• Journal of Radiation Protection and Research
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• 제11권2호
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• pp.123-129
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• 1986

Cs-137 및 Co-60감마선 조사장치를 사용하여 비임의 입체각이 $2.4{\pi}{\times}10^{-3}sr$에서 $17.3{\pi}{\times}10^{-3}sr$로 변함에 따른 공기의 산란인자와 두께 2.9cm 납 흡수체 사용에 따른 축적인자를 결정하였다. 그 결과 산란인자는 $1{\sim}1.064$, 축적인자는 $1.054{\sim}1.194$범위의 값을 갖는 것으로 각각 나타났다. 결정된 인자들의 검증을 위하여 계산값과 측정값을 비교한 결과 그 차이는 3.3%이하인 것으로 나타났다.

• 한국공작기계학회:학술대회논문집
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• 한국공작기계학회 2004년도 추계학술대회 논문집
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• pp.263-268
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• 2004

In the present study, a Nd;YAG Laser (pulse type) was used to emit ultrasonic signals to a test material. In addition, a total ultrasonic investigation system was designed by adopting a Fabry-Perot interferometer, which receives ultrasonic signals without any contact. For non-destructive test SM45C, which contains some flaws was used as a test material. Because it is easy to align light beam in receiver, and the length of the light beam does not change much even if convex mirror leans towards one side, confocal Fabry-Perot interferometer, which has stable frequency, and PI control are used to correct interfered and unstable signals from temperature, fluctuation and time shift of laser frequency. Stable signals are always obtained by the feedback of PI circuit signals in the confocal Fabry-Perot interferometer. The type, size and position of flaws inside the test material were examined by achieving the stabilization of an interferometer. This study presented a useful method, which could quantitatively investigate the fault of objects by using a Fabry-Perot interferometer.

• 한국재료학회지
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• 제17권10호
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• pp.509-515
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• 2007

In order to fabricate adhesiveless 2-layer flexible copper clad laminate (FCCL) used for COF (chip on film) with high peel strength, polyimide (PI; Kapton-EN, $38\;{\mu}m$) surface was modified by reactive $O_2^+$ and $N_2O^+$ ion beam irradiation. 300 mm-long linear electron-Hall drift ion source was used for ion irradiation with ion current density (J) higher than $0.5\;mA/cm^2$ and energy lower than 200 eV. By vacuum web coating process, PI surface was modified by linear ion source and then 10-20 nm thick Ni-Cr and 200 nm thick Cu film were in-situ sputtered as a tie layer and seed layer, respectively. Above this sputtered layer, another $8-9{\mu}m$ thick Cu layer was grown by electroplating and subsequently acid and base resistance and thermal stability were tested for examining the change of peel strength. Peel strength for the FCCLs treated by both $O_2^+$ and $N_2O^+$ ion irradiation showed similar magnitudes and increased as the thickness of tie layer increased. FCCL with Cu (200 nm)/Ni-Cr (20 nm)/PI structure irradiated with $N_2O^+$ at $1{\times}10^{16}/cm^2$ ion fluence was proved to have a strong peel strength of 0.73 kgf/cm for as-received and 0.34 kgf/cm after thermal test.

• Structural Engineering and Mechanics
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• 제76권3호
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• pp.279-291
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• 2020

The seismic design of conventional frame structures is meant to enhance plastic deformations at beam ends and prevent yielding in columns. To this end, columns are made stronger than beams. Yet yielding in columns cannot be avoided with the column-to-beam strength ratios (about 1.3) prescribed by seismic codes. Preventing plastic deformations in columns calls for ratios close to 4, which is not feasible for economic reasons. Furthermore, material properties and the rearrangement of geometric shapes inevitably make the distribution of damage among stories uneven. Damage in the i-th story can be characterized as the accumulated plastic strain energy (W_pi) normalized by the product of the story shear force (Q_yi) and drift (δ_yi) at yielding. Past studies showed that the distribution of the plastic strain energy dissipation demand, W_pi/ΣW_pj, can be evaluated from the deviation of Q_yi with respect to an "optimum value" that would make the ratio W_pi/(Q_yiδ_yi) -i.e. the damage- equal in all stories. This paper investigates how the soil type and ductility demand affect the optimum lateral strength distribution. New optimum lateral strength distributions are put forth and compared with others proposed in the literature.

• 한국지능시스템학회:학술대회논문집
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• 한국퍼지및지능시스템학회 2000년도 추계학술대회 학술발표 논문집
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• pp.335-339
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• 2000

In the weaving process, tension control of the warp is important. The variation of the warp tension cause irregularities of the weft density and low quality of the woven fabrics. Due to the fact that the warp tension varies in depending on the difference between take-up velocity and let-off velocity, it is necessary to regulate the velocity of let-off in relation to that of take-up for keeping the warp tension. Futhermore, the diameter of warp beam changes in the weaving process. The changing diameter of warp beam cause changing inertia of warp beam and the velocity of the let-off. It makes the control of such a system more complex. In this paper, we propose a fuzzy controller for the warp tension control. From the computer simulation, it was observed that a developed fuzzy controller has a better performance than that of conventional PI controller.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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• pp.328-329
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• 2005

Inorganic alignment layer (IAL) was deposited on an indium-tin-oxide (ITO) by using reactive sputtering deposition method. After deposited, IAL was irradiated by $Ar^+$ ion beam (IB) for liquid crystal (LC) alignment. IAL treated by various conditions such as IB energy, IB incident angle, and IB irradiation time had excellent alignment property and electro-optical property the same as that of PI. We investigated into the stability of ion beam treated IAL after a lapse of long time. However IAL irradiated IB did not occur degradation of electro-optical property. The results implied that IAL irradiated IB was adopted as LC alignment layer instead of rubbed polyimide.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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• pp.124-127
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• 2002

LC aligning capabilities and the variation of pretilt angles with ion beam irradiation on the a-C:H thin films, and electro-optical (EO) performances of the ion beam aligned twisted nematic (TN)-liquid crystal display (LCD) with oblique ion beam exposure on the a-C:H thin film were studied. A high pretilt angle of $3.5{^{\circ}}$ via ion beam irradiation on the a-C:H thin film was measured. Also, the LC pretilt angle decreased due to the increase in surface roughness at over 2 min of IB exposure time. It is considered that this roughness increase due to increasing IB exposure time that generated destroy of oriented rings of atoms related to LC alignment. An excellent voltage-transmittance (V-T) curve of the ion beam aligned TN-LCD was observed with oblique ion beam exposure on the a-C:H thin film for 1 min. Also, a faster response time for the ion beam aligned TN-LCD with oblique ion beam exposure on the a-C:H thin film for 1 min can be achieved. Finally, the residual DC property of the ion beam aligned TN-LCD with ion beam exposure of 1 min on the a-C:H thin film is almost same as that of the rubbing aligned TN-LCD on a PI surface.

• 한국자기학회지
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• 제10권1호
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• pp.30-36
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• 2000

Q switch mode 혹은 Fixed Q mode Nd-YAG 레이저 어블레이션법으로 (100)Si 기판위에 SmCo 박막을 증착하였다. 증착시 Sm$_{100-x}$Co$_{x}$ (73$\leq$x$\leq$93) 조성의 타겟을 사용하였고, 기판온도는 600~$700^{\circ}C$ 변화시켰으며 각 mode 에너지를 조절하였다. Q switching mode로 증착된 박막의 4$\pi$Ms, $_{i}$H$_{c}$ 및 4$\pi$M$_{r}$/4$\pi$M$_{s}$는 각각 5.2~7.7 kG, 190~250 Oe, 0.4~O.74이었다. 반면, Fixed Q mode로 얻어진 박막의 $_{i}$H$_{c}$, 4$\pi$M$_{r}$/4$\pi$M$_{s}$는 각각 430~6290 Oe, 0.32~0.91로 훨씬 양호한 경자기 특성이 나타났다. 후자의 자기특성은 박막에 존재하는 입자(droplet)내 SmCo$_{5}$ 와 Sm$_2$Co$_{17}$상의 생성에 의한 것으로 판단된다. 입자의 존재로 인한 박막표면의 거칠기는 향후 연구에서 해결되어야 할 문제점으로 확인되었다.문제점으로 확인되었다.었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 제5회 학술대회 논문집 일렉트렛트 및 응용기술연구회
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• pp.57-60
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• 2003

Electro-Optical (EO) performances for the ion beam (IB) aligned twisted-nematic (TN)-liquid crystal display (LCD) with ion beam exposure on the new of diamond like carbon (DLC) thin film surface were investigated. Voltage-transmittance (V-T) curve and response time without backflow bounce in the ion beam aligned TN-LCD with ion beam exposure for 0.5 and 1min on the DLC thin film was observed. Also. the fast response time of ion beam aligned TN-LCD with ion beam exposure for 1min on the DLC thin film surface can be achieved. The residual DC voltage of the ion beam aligned TN-LCD on the DLC thin film surface was almost the same as that of the rubbing aligned TN-LCD on the polyimide(PI) surface.

• 한국레이저가공학회지
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• 제16권3호
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• pp.27-31
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• 2013

To engrave high-density circuit-line patterns in IC substrates, we applied a projection ablation technique in which a dielectric ($ZrO_2/SiO_2$) mask, a DPSS UV laser instead of an excimer laser, a refractive beam shaping optics and a galvo scanner are used. The line/space dimension of line patterns of the dielectric mask is $10{\mu}m/10{\mu}m$. Using a ${\pi}$ -shaper and a square aperture, the Gaussian beam from the laser is shaped into a square flap-top beam; and a telecentric f-${\theta}$ lens focuses it to a $115{\mu}m{\times}105{\mu}m$ flat-top beam on the mask. The galvo scanner before the f-${\theta}$ lens moves the beam across the scan area of $40mm{\times}40mm$. An 1:1 projection lens was used. Experiments showed that the widths of the engraved patterns in a buildup film ranges from $8.1{\mu}m$ to $10.2{\mu}m$ and the depths from $8.8{\mu}m$ to $11.7{\mu}m$. Results indicates that it is required to increase the projection ratio to enhance profiles of the engraved patterns.