한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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- Pages.70-71
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- 2005
패드 컨디셔닝 온도 변화가 ITO 박막 연마특성에 미치는 영향
CMP Properties of ITO Thin Film with a Control of Temperature in Pad Conditioning Process
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Choi, Gwon-Woo
(Chosun University) ;
- Kim, Nam-Hoon (Chosun University) ;
- Seo, Yong-Jin (Daebul University) ;
- Lee, Woo-Sun (Chosun University)
- 발행 : 2005.11.10
초록
The material that is both conductive in electricity and transparent to the visible ray is called transparent conducting thin film. It is investigated the performance of ITO-CMP process using commercial silica slurry with the various conditioning temperatures by control of de-ionized water (DIW). Removal rate of ITO thin film was improved after CMP process after pad conditioning at the high temperature by improved exclusion of slurry residues in polishing pad..