• Transactions on Electrical and Electronic Materials
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• v.18 no.3
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• pp.125-128
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• 2017

This study is on how ohmic area etching affects the buffer breakdown voltage of AlGaN/GaN HEMT. The surface morphology of the ohmic metal can be improved by whole etching on the ohmic area. The buffer breakdown voltages of the samples with whole etching on the ohmic area were improved by the suppression of the metal spikes formed under the ohmic contact regions during high-temperature annealing. The samples with selective etching on the ohmic area were investigated for comparison. In addition, the buffer leakage currents were measured on the different radii of the wafer, and the uniformity of the buffer leakage currents on the wafer were investigated by PL mapping measurement.

• JSTS:Journal of Semiconductor Technology and Science
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• v.6 no.3
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• pp.175-181
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• 2006

Wide band-gap semiconductor electron devices have made great progresses to produce very high power amplifiers for various wireless standards. The advantages of wide band-gap electronic devices and their progresses are summarized in this paper.

• Electrical & Electronic Materials
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• v.9 no.9
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• pp.969-977
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• 1996

본고에서는 여러가지 Wide Band-gap중에서 특히 최근에 많은 관심을 끌고 있는 GaN와 4H-SiC, 6H0SiC의 전자기적 물성을 소개하고 현재 이들로부터 제작된 prototype소자들의 성능을 비교함으로써 그 발전현황을 알아보기로 한다. 본고에서 관심을 두는 소자분야는 광전소자(optoelectronic devices)라기보다는 고주파 고출력용 전력소자임을 밝힌다. 아울러 GaN로부터 제작된 MESFET(MEtal Semiconductor Field-Effect Transistor)소자의 고주파 대역에서의 Large-Signal특성을 Device/Circuit Model을 통하여 실험치와 비교하여보고 이로부터 최적화된 channel 구조를 갖는 소자구조에서의 RF특성을 조사한다.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.605-608
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• 2006

The recent application of wide band gap oxide semiconductors to transparent thin film transistors (TTFTs) is making a fast and growing (r)evolution on the contemporary solid-state electronics. In this paper we present some of the recent results we have obtained using wide band gap oxide semiconductors, like indium zinc oxide, produced by rf sputtering at room temperature. The devices work in the enhancement mode and exhibit excellent saturation drain currents. On-off ratios above $10^6$ are achieved. The optical transmittance data in the visible range reveals average transmittance higher than 80 %, including the glass substrate. Channel mobilities are also quite respectable, with some devices presenting values around $25\;cm^2/Vs$, even without any annealing or other post deposition improvement processes. The high performances presented by these TTFTs associated to a high electron mobility, at least two orders of magnitude higher than that of conventional amorphous silicon TFTs and a low threshold voltage, opens new doors for applications in flexible, wearable, disposable portable electronics as well as battery-powered applications.

• Transactions on Electrical and Electronic Materials
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• v.6 no.5
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• pp.229-232
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• 2005

Direct characterization of band alignment at chemical bath deposition $(CBD)-CdS/Cu_{0.93}(In_{1-x}Ga_x)Se_2$ has been carried out by photoemission spectroscopy (PES) and inverse photoemission spectroscopy (IPES). Ar ion beam etching at the condition of the low ion kinetic energy of 400 eV yields a removal of surface contamination as well as successful development of intrinsic feature of each layer and the interfaces. Especially interior regions of the wide gap CIGS layers with a band gap of $1.4\~1.6\;eV$ were successfully exposed. IPES spectra revealed that conduction band offset (CBO) at the interface region over the wide gap CIGS of x = 0.60 and 0.75 was negative, where the conduction band minimum of CdS was lower than that of CIGS. It was also observed that an energy spacing between conduction band minimum (CBM) of CdS layer and valance band maximum (VBM) of $Cu_{0.93}(In_{0.25}Ga_{0.75})Se_2$ layer at interface region was no wider than that of the interface over the $Cu_{0.93}(In_{0.60}Ga_{0.40})Se_2$ layer.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.977-979
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• 2006

Organic light-emitting diodes (OLEDs) based on the double wide band gap emissive layers in the range of 380 nm to 440 nm are reported. An efficient electroluminescence with a maximum at 400nm was observed at room temperature under a forward bias about 10V. With the wide band gap organic materials for near-ultraviolet emission, the low operating voltage (5V) and high current efficiency (3 cd/A) have been obtained at $2mA/cm^2$

• Ceramist
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• v.22 no.1
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• pp.27-35
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• 2019

Research on ultraviolet (UV) light detection has attracted considerable attention from scientific researchers in related fields. It can be said that it is a very important time to accurately monitor the UV irradiation amount according to the wavelength region in real time. The oxide is very diverse in its kind and has the advantage of being able to efficiently control the band gap through band gap engineering. In addition, it is very stable in response to heat and atmospheric oxygen when UV is absorbed. Also, there is a known method that can effectively manufacture oxide nanoparticles and nanorods through various synthesis methods, and researches for improving the sensitivity of UV sensors have been carried out using this method. In this paper, we introduce the materials that can be used as UV sensors among various wide band oxide materials, and review the results of researches of various UV sensors using nano materials.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.11a
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• pp.174-174
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• 2003

ZnO는 상온에서 3.36 eV의 wide band gap과 60 meV의 큰 엑시톤 결합 에너지를 가지며, GaN(28 meV)와 ZnSe(19 meV)와 같은 wide band gap 재료와 비교해서 가장 우수한 exciton emission을 가진다. 이러한 특성 때문에 UV 레이저 및 LED와 같은 광학소자로서 그 응용의 잠재성이 높다. 박막의 우수한 광학적 특성과 결정성을 개선하기 위해 다양한 공정조건(RF 파워, 공정압력, 산소분압, 온도)에서 마그네트론 스퍼터링을 이웅하여 Si 기판상에 ZnO 박막을 성장 하였다. 또한, 저온 self-buffer를 이용하여 박막의 광학적 특성과 결정성을 더욱 개선 할 수 있었다. RF 파워와 공정압력은 박막의 PL(phothluminescehce) 특성이나 결정성에는 큰 영향을 주지 않았고 산소분압은 PL intensity의 변화를 가져왔으며, 온도는 결정성에 큰 영향을 주었다. 산소 분압이 증가 할수록 비화학량론적(산소 공공, 침입형 아연) 결함으로 인한 visiable 영 역의 peak 의 강도가 감소하는 것을 관찰하였다. 온도가 증가할수록 박막의 결정성에 나쁜 영향을 주었는데 저온 self-buffer를 도입하므로써 ZnO 박막의 결정성과 PL특성을 함께 개선하였다.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.105-108
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• 2007

Chiral liquid crystals exhibit band-gap structures responsive to electrical and optical fields, providing wide-ranging opportunities for photonics applications. We discuss three aspects of this technology: optics of chiral nematic devices and removal of pitch jumps; optical switching of chiral nematic materials; and using novel phases in photonic devices.

• Current Photovoltaic Research
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• v.2 no.2
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• pp.41-47
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• 2014

Extensive investigation on silicon based thin film reveals a wide range of film characteristics, from low optical gap to high optical gap, from amorphous to micro-crystalline silicon etc. Fabrication of single junction, tandem and triple junction solar cell with suitable materials, indicate that fabrication of solar cell of a relatively moderate efficiency is possible with a better light induced stability. Due to these investigations, various competing materials like wide band gap silicon carbide and silicon oxide, low band gap micro-crystalline silicon and silicon germanium etc were also prepared and applied to the solar cells. Such a multi-junction solar cell can be a technologically promising photo-voltaic device, as the external quantum efficiency of such a cell covers a wider spectral range.