광택기 제조를 목적으로 한 스퍼터링을 이용한 Mo 증착과 불산 습식 식각 특성 연구

A Study on the Mo Sputtering and HF Wet Etching for the Fabrication of Polisher

  • 김도형 (에스에스디에이티 주식회사) ;
  • 이호덕 (에스에스디에이티 주식회사) ;
  • 권상직 (가천대학교 전자공학과) ;
  • 조의식 (가천대학교 전자공학과)
  • 투고 : 2017.11.14
  • 심사 : 2017.12.21
  • 발행 : 2017.12.31

초록

For the economical and environmental-friendly fabrication of polisher, Mo mask layer were sputtered on glass substrate instead of Cr mask material. Mo mask layers were sputtered by pulsed-DC sputtering and Photoresist patterns were formed on Mo mask layer for different develop times and optimized. After Mo mask layer were patterned and exposed glass was wet etched by HF solution for different etching times, the remaining Mo mask was stripped by using Al etchant. Develop time of 30 sec and HF wet etching time of 3 min were selected as optimized process condition and applied to the fabrication of polisher.

키워드

참고문헌

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  3. M Kolli, M Hamidouche, et al. "HF etching effect on sandblasted soda-lime glass properties" Journal of the European Ceramic Society, 29.13 (2009): 2697-2704. https://doi.org/10.1016/j.jeurceramsoc.2009.03.020
  4. CJ Jeong, Method for manufacturing fingernail/toenail polishing beauty apparatus capable of achieving simultaneous cutting and polishing and fingernail/toenail polishing beauty apparatus manufactured by method therefor, KR Patent, 10-2015-0002132 (2015).