloys exhibit breakaway oxidation. The 2.0 mass%Mo-added TiAl exhibits a slope between linear and parabolic. At values of 4.0 and 6.0 mass% added TiAl alloys, slightly larger rates are observed than those for the parabolic rate law, even after breakaway. On those alloys, the second $Al_2O_3$ layer appears to be persistently continuous. Oxidation resistance is considerably degraded by the addition of Mn. Mn appears to have the effect of breaking the continuity of the second $Al_2O_3$ layer.

• 대한치과보철학회지
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• 제49권1호
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• pp.16-21
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• 2011

연구 목적: 높은 외력이 작용하는 부위의 임플란트 재료로서 사용되고 있는 Ti-6Al-7Nb 합금의 골유착을 개선하기 위한 방법의 하나로서 나노튜브 $TiO_2$ 층 생성하고 전석회화 처리한 다음 유사체액 중에서의 활성도를 알아보고자 하였다. 연구 재료 및 방법: 양극산화처리는 glycerol에 20 wt% $H_2O$와 1 wt% $NH_4F$를 혼합하여 준비한 전해질 수용액에 전압 20 V, 전류밀도 20 mA/$cm^2$의 조건에서 1시간동안 통전하였다. 전석회화처리는 $80^{\circ}C$의 $Na_2HPO_4$ 수용액에 30분 동안 침적하고, 이어서$100^{\circ}C$의 $Ca(OH)_2$ 포화 수용액에 30분 동안 침적하였으며, $500^{\circ}C$에서 2시간 동안 열처리하였다. 전석회화처리 후 표면층의 생체활성도를 조사하기 위해 $36.5^{\circ}C$, pH 7.4의 유사체액에 10일 동안 침적하였다. 결과: 1. 나노튜브 $TiO_2$ 층은 높은 자기정렬 형태를 갖고 큰 직경의 튜브들 사이 공간에 상대적으로 작은 직경의 튜브들이 생성되는 형태로 치밀한 구조를 이루었으며, 상부에서 하부로 갈수록 직경 감소를 보였다. 2.1 wt% $NH_4F$와 20 wt% $H_2O$를 함유하는 glycerol 전해액에서 20V의 전압을 인가하여 생성된 나노튜브들의 평균 길이는 $517.0{\pm}23.2\;nm$를 보였다. 3. 나노튜브 $TiO_2$ 층의 생체활성도는 $80^{\circ}C$의 0.5 M$Na_2HPO_4$ 수용액과 $100^{\circ}C$의 $Ca(OH)_2$ 포화 수용액에 침적하는 전석회화처리 군의 경우에 크게 개선되어, 아파타이트의 석출 과정에서 나타나는 치밀한 돌기상과 이들을 가로지르는 미세 균열상이 관찰되었다. 결론: Ti-6Al-7Nb 합금을 나노튜브 $TiO_2$ 층 생성 후 전석회화 처리한 결과 생체활성도가 개선되었다.

• 한국재료학회지
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• 제15권5호
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• pp.353-360
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• 2005

Surface treatment play an important role in nucleating calcium phosphate deposition on surgical Ti implant. Therefore, the purpose of this study is to examine whether the precipitation of apatite on cp-Ti and Ti alloys are affected by surface modification in HCl and $H_2O_2$ solution. Specimens were then chemically treated with a solution containing 0.1 M HCl and 8.8M $H_2O_2$ at $80^{\circ}C$ for 30 mins, and subsequently heat-treated at $400^{\circ}C$ for 1 hour. All specimens were immersed in the HBSS with pH 7.4 at $36.5^{\circ}C$ for 15 days, and the surface was examined with XRD, SEM, EDX ana XPS. Also, pure Ti, Ti-6Al-4V and Ti-6Al-7Nb alloy specimens with and without surface treatment were implanted in the abdominal connective tissue of mice for 4 weeks. All specimens chemically treated with HCl and $H_2O_2$ solution have the ability to form a apatite layer in the HBSS which has inorganic ion composition similar to human blood plasma. The average thickness of the fibrous capsule surrounding the specimens implanted in the connective tissue was $38.57\;{\mu}m,\;62.27\;{\mu}m\;and\;45.64\;{\mu}m$ in the cp-Ti, Ti-6Al-4V ana Ti-6Al-7Nb alloy specimens with the chemical treatment respectively, and $52.20\;{\mu}m,\;75.62\;{\mu}m\;and\;66.56\;{\mu}m$ in the commercial specimens of cp-Ti, Ti-6Al-4V and Ti-6Al-7Nb without any treatment respectively. The results of this evaluation indicate that the chemically treated cp-Ti, Ti-6Al-4V ana Ti-6Al-7Nb alloys have better bioactivity and biocompatibility compared to the other metals tested.

• 한국세라믹학회지
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• 제36권5호
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• pp.478-482
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• 1999

SrTiO3 :Al, Pr phosphor as an oxide compound phosphor is expect to be applied for a field emission display(FED). In this phosphor the excitation spectrum shows a different tendency according to an addition Al3+ and Pr3+ In this excitation spectrum the main peak at 359 nm represent excitation level of Pr3+(1S0longrightarrow1D2 transition) and the absorption characteristic according to Ti/Sr molar ratio is influenced by the structure symmetry. The emission spectrum exhibits the red luminescence with the radiative decay of the 1D2 states(1D2 longrightarrow3H4 transition) The concentration quenching phenomena at 1D2 state shows up as Al3+ and Pr3+ ion concentration increases.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2000년도 Proceedings of 5th International Joint Symposium on Microeletronics and Packaging
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• pp.103-108
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• 2000

The texture of Al/Ti thin films deposited on low-dielectric polymer substrates has been investigated. Fifty-nm-thick Ti films and 500-nm-thick Al-1%Si-0.5%Cu (wt%) films were deposited sequentially onto low-k polymers and SiO$_2$ by using a DC magnetron sputtering system. The texture of Al thin film was determined using X-ray diffraction (XRD) theta-2theta ($\theta$-2$\theta$) and rocking curve and the microstructure of Al/Ti films on low-k polymer and SiO$_2$ substrates was characterized by Transmission electron microscopy (TEM). hall thin films deposited on SiO$_2$ had stronger texture than those deposited on low-k polymer. The texture of Al thin films strongly depended on that of Ti films. Cross-sectional TEM resealed that Brains of Ti films on SiO$_2$ substrates had grown perpendicular to the substrate, while the grains of Ti films on SiLK substrates were farmed randomly. The lower degree of 111 texture of Al thin films on low-k polymer was due to Ti underlayer.

• 청정기술
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• 제14권3호
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• pp.171-175
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• 2008

본 연구에서는 첨가물이 전기화학적 성능에 미치는 효과를 알아보기 위해 실험변수로서 첨가물 $Al^{3+}$를 사용하였다. Zero-strain 삽입 혼합물로 알려진 $Li_{4}Ti_{5]O_{12}$에 $Al^{3+}$가 첨가된 $Li_{3.95}Al_{0.15}Ti_{4.9}O_{12}$를 high energy ball milling (HEBM)을 사용하여 고상반응으로 제조한 후에, $800,\;900,\;1000^{\circ}C$에서 열처리하여 시료를 제조하였다. 합성물질의 구조적 특성과 입자의 표면분석을 하기 위해 XRD (X-ray diffraction)와 SEM (scanning electron microscopy)을 사용하였으며, 이때의 입자의 분포는 대략 $0.2{\sim}0.6\;{\mu}m$ 정도로 측정되었다. 충/방전 실험은 $1.0{\sim}3.0 V$에서 하였으며, 가역용량, 사이클 안정성, 평탄 전압 등을 알아보았다. $Li_{3.95}Al_{0.15}Ti_{4.9}O_{12}$의 충방전 용량은 138 mAh/g이었다.

• 한국세라믹학회지
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• 제25권3호
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• pp.231-236
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• 1988

$Al_2O_3$ 기지에 미치는 2차상의 영향을 알아보기 위하여 SiC 입자를 5~20vol.% 분산시키고 소결조제로서 $TiO_2$ 또는 RY_2O_3$를 2.5wt.%첨가하여 180$0^{\circ}C$, $N_2$분위기 중에서 90분간 상압소결 하였다. SiC함량이 증가함에 따라 소결체의 밀도는 감소하였지만 기계적 물성은 증가하여 $Y_2O_3$를 소결조제로 첨가한 경우, 꺾임강도는 525MPa, 경도는 17.1GPa,파괴인성은 4.1 MPa.$m^{1/2}$ 정도의 최고값을 나타내었고 반면 $TiO_2$를 소결조제로 첨가한 경우 꺾임강도 285MPa , 경도 12.1GPa 정도의 값을 나타냈다. 그리고 이와 같은 기계적 물성의 증진은 주로 SiC의 복합화에 따른 균열의 편향과 $Al_2O_3$ 의 입자성장억제효과에 의한 것으로 밝혀졌다.

• 한국표면공학회지
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• 제26권5호
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• pp.235-244
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• 1993

The oxidation behavior of a two-phase(Ti3Al+TiAl) intermetallic compound, Ti-33.8wt%Al, has been in-vestigated in air at 800, 900 and $^1000{\circ}C$. Though the isothermal oxidation behavior followed a parabolic law up to 100$0^{\circ}C$ indicating that protective oxide scales were formed, the cyclic oxidation behavior followed a lin-ear law in the entire temperature range tested because flaky or stratified scales were usually spalled from the surface during cooling. During oxidation at 80$0^{\circ}C$, the alloy showed excellent oxidation resistance because continuous protective Al2O3 films were formed on the outermost surface of the alloy. However, above $900^{\circ}C$, the oxidation resistance of the alloy was decreased gradually because relatively non-protective TiO2 scales as well as some of Al2O3 scales were formed on the outer oxide scale. The oxidation mechanism of the alloy at different temperature was proposed.