Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Dry-etch Characteristics of InP/InGaAsP Photonic Crystal Structure

InP/InGaAsP 광자결정 구조 제작을 위한 건식 식각 특성

  • 이지면 (국립순천대학교 재료금속공학과)
  • Published : 2004.12.01
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Abstract

Two-dimensionally arrayed nanocolumn lattices were fabricated by using double-exposure laser holographic method. The hexagonal lattice was formed by rotating the sample with 60 degree while the square lattice by 90 degree before the second laser-exposure. The reactive ion etching for a typical time of 30 min using CH$_4$/H$_2$ plasma enhanced the aspect-ratio by more than 1.5 with a slight increase of the bottom width of columns. The etch-damage was observed by photoluminescence (PL) spectroscopy which was removed by the wet chemical etching using HBr/$H_2O$$_2$/$H_2O$ solution, leading into the enhanced PL intensities of the PCs.

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References

  1. E. Yablonovitch, 'Photonic band-gap structures', J. Opt. Soc. Am. B, Vol. 10, No. 2, p. 283, 1993 https://doi.org/10.1364/JOSAB.10.000283
  2. E. Chow, S. Y. Lin, S. G. Johnson, P. R. Villeneuve, J. D. Joannopoulos, J. R. Wendt, G. A. Vawter, W. Zubrzycki, H. Hou, and S. Alleman, 'Three-dimensional control of light in a two-dimensional photonic crystal slab', Nature, Vol. 407, No. 6807, p. 983, 2000 https://doi.org/10.1038/35039583
  3. T. Ohira, T. Segawa, K. Nagai, K. Utaka, and M. Nakao, 'Large area InP submicron two-dimensional (2D) periodic structures fabricated by two-time laser holography', Jpn. J Appl. Phys., Vol. 41, No. 2B, p. 1085, 2002 https://doi.org/10.1143/JJAP.41.1085
  4. S. C. Kitson, W. L. Barnes, and J R. Sambles, 'The fabrication of submicron hexagonal arrays using multiple-exposure optical interferometry', IEEE Photon. Technol. Lett., Vol. 8, No. 12, p. 1662, 1996 https://doi.org/10.1109/68.544711
  5. T. F. Krauss, 'Photonic Crystals and Light Localizaion in the 21st Century', C. M. Soukoulis, Ed., Kluwer Academic Publishers, p. 131, 2001
  6. C. A. Mack, 'Development of positive photoresists', J Electronchem. Soc., Vol. 134, No.1, p. 148, 1987 https://doi.org/10.1149/1.2100396
  7. B. A. Mello, 1. F. da Costa, C. R. A. Lima, and L. Cescato, 'Developed profile of holographically exposed photoresist gratings', Appl. Optics, Vol. 34, No.4, p. 597, 1995 https://doi.org/10.1364/AO.34.000597
  8. J M. Lee, S. H. Oh, C. W. Lee, H. Ko, S. Park, K. S. Kim, and M. H. Park, 'Fabrication InGaAsP/lnP two-dimensional periodic nanostructure with variable sizes and periods using laser holography and reactive ion etching', Electrochem. Solidstate Lett., Vol. 7, No.1, p. 11, 2004
  9. 김성대, 정석용, 이병택, 허종수, 'BC13/H2/Ar유도결합 플리즈마를 이용한 GaN의 건식식각특성', 전기전자재료학회논문지, 10권 3호, p.179,2000
  10. 백인규, 임완태, 이제원, 조관식 'BC13/Ne 혼합가스를 이용한 III-V 반도체의 고밀도 유도결합 플리즈마 식각', 전기전자재료학회논문지, 16권,12S호, p 1187, 2003
  11. I. Adesida, K. Nummila, E. Andideh, J.Hughes, C. Caneau, B. Bhat, and R.Holmstrom, 'Nanostructure fabrication in InP and related compounds', J. Vac. Sci.Technol. B, Vol. 8, No.6, p. 1357, 1990 https://doi.org/10.1116/1.585077
  12. D. M. Manos and D. L. Flamm, "Plasma Etching, an Introduction", D. M. Manos and D.L. Flamm, Ed., Academic press, p. 138, 1989
  13. B. Corbett and W. M. Kelly, 'Surface recombination in dry etched AlGaAs/GaAs double heterostructures p-i-n mesa diode', Appl. Phys, Lett., Vol. 62, No.1, p. 87, 1993 https://doi.org/10.1063/1.108781
  14. 강명구, 김경태, 김창일, '유도결함 플리즈마에 의해 식각된 PZT 박막의 식각 damage 개선', 전기전자재료학회 논문지,14권 7호, p551.2001
  15. S. W. Pang, 'Handbook of Advanced Plasma Processing Techniques', R. J. Shul and S. J. Pearton, Ed., Springer, p. 344, 2000
  16. T. Baba and T. Matsuzaki, 'Fabrication and photoluminescence studies of GaInAsP/InP2-dimensional photonic crystals', Jpn. J.Appl, Phys., Vol. 35, No. 2B, p. 1348, 1996 https://doi.org/10.1143/JJAP.35.1348