Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
권호 표지
DOI QR코드

DOI QR Code

Dependence on the Oxygen Gas of ITO Thin film for TOLED by Facing Targets Sputtering Method

대향타겟식 스퍼터링법을 이용한 TOLED용 ITO 박막의 산소 가스 의존성

  • 금민종 (경원대학교 전기공학과) ;
  • 김경환 (경원대학교 전기공학과)
  • Published : 2006.01.01
Download PDF
⟨ Previous Next ⟩

Abstract

In case of preparation of ITO thin film for using top electrode of Top-emitting Organic Light Emitting Diodes(TOLEDs), the ITO thin film should be prepared at room temperature and low oxygen gas flow condition in order to reduced the damage of organic layer due to the bombardment of highly energetic particles such as negative oxygen ions which accrued from the plasma. In this study, the ITO thin film with high optical transmittance and low resistivity prepared as a function of oxygen gas (0 ${\~}$ 0.8 sccm) and Ar gas was fixed at 20 sccm by the Facing Targets Sputtering (FTS) method. The electrical and optical properties of ITO thin films were measured by Hall effect measurement, UV/VIS spectrometer, respectively In the results, we obtained the ITO thin film with lowest resistivity($3{\times}10^{-4} {\Omega}{\cdot} cm$) at oxygen gas flow 0.2 sccm and optical transmittance over $80\%$ at oxygen gas flow over 0.2 sccm.

Keywords

References

  1. C. W. Tang and S. AI. Vanslyke, 'Organic electroluminescent diodes', Appl. Phys. Lett., Vol. 51, No. 12, p. 913, 1987
  2. Y. Yang and A. H. Heeger, 'Polyaniline as a transparent electrode for polymer light-emitting diodes with polyethylene dioxythiophene polystyrene sulfonate as the transparent anode', Synth. Metals, Vol. 87, p. 171, 1997 https://doi.org/10.1016/S0379-6779(97)03823-X
  3. S. A Carter, M. Angelopoulos, S. Karg, P. J. Brock, and J. C. scott, 'Polymeric anodes for improved polymer light-emitting diode performance', Appl. Phys. Lett., Vol. 70, No. 16, p. 2067, 1997 https://doi.org/10.1063/1.118953
  4. Y. Hoshi, H. Kato, and K. Funatsu, 'Structure and electrical properties of ITO thin films deposited at high rate by facing target sputtering', Thin solid films, Vol. 445, p. 245, 2003 https://doi.org/10.1016/S0040-6090(03)01182-9
  5. K. Ishibashi, K. Hirata, and N. Hosokawa, 'Mass spectrometric ion analysis in the sputtering of oxide targets', J. Vac. Sci. Technol. A, Vol. 10, No.4, p. 1719, 1992
  6. K. Tominaga, T. Ueda, T. Ao, A Katkoka, and I. Mori, 'ITO films prepared by facing target sputtering system', Thin Solid Films, Vol. 281-282, No. 1-2, p. 194, 1996
  7. 김건희, 금민종, 김한기, 손인환, 장경욱, 이원재, 최형욱, 박용서, 김경환, 'FTS법을 이용한 ITO 박막의 제작', 전기전자재료학회논문지, 17권, 11호, p. 1230, 2004
  8. 추혜용, 'Flexible OLED 기술 동향', 전기전자재료학회지, 17권, 8호, p. 13, 2004
  9. 금민종, 김경환, '대향타겟스퍼링법에 의한 FBAR용 AZO(ZnO:AI) 박막의 제작', 전기전자재료학회논문지, 17권, 4호, p. 442, 2004
  10. 금민종, 손인환, 최명규, 추순남, 최형욱, 신영화, 김경환, ;FBAR용 $ZnO/SiO_{2}/Si $ 박막의 결정학적 특성에 관한 연구', 전기전자재료학회논문지, 16권, 8호, p. 711, 2003
  11. 김경환, 손인환, 금민종, '대향타겟식 스퍼터링에 의한 Co-Cr 박막의 제작', 전기전자재료학회논문지, 11권, 5호, p. 418, 1998
  12. M. Bender, W. Seeling, C. Daube, H. Frankenberger, B. Ocker, and J. Stollenwerk, 'Dependence of oxygen flow on optical and electrical properties of DC-magnetron sputtering ITO films', Thin Solid Films, Vol. 326, p. 72, 1998 https://doi.org/10.1016/S0040-6090(98)00521-5