• Title/Summary/Keyword: wet slurry process

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Effect of inlet structure of filtration system on the removal characteristics of iron particles by ceramic candle filters (집진장치의 유입구조에 따른 세라믹필터의 철입자 제거특성에 미치는 영향)

  • Park, Young-Ok;Jeong, Ju-Yeong;Seo, Yong-Chil
    • Particle and aerosol research
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    • v.5 no.4
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    • pp.189-197
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    • 2009
  • Wet-type particulate removal system is employed in most of ironmaking processes. These de-dusting systems require additional downstream aggregates for treatment of water and for drying of the collected slurry. Thus dried slurry can be pressed in shape of briquettes and recycled in the steelmaking process. Different from the wet-type, the dry-type particulate removal systems generate no slurry. A high-temperature, high-pressure de-dusting system with inertial inlet was developed. The target application of this system was to remove particulate matter generated from the novel ironmaking process and other steelmaking processes. In this study we conducted tests with this newly developed system to evaluate the performance of the silica-carbide (SiC) ceramic filters. In addition, for purpose of comparison, we also conducted tests with a unit which has conventional direct inlet. Fe-Particles collected from the novel ironmaking process were used in our tests as test dusts. The temperature and the pressure were kept constant at their respective values $800^{\circ}C$ and $3kg_f/cm^2$.

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The thermal stabilization characteristics of electrolyte membrane in high temperature electrolysis[HTE] (고온 수전해 전해질 막의 열안정화 특성 고찰)

  • Choi, Ho-Sang;Son, Hyo-Seok;Sim, Kyu-Sung;Hwang, Gab-Jin
    • Transactions of the Korean hydrogen and new energy society
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    • v.16 no.2
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    • pp.150-158
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    • 2005
  • Added ratio of 8YSZ powder and organic compounds (solvent, plasticizer, dispersant, binder) properly. It manufactured electrolysis membrane by wet process that make slurry and dry process that do not use organic compounds. In the case of wet process, harmony combination and method of organic compound are an importance element in slurry manufacture. This slurry did calcine at temperature of 140$^{\circ}C$ in Furnace and manufactured electrolyte disk by Dry pressing method. Like this, manufacturing disk sintered at temperature of $1300^{\circ}C,\;1400^{\circ},\;1500^{\circ}C$ in Furnace and completed electrolysis membrane. Confirmed change of crystal structure and decision form through analysis of density, SEM, XRD according to change of sintering temperature, and considered relation with ion conductivity.

The Characteristic Studies of Powder Coating System in Wet Slurry Processing Powder Foundation (습식공정 파우더 파운데이션에서 파우더 코팅 시스템의 특성 연구)

  • Lee, Chan-Ki;Lee, Su-Jin;Choi, Jae-Wook;Choi, Yeong-Jin;Han, Shang-Hoon
    • Journal of the Society of Cosmetic Scientists of Korea
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    • v.36 no.3
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    • pp.227-231
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    • 2010
  • Among various make-up products, foundations are widely used to express clear and flawless skin. Foundations can be classified by its formula to 3 types, liquid foundation, powder foundation, and oil dispersion foundation. Powder foundations are easy to carry and use, so it is commonly possessed. In the R&D point of view, the developing method of powder foundations can be classified again to 3 types. Dry-process, baked-process, and the wet slurry-process. The fact that the wet slurry-process goes through either the back injection method or the front injection method is previously known. The front injection process is used as the main method in this study. We observed the quality dependence on the kind of solvent and the powder coating system. In brief, when water was used as the main solvent, the hardness increased than when volatile silicones or hydrocarbons were used. And the sensory results were shown to prefer volatile solvents (silicones or hydrocarbons) over water. Similarly, when the amino acid-coating system was applied, the hardness was shown to increase, when silicone-coating system shown no specific change. By these results, tailor-made powder foundations targeting specific customer grades can be easily produced.

Synthesis and disperse treatment of Cu powder from $Cu(OH)_2$ slurry by wet reduction methods (액상환원법에 의한 $Cu(OH)_2$ 슬러리로부터 미세구리분말 제조 및 분산화 처리)

  • Ahn Jong-Gwan;Hai Hoang Tri;Kim Dong-Jin;Kim Byeong-Gyu
    • Proceedings of the Korean Powder Metallurgy Institute Conference
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    • 2005.11a
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    • pp.87-88
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    • 2005
  • Ultra-fine copper powders with particle size about 150 nm were synthesized from copper hydroxide slurry by wet method using hydrazine as reduction agent and several sur factants at below $80^{\circ}C$. The particle size distribution and dispersion of synthesized powders as function of temperature, feeding rate of reduction and especially, sur factants were character ized by XRD, BET, PSA and SEM by this process.

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A Study on a Wet etching of ILD (Interlayer Dielectric) Film Wafer (습식 에칭에 의한 웨이퍼의 층간 절연막 가공 특성에 관한 연구)

  • 김도윤;김형재;정해도;이은상
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1997.10a
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    • pp.935-938
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    • 1997
  • Recently, the minimum line width shows a tendency to decrease and the multi-level increase in semiconductor. Therefore, a planarization technique is needed and chemical mechanical polishing(CMP) is considered as one of the most suitable process. CMP accomplishes a high polishing performance and a global planarization of high quality. But there are several defects in CMP such as micro-scratches, abrasive contaminations, and non-uniformity of polished wafer edges. Wet etching include of Spin-etching can improve he defects of CMP. It uses abrasive-free chemical solution instead of slurry. On this study, ILD(INterlayer-Dielectric) was removed by CMP and wet-etching methods in order to investigate the superiority of wet etching mechanism. In the thin film wafer, the results were evaluated at a viewpoint of material removal rate(MRR) and within wafer non-uniformity(WIWNU). And pattern step height was also compared for planarization characteristics of the patterned wafer.

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Spray Characteristics of a Coal Slurry with Liquid Carbon Dioxide (고압 저등급탄-이산화탄소 슬러리 분무특성에 관한 연구)

  • KIM, CHANGYEON;KIM, HAKDUCK;SONG, JUHUN
    • Transactions of the Korean hydrogen and new energy society
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    • v.26 no.4
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    • pp.357-362
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    • 2015
  • There is potential method to utilize the liquid carbon dioxide ($LCO_2$) in coal gasification plants. The $LCO_2$ could be used to effectively transport coal particles instead of conventional carrier such as liquid water ($H_2O$) particularly in wet-fed gasifier. However, there is a lack of fundamental study on the atomization behavior of $LCO_2$ coal slurry under high pressure condition. In this study, the flashing spray characteristics of a coal mixture with $LCO_2$ was examined during a throttling process by using a flow visualization system. The spray of coal water slurry which is in the Rayleigh-type break up mode was significantly different. This difference indicates that the coal water slurry did not effectively transport the coal, as compared to $LCO_2$ coal slurry.

Polymer Base Bored Pile in Bangkok Subsoils

  • Teparaksa, Wanchai
    • Proceedings of the Korean Geotechical Society Conference
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    • 2008.10a
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    • pp.407-426
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    • 2008
  • The bentonite slurry has been used as the stabilize suspension for wet process bored pile construction in Thailand. The bentonite suspension has benefit on filtration in the sand layer, but it creates thick cake film along pile shaft and loose sedimentation at pile toe. The base grouting technique was widely used to rectify the soft base or loose sedimentation problem of bored pile. The base grouting technique was not increased only end bearing capacity, but was also more increase in skin friction capacity of the bored piles. The comprehensive researches on base grouting was carried out by installing PVC casing inside the shaft to allow the drilling through the pile base in order to collect the soil sample below the pile tip. The polymer based slurry recently was used to replace the bentonite slurry to overcome the thick cake film along pile shaft as well as loose sedimentation at pile toe. The extent research on polymer slurry by physical model was performed to verify the real behavior of polymer. The appropriate mixing ratio of polymer was proposed. The design skin friction coefficient, $\beta$ and end bearing coefficient, Nq, for sand layer base on fully instrumented tested pile were proposed. The application on remedial of the lose capacity bored pile with large displacement in Bangladesh was proposed and discussed.

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Characteristics of the Flue Gas Desulfurization in $CaCo_3-CO_2-NH_3$ System ($CaCo_3-CO_2-NH_3$계에서의 배연탈황 특성)

  • 모세영;이경재;장홍기;손종렬
    • Journal of environmental and Sanitary engineering
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    • v.14 no.2
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    • pp.84-89
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    • 1999
  • This experiment was performed to develop the new desulfurization process which can eliminate the possibility of generation of the secondary pollutants by regenerating the limestone from the sulfite/sulfate slurry generated from the wet lime/limestone flue gas desulfurization process by treating it with the ammonium hydroxide and carbon dioxide and using it again. In the experiments, regent grade calcium carbonate was dissolved to obtain the 200ml of sample slurry of the concentration of 2.0~0.4 weight percent. After three times of regeneration and desulfurization process, the coefficients of regeneration and desulfurization efficiencies are calculated/measured. The obtained results are that the coefficients of generation of the first. second, and third regenerated calcium carbonate were 90.88, 92.13, and 91.50%, respectively; and the desulfurization efficiencies of those are 93.4, 94.2 and 93.0%, respectively.

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A Study on ILD(Interlayer Dielectric) Planarization of Wafer by DHF (DHF를 적용한 웨이퍼의 층간 절연막 평탄화에 관한 연구)

  • Kim, Do-Youne;Kim, Hyoung-Jae;Jeong, Hae-Do;Lee, Eun-Sang
    • Journal of the Korean Society for Precision Engineering
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    • v.19 no.5
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    • pp.149-158
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    • 2002
  • Recently, the minimum line width shows a tendency to decrease and the multi-level increases in semiconductor. Therefore, a planarization technique is needed and chemical mechanical polishing(CMP) is considered as one of the most suitable process. CMP accomplishes a high polishing performance and a global planarization of high quality. However there are several defects in CMF, such as micro-scratches, abrasive contaminations and non-uniformity of polished wafer edges. Wet etching process including spin-etching can eliminate the defects of CMP. It uses abrasive-free chemical solution instead of slurry. On this study, ILD(Interlayer-Dielectric) was removed by CMP and wet etching process using DHF(Diluted HF) in order to investigate the possibility of planrization by wet etching mechanism. In the thin film wafer, the results were evaluated from the viewpoint of material removal rate(MRR) and within wafer non-uniformity(WIWNU). And the pattern step heights were also compared for the purpose of planarity characterization of the patterned wafer. Moreover, Chemical polishing process which is the wet etching process with mechanical energy was introduced and evaluated for examining the characteristics of planarization.

Physicochemical Characteristics of Rice Flour Gelatinized by Drum-Drying (드럼건조에 의한 알파미분의 물리화학적 특성)

  • Han, Ouk;Kim, Jeong-Sang;Lee, Hyun-Yu;Kim, Young-Myoung;Shin, Dong-Hwa
    • Korean Journal of Food Science and Technology
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    • v.20 no.3
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    • pp.392-398
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    • 1988
  • Gelatinized rice flours were prepared by drum drying at different moisture contents of slurry made from dry milled and wet milled rice flours. Milled rice samples were prepared from the Chuchung and the Samgang varieties. Degree of gelatinization of drum-dried rice flours revealed over 92% at 60% moisture content of wet milled rice flours and 80% moisture content of dry milled ones. With regards to amylogram and rheological properties, drum-dried rice flours prepared from wet milled raw materials showed higher viscosity than from dry milled ones. Increasing water contents in the slurry increased water absorption index(WAI) and decreased water solubility index(WSI). Hunter's color values of drum-dried rice flour at high moisture contents showed higher L values and lower b values. For the preparation of gelatinized rice flours by drum drying process, the higher water content caused more gelatinized network structure of rice starch in scanning electron micrographs. With regards to farinogram properties of dough with drum-dried rice flours and wheat flours in mixing ratio of 1 to 9 by weight, drum-dried rice flours made from wet milled raw rice flours revealed higher MTI than from dry milled ones.

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