한국재료학회:학술대회논문집 (Proceedings of the Materials Research Society of Korea Conference)
- 한국재료학회 2006년도 추계학술발표대회 및 제11회 신소재 심포지엄
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- Pages.15.2-15.2
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- 2006
Effect of Alkaline Agent in Colloidal-Silica Slurry Polysilicon Chemical-Mechanical Polishing Process
- Park, Keum-Seok (Nano SOI process Lab. Hanyang University) ;
- Lee, Myoung-Yoon (Nano SOI process Lab. Hanyang University) ;
- Park, Hyung-Soon (Hynix Semiconductor Inc.) ;
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Paik, Un-Gyu
(Department of Ceramic Engineering)
;
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Park, Jea-Gun
(Nano SOI process Lab. Hanyang University)
- 발행 : 2006.11.03