Modeling of Dielectric Barrier Discharge Plasma Process for the Removal of Nitric Oxide

유전체 방전 플라즈마 공정에 의한 일산화질소 제거 공정 모델링

This study proposes a mathematical model to characterize the removal of nitrogen oxides in a dielectric barrier discharge plasma process. As well as the reactions between nitrogen oxides, water vapor, oxygen and nitrogen, the model takes into account the effect of ethylene often used as a chemical additive to reduce the power consumption of the process on the removal of nitrogen oxides. Since the concentrations of the radicals concerned in the main reactions including O, OH, H and N should be calculated to predict the removal efficiency of nitrogen oxides, they were theoretically derived. The parameters affecting the removal of nitrogen oxides, such as initial concentration, discharge power, humidity, and ethylene concentration were experimentally evaluated, which were compared with the calculated results to verify the validity of the model proposed. The predicted concentrations of several byproducts formed in this process were also presented and discussed. The effects of several parameters mentioned above on the removal of nitrogen oxides were reasonable described by the proposed model.