10㎛-wide Pattern Engraving using Metal Specimens coated with a heterogeneous metal for Printed Electronics

이종 금속이 코팅된 금속소재를 이용한 인쇄전자소자용 선폭 10㎛급 패턴 가공

  • Sohn, Hyonkee (Department of Laser & Electron-beam Application, KIMM) ;
  • Cao, Binh Xuan (Department of Laser & Electron-beam Application, KIMM) ;
  • Cho, Yong-Kwon (Department of Laser & Electron-beam Application, KIMM) ;
  • Shin, Dong-Sig (Department of Laser & Electron-beam Application, KIMM) ;
  • Choi, Jiyeon (Department of Laser & Electron-beam Application, KIMM)
  • 손현기 (한국기계연구원 광응용기계연구실) ;
  • 카오 후안 빈 (한국기계연구원 광응용기계연구실) ;
  • 조용권 (한국기계연구원 광응용기계연구실) ;
  • 신동식 (한국기계연구원 광응용기계연구실) ;
  • 최지연 (한국기계연구원 광응용기계연구실)
  • Received : 2014.12.24
  • Accepted : 2014.12.29
  • Published : 2014.12.31

Abstract

In printed electronics, printing rolls are used to transfer electronic ink onto a flexible substrate. Generally printing rolls are patterned in microscale by the indirect laser method. Since based on the wet etch process, the indirect method is neither environment-friendly nor suitable for making a printing roll with patterns narrower than $20{\mu}m$. In this paper, we have directly engraved micro-patterns into a Zn-coated metal specimens using a picosecond laser in order both to engrave $10{\mu}m$-wide patterns and to improve the pattern profile. Experiments showed that it is possible to engrave $10{\mu}m$-wide patterns with an a rectangular-shaped profile which is necessary for the dimensionally accurate printing.

Keywords