DOI QR코드

DOI QR Code

Demonstration of MEMS Inductor on the LTCC Substrate

LTCC 기판위에 MEMS 인덕터 특성 연구

  • 박제영 (인하대학교 전자공학과) ;
  • 차두열 (인하대학교 전자공학과) ;
  • 김성태 (인하대학교 전자공학과) ;
  • 강민석 (인하대학교 전자공학과) ;
  • 김종희 (요업기술원 시스템모듈사업단) ;
  • 장성필 (인하대학교 전자공학과)
  • Published : 2007.12.01

Abstract

Lots of integration work has been done in order to miniaturize the devices for communication. To do this work, one of key work is to get miniaturized inductor with high Q factor for RF circuitry. However, it is not easy to get high Q inductor with silicon based substrate in the range of GHz. Although silicon is well known for its good electrical and mechanical characteristics, silicon has many losses due to small resistivity and high permittivity in the range of high frequency. MEMS technology is a key technology to fabricate miniaturized devices and LTCC is one of good substrate materials in the range of high frequency due to its characteristics of high resistivity and low permittivity. Therefore, we proposed and studied to fabricate and analyze the inductor on the LTCC substrate with MEMS fabrication technology as the one of solutions to overcome this problem. We succeeded in fabricating and characterizing the high Q inductor on the LTCC substrate and then compared and analyzed the results of this inductor with that on a silicon and a glass substrate. The inductor on the LTCC substrate has larger Q factor value and inductance value than that on a silicon and a glass substrate. The values of Q factor with the LTCC substrate are 12 at 3 GHz, 33 at 6 GHz, 51 at 7 GHz and the values of inductance is 1.8, 1.5, 0.6 nH in the range of 5 GHz on the silicon, glass, and LTCC substrate, respectively.

Keywords

References

  1. Clark T. C. Nguyen, Linda P. B. Katehi, and Gabriel M. Rebeix, 'Micromachined devices for wireless communications', Proceeding of the IEEE, Vol. 86, No.8, p. 1756, 1998 https://doi.org/10.1109/5.704281
  2. R. P. Ribas, J. Lescot, J.-L. Leclercq, J. M. Karam, and F. Ndagihimana, 'Micromachined microwave planar spiral inductors and transformers', IEEE Trans. Microwave Theory Tech., Vol. 48, p. 1326, 2000 https://doi.org/10.1109/22.859477
  3. H. Jiang, Y. Wang, J.-L. A. Yeh, and N. C. Tien, 'On-chip spiral inductors suspended over deep copper-lined cavities', IEEE Trans. Microwave Theory Tech., Vol. 48, p. 2415, 2000 https://doi.org/10.1109/22.898992
  4. N. P. Pham, P. M. Sarro, K. T. Ng, and J. N. Burghartz, 'IC-compatible two-level bulk micromaching process module for RF silicon technology', IEEE Trans. Electron Devices, Vol. 48 p. 1756, 2001 https://doi.org/10.1109/16.936704
  5. Y.-J. Kim and M. G. Allen, 'Surface micromachined solenoid inductors for high frequency applications', IEEE Trans. Comp., Packag., Manufact. Technol. C, Vol. 21, p. 26, 1998 https://doi.org/10.1109/3476.670025
  6. J.-B. Yoon, C.-H. Han, E. Yoon, and C.-K. Kim, 'High-performance three-dimensional onchip inductors fabricated by novel micromachining technology for RF MMIC', in IEEE Int. Microwave Symp. Dig., p. 1523, 1999
  7. J. Y. Park and M. G. Allen, 'High Q spiraltype microinductors on silicon substrates' , IEEE Trans. Magn., Vol. 35, p. 3544, 1999 https://doi.org/10.1109/20.800584
  8. J.-B. Yoon, B.-K. Kim, c.-H. Han, E. Yoon, and C. - K. Kim, 'Surface micromachined solenoid on-Si and on-glass inductors for RF applications', IEEE Electron Device Lett., Vol. 20, p. 487, 1999 https://doi.org/10.1109/55.784461
  9. J.-B. Yoon, C.-H. Han, E. Yoon, and C.-K. Kim, 'Monolithic high-Q overhang inductors fabricated on silicon and glass substrates', in IEDM tech, Dig., p. 753, 1999
  10. J. W. M. Rogers, V. Levenets, C. A. Pawlowicz, N. G. Tarr, T. J. Smy, and C. Plett, 'Post-processed Cu inductors with application to a completely integrated 2-GHz VCO', IEEE Trans. Electron Devices, Vol. 48, p. 1284, 2001 https://doi.org/10.1109/16.925264
  11. E.-C. Park, J.-B. Yoon, S. Hong, and E. Yoon, 'A 2.6 GHz low phasenoise VCO monolithically integrated with high Q MEMS inductors', in 28th Eur. Solid-State Circuits Conf., 2002
  12. Y. E. Chen, Y. K. Y oon, J. Laskar, and M. Allen, 'A 2.4 GHz integrated CMOS power amplifier with micromachined inductors', in IEEE Int. Microwave Symp. Dig., p. 523, 2001
  13. J. Zou, J. G. Nickel, D. Trainor, C. Liu, and J. E. Schutt-Aine, 'Development of vertical planar coil inductors using plastic deformation magnetic assembly(PDMA)', in IEEE Int. Microwave Symp, Dig., p. 193, 2001
  14. H.-S. Kim, D. Zheng, A. J. Becker, and Y.-H. Xie, 'Spiral inductors on Si p/p+ substrates with resonent frequency of 20 GHz', IEEE Electron Device Lett., Vol. 22, p. 275, 2001 https://doi.org/10.1109/55.924840
  15. J.-B. Yoon, Y-S. Choi, B.-I. Kim, Y. S. Eo, and E. S. Yoon, 'CMOS-Compatible surface-micromachined suspended-spiral inductors for multi-GHz silicon RF ICs', IEEE Electron Device Lett., Vol. 23, p. 591, 2002 https://doi.org/10.1109/LED.2002.803767
  16. R. L. Brown, A. A. Shapiro, and P. W. Polinski, 'The integration of passive components into MCMs using advanced low-temperature cofired ceramics', The Int. Journ. of Microcircuits and Electron. Packaging, Vol. 16, No.4, p. 328, 1993
  17. A.-T. Le, W.-S. Cho, Y.-S. Kim, J.-B. Lee, C. -O. Kim, and H. B. Lee, 'A micro-LC-resonator fabricated by MEMS technique for high-frequency sensor applications', Sensor and Actuators A: Phys., Vol. 135, p. 547, 2007 https://doi.org/10.1016/j.sna.2006.10.023
  18. Burghartz, J. N., 'Progress in RF inductors on silicon-understanding substrate losses', Electron Devices Meeting, 1998. IEDM '98 Technical Digest., International, p. 523, 1998

Cited by

  1. Fabrication of the Micromachined Transformer using High Permeability NiFe Core vol.23, pp.3, 2010, https://doi.org/10.4313/JKEM.2010.23.3.194