Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2009.06a
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- Pages.73-73
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- 2009
Study of etching properties of the $HfAlO_3$ thin film using the inductively coupled plasma
유도결합 플라즈마를 이용한 $HfAlO_3$ 박막의 식각특성 연구
- Ha, Tae-Kyung (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Kim, Dong-Pyo (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Woo, Jong-Chang (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Um, Doo-Seung (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Yang, Xue (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Joo, Young-Hee (School of Electrical and Electronics Engineering, Chung-Ang University) ;
- Kim, Chang-Il
- 하태경 (전자전기공학부, 중앙대학교) ;
- 김동표 (전자전기공학부, 중앙대학교) ;
- 우종창 (전자전기공학부, 중앙대학교) ;
- 엄두승 (전자전기공학부, 중앙대학교) ;
- 양설 (전자전기공학부, 중앙대학교) ;
- 주영희 (전자전기공학부, 중앙대학교) ;
- 김창일
- Published : 2009.06.18
Abstract
트렌지스터의 채널 길이가 줄어듦에 따라 절연층으로 쓰이는