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Work Function Changes on MgO Protective Layer after O2plasma Treatment from Ion-induced Secondary Electron Emission Coefficient

산소 플라즈마 처리후의 이차전자방출계수(γ)를 이용한 MgO 보호막의 일함수(φW) 변화

  • 정재천 (광운대학교 전자물리학과) ;
  • 유세기 (한국외국어대학교 전자물리학과) ;
  • 조재원 (광운대학교 전자물리학과)
  • Published : 2005.03.01

Abstract

The changes in secondary electron emission coefficient(${\gamma}$) and work function($\Phi$$_{\omega}$) have been studied on the surface of MgO protective layer aster plasma(Ar. $O_2$) treatment using ${\gamma}$-focused ion beam (${\gamma}$-FIB) system. The values of ${\gamma}$ varied as follows: $O_2$-treated MgO > Ar-treated MgO > Non-treated MgO, and the work functions varied in the reverse order. The result indicates that both the physical etching and the chemical reaction of $O_2$-plasma removed the contaminating materials from the surface of MgO.

Keywords

References

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