$\delta$-상 Sb-Te을 이용한 상변화 기억소자에서 과다 Sb에 의한 Ovonic 스위칭 특성 변화

  • 김용태 (반도체 재료 및 소자 연구실, 한국과학기술연구원) ;
  • 염민수 (반도체 재료 및 소자 연구실, 한국과학기술연구원) ;
  • 김성일 (반도체 재료 및 소자 연구실, 한국과학기술연구원) ;
  • 이창우 (나노전자물리학과, 국민대학교)
  • 발행 : 2007.06.08

초록

We have prepared $\delta$-phase SbTe alloy with various Sb contents of 64, 72, and 76 at. % and investigated the phase change temperature, the crystal structures of $\delta$-phase SbTe alloy, and determined the ovonic threshold switching voltages with edge contact type phase transition dimensions. As a result, the crystallization temperature is slightly reduced from 126 to $122^{\circ}C$, whereas the melting temperature is not changed. The ovonic threshold switching voltage is reduced from 1.6 to 0.9 V as increasing the Sb content from 64 to 76 at. %. It is found that the reductions of crystallization temperature and the ovonic threshold switching voltage are closely related with the interplanar spacing between adjacent atomic layers and the stacking number of atomic layers in a unit cell.

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