Fig. 1. Process flow chart.
Fig. 2. FE-SEM image of (a) nanoparticles (G0) and granulated microparticles by various annealing temperatures [(b) G1, (c) G2,and (d) G3].
Fig. 3. XRD patterns of (a) nanoparticles (G0) and granulated microparticles by various annealing temperatures [(b) G1, (c) G2,and (d) G3].
Fig. 4. Raman spectra of single crystalline Si as a reference, G0, and G3.
Fig. 5. Cycle performances of nanoparticles (G0) and granulated microparticles by various annealing temperatures (G1, G2, and G3).
Fig. 7. Initial reversible capacity (circle pattern), initial coulombicefficiency (square pattern), capacity retention (diamond pattern) andswelling after 50 cycles (triangle pattern) of G0, G1, G2, and G3.
Fig. 6. (a) The first voltage profiles and (b) differential capacities of nanoparticles (G0) and granulated microparticles by various annealing temperatures (G1, G2, and G3).
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