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Fabrication of a fast Switching Thyristor by Proton Irradiation Method

양성자 조사법에 의한 고속스위칭 사이리스터의 제조

  • 김은동 (전력반도체연구그룹, 한국전기연구원) ;
  • 장창리 (전력반도체연구그룹, 한국전기연구원) ;
  • 김상철 (전력반도체연구그룹, 한국전기연구원) ;
  • 김남균 (전력반도체연구그룹, 한국전기연구원)
  • Published : 2004.12.01

Abstract

A fast switching thyristor with a superior trade-off property between the on-state voltage drop and the turn-off time could be fabricated by the proton irradiation method. After making symmetric thyristor dies with a voltage rating of 1,600 V from 350 $\mu$m thickness of 60 $\Omega$ㆍcm NTD-Si wafer and 200 $\mu$m width of n-base drift layer, the local carrier lifetime control by the proton irradiation was performed with help of the HI-13 tandem accelerator in China. The thyristor samples irradiated with 4.7 MeV proton beam showed a superior trade-off relationship of $V_{TM}$ = 1.55 V and $t_{q}$ = 15 $\mu$s attributed to a very narrow layer of short carrier lifetime(~1 $\mu$s) in the middle of its n-base drift region. To explain the small increase of $V_{TM}$ , we will introduce the effect of carrier compensation at the low carrier lifetime region by the diffusion current.ffusion current.t.

Keywords

References

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