• 대한전기학회:학술대회논문집
• /
• 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
• /
• pp.1412-1413
• /
• 2006

In this research, an organic thin 13 passivation layer was newly adopted to prefect the organic layer from ambient moisture and oxygen. As the organic thin film passivation layer, poly methyl methacrylate thin films (ppMMA) were deposited using a plasma polymerization technique. In order to their passivation performance for OLEDs, water vapor transmission rate (WVTR) of the ppMMAs were analyzed and luminance-current-voltage (L-I-V)/luminance-time (L-T) characteristics of the OLEDs with and without ppMMA passivation layer were investigated. The OLEDs had a structure of ITO/TPD (HTL)/Alq3(EML&ETL)/Al. The OLED with ppMMA passivation layer showed improved L-T performance than that of without ppMMA passivation layer.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
• /
• pp.95-95
• /
• 2014

An OLED(Organic Light-Emitting Diode) device based on the emissive electroluminescent layer a film of organic materials. OLED is used for many electronic devices such as TV, mobile phones, handheld games consoles. ULVAC's mass production systems are indispensable to the manufacturing of OLED device. ULVAC is a manufacturer and worldwide supplier of equipment and vacuum systems for the OLED, LCD, Semiconductor, Electronics, Optical device and related high technology industries. The SMD Series are single-substrate sputtering systems for deposition of films such as metal films and TCO (Transparent Conductive Oxide) films. ULVAC has delivered a large number of these systems not only Organic Evaporating systems but also LTPS CVD systems. The most important technology of thin-film encapsulation (TFE) is preventing moisture($H_2O$) and oxygen permeation into flexible OLED devices. As a polymer substrate does not offer the same barrier performance as glass substrate, the TFE should be developed on both the bottom and top side of the device layers for sufficient lifetimes. This report provides a review of promising thin-film barrier technologies as well as the WVTR(Water Vapor Transmission Rate) properties. Multilayer thin-film deposition technology of organic and inorganic layer is very effective method for increasing barrier performance of OLED device. Gases and water in the organic evaporating system is having a strong influence as impurities to OLED device. CRYO pump is one of the very useful vacuum components to reduce above impurities. There for CRYO pump is faster than conventional TMP exhaust velocity of gases and water. So, we suggest new method to make a good vacuum condition which is CRYO Trap addition on OLED evaporator. Alignment accuracy is one of the key technologies to perform high resolution OLED device. In order to reduce vibration characteristic of CRYO pump, ULVAC has developed low vibration CRYO pumps to achieve high resolution alignment performance between Metal mask and substrate. This report also includes ULVAC's approach for these issues.

• 한국전기전자재료학회논문지
• /
• 제22권12호
• /
• pp.1028-1032
• /
• 2009

In this study, the influences of silicon-based gas barrier films fabricated by using a facing target sputtering(FTS) system on the gas permeability for flexible displays have been investigated. Under these optimum conditions on the $SiO_x$ film with oxygen concentration($O_2/Ar+O_2$) of 3.3% and the $SiO_xN_y$ film with nitrogen concentration($N_2/Ar+O_2+N_2$) of 30% deposited by the FTS system, it was found that the films were grown about 4 times higher deposition rate than that of the conventional sputtering system and showed high transmittance about 85% in the visible light range. Particularly, the polyethylene naphthalate(PEN) substrates with the $SiO_x$ and/or $SiO_xN_y$ films showed the enhanced properties of decreased water vapor transmission rate (WVTR) over $10^{-1}\;g/m^2{\cdot}day$ compared with the PEN substrate without any gas barrier films, which was due to high packing density in the Si-based films with high plasma density by FTS process and/or the denser chemical structure of Si-N bond in the $SiO_xN_y$ film.

• 한국포장학회지
• /
• 제9권1호
• /
• pp.33-54
• /
• 2003

The aim of this study was to develop a model that could be used in the design of modified atmosphere packaging (MAP) for peaches. Respiratory data at 5, 10, $20^{\circ}C$ for peaches were gathered and altered for create useful respiration model. Packaging materials were conventional low density polyethylene and polypropylene with anti-fog, and anti-fungi treatments, and thickness was $30{\mu}m$ and $50{\mu}m$ each. Permeability tests were performed to find their oxygen, carbon dioxide, water vapor transmission rate as increases in temperature. Test results were then converted to logarithm format for MAP modeling. The maximum rate of oxygen uptake increased with increasing temperature. Optimum gas composition in the package system for fruits were set according to literature and upper or lower limits of oxygen and dioxide established. To predict gas composition at certain storage time, weight of fruits, film thickness, film type, and other variables, respiration rate was studied at various storage conditions. The results of tests were used to calculate Cameron's model and converted to a cubic estimation equation. The validity of the model was tested experimentally by observing actual atmospheric changes inside packages. This result of study may be useful for designing dynamic gas exchange MAP systems for similar agricultural products.

• 청정기술
• /
• 제18권1호
• /
• pp.57-62
• /
• 2012

폴리비닐알코올(PVA)을 증류수를 사용하여 용액으로 만든 후, 소수성을 가지는 비닐트리에톡시실란(VTEOS)을 이용하여 개질하였다. 실란으로 개질된 PVA 용액에 폴리아크릴산(PAA)을 함량별로 넣어 제조하였다. 다양한 PAA 함량에 따라 제조된 필름으로 열적-기계적 성질, 접촉각, 수분 투과율, 산소 투과율을 측정하였다. 필름의 유리 전이 온도는 비닐트리에톡시실란으로 개질한 경우 약간 높아졌으나, PAA의 함량에 따른 변화는 크게 나타나지 않았다. 비닐트리에톡시실란으로 개질된 PVA/ PAA 필름의 인장 강도는 9.48~10.72 $kg/mm^2$으로 PVA와 큰 차이가 나지 않았다. 비닐트리에톡시실란으로 개질된 PVA와 PAA의 비율이 90/10인 필름의 경우 팽윤도 198%, 용해도 10%로 측정되어 PVA에 비하여 내수성이 개선되었음을 확인할 수 있었다. 또한, 비닐트리에톡시실란으로 개질된 PVA와 PAA의 비율이 90/10인 필름(두께 2.5 ${\mu}m$)을 PET 필름(두께 50 ${\mu}m$) 위에 코팅하여 제조된 필름의 수분 투과율과 산소 투과율은 각각 11.04 $g/m^2/day$와 3.1 $cc/m^2/day$로 측정되었다.

• Journal of Information Display
• /
• 제11권1호
• /
• pp.8-11
• /
• 2010

In this study, a new thin films passivation technique using Zn with high electronegativity and $MgF_2$, a fluorine material with better optical transmittance than the sealing film materials that have thus far been reported was proposed. Targets with various ratios of $MgF_2$ to Zn (5:5, 4:6 and 3:7) were fabricated to control the amount of Zn in the passivation films. The Mg-Zn-F films were deposited onto the substrates and Zn was located in the gap between the lattices of $MgF_2$ without chemical metathesis in the Mg-Zn-F films. The thickness and optical transmittance of the deposited passivation films were approximately 200 nm and 80%, respectively. It was confirmed via electron dispersive spectroscopy (EDS) analysis that the Zn content of the film that was sputtered using a 4:6 ratio target was 9.84 wt%. The Zn contents of the films made from the 5:5 and 3:7 ratio targets were 2.07 and 5.01 wt%, respectively. The water vapor transmission rate (WVTR) was determined to be $38^{\circ}C$, RH 90-100%. The WVTR of the Mg-Zn-F film that was deposited with a 4:6 ratio target nearly reached the limit of the equipment, $1\times10^{-3}\;gm^2{\cdot}day$. As the Zn portion increased, the packing density also increased, and it was found that the passivation films effectively prevented the permeation by either oxygen or water vapor. To measure the characteristics of gas barrier, the film was applied to the emitting device to evaluate their lifetime. The lifetime of the applied device with passivation was increased to 25 times that of the PLED device, which was non-passivated.

• 한국식품과학회지
• /
• 제31권1호
• /
• pp.99-105
• /
• 1999

Methylcellulose (MC), hydroxypropylmethylcellulose-15 (HPMC-15)와 hydroxypropyl-methylcellulose-50 (HPMC-50)필름과 이에 칼슘을 첨가한 식용필름을 제조하여 이화학적 특성을 비교 연구하였다. 제조된 필름은 모두 $2.38{\sim}3.55$의 운도를 나타내며, 백색의 투명한 필름을 형성하였다. 인장강도는 MC필름이 HPMC필름보다 높았으며, 칼슘의 첨가에 의하여 증가하였고, 신장율은 HPMC-15와 이에 칼슘을 첨가한 필름군만 유의적으로 낮았다. 용해도는 HPMC의 점도의 증가에 따라 감소하였으며, MC필름과 HPMC-15필름 사이에는 유의적인 차이를 나타내지 않았고 칼슘의 첨가에 의하여 영향을 나타내지 않았다. 칼슘첨가에 의하여 투습도는 유의적인 차이를 나타내지 않았으며, MC필름이 HPMC-50 필름보다 낮았고, HPMC필름은 점도의 증가에 따라 증가하였다. 가스투과도는 MC필름이 HPMC필름보다 적었으며, 칼슘 첨가로 이산화탄소와 산소의 투과계수의 비가 낮게 측정되었다. 주사현미경으로 표면형상을 관찰한 결과 칼슘을 첨가한 MC필름이 더욱 균일한 표면형상을 나타냄을 알 수 있었다. 이상의 결과로서 HPMC와 MC필름은 Ca을 첨가함으로서 제조방법의 차이는 없었으나 인장강도가 증가하고 균일한 표면형상을 나타내어 HPMC와 MC필름 보다 내구성이 있는 필름을 제조할 수 있었다.

• 한국포장학회지
• /
• 제25권3호
• /
• pp.111-116
• /
• 2019

Thermal insulation performance of new insulation packaging made of recycled PET nonwoven (thickness : 10 mm) was verified by conducting comparative experiment with an EPS box (thickness : 25 mm) and a double wall corrugated box (thickness : 7 mm). Three ice packs (300 g) were positioned 200 mm above the bottom inside each box, all of which are placed side by side and temperature change of 2 points (5mm under middle icepack and 130 mm under middle icepack) was recorded by data logger (GL-840, Graphtec) for 16 hours under the environment of 29℃. The new packaging box showed 75% higher insulation performance than the EPS box and 180% higher than the corrugated box. In order to figure out the reason for insulation performance difference among boxes, thermal conductivities of each box material were measured using heat flow meter (HFM436 lamda, Netzsch). U-value (thermal conductivity divided by thickness) of EPS was lower than recycled pet nonwoven by 57%, which seemed to be opposite to the result of insulation test of boxes. This was explained by high water vapor transmission rate of EPS (6 times higher than PET insulation) and air pocket effect of PET insulation.

• 마이크로전자및패키징학회지
• /
• 제24권4호
• /
• pp.79-84
• /
• 2017

태양전지와 같은 광전소자의 특성 및 신뢰성 유지하기 위해서는 수분과 산소 등으로 부터 소자 내부가 보호되어야 한다. 본 연구는 여러 연성(flexible) 플라스틱 기판위에 유 무기 복합 보호막을 스프레이코팅 방법으로 형성하여 공정조건(노즐 위치, 박막 두께, 기판 구성)에 따른 소자의 보호특성을 연구하였다. 사용된 복합 보호막 재료로서 PVA (polyvinyl alcohol)와 SA(sodium alginate) 혼합 유기 물질(P.S)에 $Al_2O_3$($P.S+Al_2O_3$)과 $SiO_2$($P.S+SiO_2$) 나노 분말을 혼합하여 유 무기 복합 보호막 용액을 합성하였다. 플라스틱 기판 위에 코팅한 보호막의 두께가 $5{\mu}m$에서 91%의 투과율을 나타내었으며 $78{\mu}m$에서 $178{\mu}m$로 두께가 증가할 경우 광 투과율은 81.6%에서 73.6%으로 감소하였다. 또한 합성한 $P.S+Al_2O_3$ 복합재료를 사용하여 PEN(polyethylene naphthalate), PC(polycarbonate) 단일 플라스틱 기판과 Acrylate film과 PC 이중막(Acrylate film/PC double layer) 구조와 $Al_2O_3$ 무기박막과 PEN 이중막($Al_2O_3$ film/PEN double layer) 구조의 기판 위에 $P.S+Al_2O_3$ 용액을 사용하여 수분투과도(water vapor transmission rate, WVTR)와 표면형상 등을 측정하여 최적의 보호막 구조를 확인하였다. 즉, $Al_2O_3$ film/PEN 이중막 기판위에 형성한 보호막의 수분투과 값은 $0.004gm/m^2-day$로 가장 우수한 내 투습 특성을 나타내었다.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
• /
• pp.100-101
• /
• 2012

The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.