DOI QR코드

DOI QR Code

Electrical and Optical Properties of ITO Thin films Prepared on the PET Substrate

PET 기판 위에 증착된 ITO 투명전도막의 전기적ㆍ광학적 특성

  • 송우창 (삼척대학교 전기제어공학부)
  • Published : 2004.12.01

Abstract

ITO films on PET substrate were prepared by DC magnetron sputtering method using powdery target with different deposition conditions. In addition, the electrical and optical properties were investigated. As the sputtering power and working pressure were higher, the resistvity of ITO films increased. The optical transmittance deteriorated with increasing sputtering power and thickness. As the working pressure increased, however, the optical transmittance improved at visible region of light. From these results, we could deposited ITO films with 8${\times}$10$^{-3}$ $\Omega$-cm of resistivity and 80 % of transmittance at optimal conditions.

Keywords

References

  1. Bi-Shiou Chiou, Shu-Ta Hsieh, and Wen-Fa Wu, 'Deposition of indium tin oxide films on acrylic substrates by radio-frequency magnetron sputtering', J. Am. Ceram. Soc., Vol. 77, p. 1740, 1994 https://doi.org/10.1111/j.1151-2916.1994.tb07044.x
  2. A. K. Kulkarni, K. H. Schulz, T. S. Lim, and M. Khan, 'Electrical, optical and structural characteristics of indium-tin-oxide thin films deposited on glass and polymer substrates', Thin Solid Films, Vol. 270, p. 1, 1997 https://doi.org/10.1016/0040-6090(95)06833-3
  3. T. Minami, H. Sonohara, T. Kakumu, and S. Takata, 'Physics of very thin ITO conducting films with high transparency prepared by DC magnetron sputtering', Thin Solid Films, Vol. 270, p. 37, 1995 https://doi.org/10.1016/0040-6090(95)06889-9
  4. Wen-Fa Wu and Bi-Shiou, 'Deposition of indium tin oxide films on polycarbonate substrates by radio-frequency magnetron sputtering', Thin Sold Films, Vol. 298, p. 221, 1997 https://doi.org/10.1016/S0040-6090(96)09311-X
  5. A. K. Kulkarni, T. S. Lim, M. Khan, and Kirk H. Schulz, 'Electrical, optical, and structural properties of indium-tin-oxide thin films deposited on polyethylene terephthalate substrates by rf sputtering', J. Vac. Sci. Technol., Vol. A16(3), p.1636, 1998
  6. E. Terzini, P. Thilakan, and C. Minarini, 'Properties of ITO thin films deposited by RF magnetron sputtering at elevated substrate temperature', Mat. Sci. Eng., Vol. B77, p. 110, 2000
  7. I. Baia, B. Fernandes, P. Nunes, M. Quintela, and R. Martins, 'Influence of the process parameters on structural and electrical properties of r.f. magnetron sputtering ITO films', Thin Solid Films, Vol. 383, p. 244, 2001 https://doi.org/10.1016/S0040-6090(00)01589-3
  8. M. J. Brett, R. W. McMahon, J. Affinito, and R. R. Parsons, 'High rate planar magnetron deposition of transparent, con-ducting, and heat reflecting films on glass and plastic', J. Vac. Sci. Technol., Vol. A1(2), p. 352, 1983
  9. B. S. Chiou and S. T. Hsieh, 'R. F. magnetron-sputtered indium tin oxide film on a reactively ion-etched acrylic sub-strate', Thin Solid Films, Vol. 229, p. 146, 1993 https://doi.org/10.1016/0040-6090(93)90357-U
  10. 박강일, 김병섭, 임동건, 이수호, 곽동주, 'Bias 전압에 따른 ZnO : AI 투명 전도막의 전기적 특성', 전기전자재료학회논문지, 17권, 7호, p. 738, 2004
  11. Y. K. Yang, 'A method of increasing the utilization ratio of planar magnetron sputtering targets', Surf. and Coat. Techol., Vol. 37, p. 315, 1989 https://doi.org/10.1016/0257-8972(89)90112-6
  12. Wen-Fa Wu and Bi-Shiou Chiou, 'Properties of radio-frequency magnetron sputtered ITO films without in-situ substrate heating and post-deposition annealing', Thin Solid Films, Vol. 247, p. 201, 1994 https://doi.org/10.1016/0040-6090(94)90800-1
  13. C. V. R. Vasant Kumar and Abhai Mansingh, 'Effect of target-substrate dis-tance on the growth and properties Rf-sputtered indium tin oxide films', J. Appl. Phys., Vol. 65(3), p. 1270, 1989 https://doi.org/10.1063/1.343022
  14. M. A. Martinez, J. Herrero, and M. T. Gutierrez, 'Post-deposition annealing effects in RF reactive magnetron sputtered indium tin oxide thin films', Sol. Energy Mater. and sol. cells, Vol. 26, p. 309, 1992 https://doi.org/10.1016/0927-0248(92)90050-Y
  15. W.-F. Wu, B.-S. Chiou, and S.-T., 'Effect of sputtering power on the structural and. optical properties of RF mangnetron sputtered ITO films', Hsieh, Semicond. Sci. Technol., Vol. 9, p. 1242, 1994. https://doi.org/10.1088/0268-1242/9/6/014