Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2007.08a
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- Pages.248-248
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- 2007
An investigation of ultra low dielectric constant SiOC(-H) thin films for interconnect technology;Understanding the requirements
- Navamatbavan, R. (Nano Thin Film Materials Laboratory, Department of Physics) ;
- Lee, Heon-Ju (Department of Mechanical, Energy and Production Engineering) ;
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Lee, Kwang-Man
(Faculty of Electrical and Electronics Engineering, Cheju National University) ;
- Choi, Chi-Kyu (Nano Thin Film Materials Laboratory, Department of Physics)
- Published : 2007.08.15
Abstract
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