Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Study of Non-uniform Plasma Layer Variation with Optically-Controlled Microwave Pulses

  • Wang, Xue (Division of Electrical Electronic & Information Engineering, Wonkwang University) ;
  • Yun, Ji-Hun (Division of Electrical Electronic & Information Engineering, Wonkwang University) ;
  • Kim, Yong-K. (Division of Electrical Electronic & Information Engineering, Wonkwang University)
  • Published : 2009.06.18
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Abstract

We study of the variation on non-uniform plasma in different layer of the semiconductor. The transient response in different plasma layer has been evaluated theoretically. The reflection function of dielectric microstrip lines resulting from the presence of plasma are evaluated by the transmission line model. The diffusion length is small compared to the absorption depth. The variation of characteristic response in plasma layer with microwave pulses which has in localized has been evaluated.

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