Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2004.07c
- /
- Pages.1820-1822
- /
- 2004
A Study on the Contaminants Precision Cleaning of Etched Silicon Wafer by Ozone/UV
오존/자외선에 의한 실리콘 웨이퍼의 정밀세정에 관한 연구
- Park, H.M. (Yeungnam Univ) ;
-
Lee, C.H.
(Yeungnam Univ)
;
- Chun, B.J. (leewoo Smartech) ;
- Yoon, B.H. (Yeungnam Univ) ;
- Lim, C.H. (Yeungnam Univ) ;
- Song, H.J. (Kumi 1 College) ;
- Kim, Y.H. (Pohang 1 College) ;
- Lee, K.S. (Yeungnam Univ)
- 박현미 (영남대학교) ;
-
이창호
(영남대학교)
;
- 전병준 ;
- 윤병한 (영남대학교) ;
- 임창호 (영남대학교) ;
- 송현직 (구미1대학) ;
- 김영훈 (포항1대학) ;
- 이광식 (영남대학교)
- Published : 2004.07.14
Abstract
In this study, major research fields are classified as ozone generation system for dry cleaning wafer of etched silicon wafer, dry cleaning process of etched silicon wafer which includes SEM analysis and ESCA analysis. The following results are deduced from each experiment and analysis. The magnitudes of carbon and silicon were similar to the survey spectrum of silicon wafer which does not cleaning, but magnitude of oxygen was much bigger Because UV light activates oxygen molecules in the oxide film on the silicon wafer.
Keywords