• 제목/요약/키워드: vapor-solid mechanism

검색결과 63건 처리시간 0.026초

Vapor Phase Lubrication을 통한 금속의 마찰 및 마멸 특성 (Characteristics of Friction and Wear of Metals Under Vapor Phase Lubrication)

  • 김대은;양지철;성인하
    • Tribology and Lubricants
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    • 제18권2호
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    • pp.109-116
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    • 2002
  • phase lubrication can be used as an alterative lubrication method to overcome the demerits of liquid and solid lubrications. In this work, the tribological characteristics of metals are investigated under vapor phase lubrication. It was found that the friction coefficient and wear volume can be controlled efficiently by the amount of vapor phase lubricant delivered to the sliding interface. The friction coefficient could be reduced to about 0.1 under vapor lubrication. Also, depending on the amount of vapor lubrication delivered to the system, the width of the wear track could be varied between 50 to 250 Um. It is shown that vapor phase lubrication mechanism is very effective to control the friction and wear phenomena without the use of excessive oil.

Source와 기판 거리에 따른 GaN nanowires의 합성 mode 변화 제어 (Distance between source and substrate and growth mode control in GaN nanowires synthesis)

  • 신동익;이호준;강삼묵;윤대호
    • 한국결정성장학회지
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    • 제18권1호
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    • pp.10-14
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    • 2008
  • GaN nanowires는 수평 VPE법으로 합성 되었다. 본 실험에서는 source와 기판과의 거리가 합성된 GaN nanowires의 형상에 미치는 영향에 대하여 실험하였다. GaN nanowires는 $950^{\circ}C$ 온도에서 Ar 과 $NH_3$ 가스가 각각 1000, 50 sccm 의 유량에서 합성되었다. 합성된 GaN nanowires의 단면형태는 삼각형의 모양을 가졌으며, GaN nanowires의 길이는 200에서 500 nm 정도 였다. 합성된 GaN nanowires의 모양은 FESEM 으로 확인하였고, XRD 분석을 통하여 그 구조가 wurzite 구조인 것을 확인하였다. 또한, HRTEM 사진과 SAED 패턴을 통하여 합성된 GaN nanowires의 표면과 구조를 분석하였다. 성장된 GaN nanowires의 광학적 특성은 PL분석을 통하여 이루어졌다.

탄화규소 휘스커의 합성(I) : 반응기구의 율속반응 (Synthesis of Silicon Carbide Whiskers (I) : Reaction Mechanism and Rate-Controlling Reaction)

  • 최헌진;이준근
    • 한국세라믹학회지
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    • 제35권12호
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    • pp.1336-1336
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    • 1998
  • 2단계 열탄소환원법으로 탄화규소 휘스커를 Ar과 H2분위기에서 기상-고상, 2단계, 기상-액상-고상 성장기구를 통해 각각 합성하였다. Ar분위기에서 탄화규소 휘스커는 다음과 같은 반응기구로 성장하였다. SiO2(S)+C(s)-SiO(v)+CO(v) SiO(v)3CO(v)=SiC(s)whisker+2CO2(v) 2C(s)+2CO2(v)=4CO(v) 이때 전체 반응속도는 세번째 반응에 참여하는 탄소에 의해 지배되었다. 따라서 이 반응이 휘스커 합성의 율속반응으로 판단되었다. 한편 H2 분위기에서 탄화규소 휘스커는 다음과 같은 반응기구로 성장하였다.SiO2(s)+C(s)=SiO(v)+CO(v) 2C(s)+4H2(v)=2CH4(v) SiO(v)+2CH4(v)=SiC(s)whisker+CO(v)+4H2(v) 이때 전체 반응속도는 SiO(v) 기체의발생 속도에 의해 지배되었다. 따라서 첫번째 반응이 휘스커 합성의 율속 반응인 것으로 판단되었다.

SLS 성장방법에 의한 SiC 나노와이어의 성장 (Growth of SiC nanowires by SLS growth mechanism)

  • 노대호;김재수;변동진;진정근;김나리;양재웅
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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    • pp.116-116
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    • 2003
  • Most of all nano-structures, SiC had a high electrical conductivity and mechanical strengths ay high temperatures. So It was considered a useful materials for nanosized device materials and added materials for strength hardening. Much methods were developed for SiC nanowire and nanorods like CVD, carbothermal reduction, Laser ablation and CNT-confined reduction. These methods used the VLS (Vapor-Liquid-Solid) growth mechanism. In these experiments, SiC nanowire was grown by SLS (Sold-Liquid-Solid) growth mechanism used Graphite substrate, And we characterized its microstructure to compare with VLS growth mechanism.

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The Substrate Effects on Kinetics and Mechanism of Solid-Phase Crystallization of Amorphous Silicon Thin Films

  • Song, Yoon-Ho;Kang, Seung-Youl;Cho, Kyoung-Ik;Yoo, Hyung-Joun
    • ETRI Journal
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    • 제19권1호
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    • pp.26-35
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    • 1997
  • The substrate effects on solid-phase crystallization of amorphous silicon (a-Si) films deposited by low-pressure chemical vapor deposition (LPCVD) using $Si_2H_6$ gas have been extensively investigated. The a-Si films were prepared on various substrates, such as thermally oxidized Si wafer ($SiO_2$/Si), quartz and LPCVD-oxide, and annealed at 600$^{\circ}C$ in an $N_2$ ambient for crystallization. The crystallization behavior was found to be strongly dependent on the substrate even though all the silicon films were deposited in amorphous phase. It was first observed that crystallization in a-Si films deposited on the $SiO_2$/Si starts from the interface between the a-Si and the substrate, so called interface-interface-induced crystallization, while random nucleation process dominates on the other substrates. The different kinetics and mechanism of solid-phase crystallization is attributed to the structural disorderness of a-Si films, which is strongly affected by the surface roughness of the substrates.

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기상증착법을 이용한 산화아연 나노로드의 성장 (Growth of ZnO nanorods by vapor-solid method)

  • 김나리;김재수;변동진;노대호;진정근;양재웅
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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    • pp.122-122
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    • 2003
  • In recent years, there has been increasing interest in quasi one-dimensional nanostructural systems, because of their numerous potential applications in various areas, such as materials sciences, electronics, optics, magnetism and energy storage. Specifically, zinc oxide (ZnO) is recognized as one of the most promising oxide semiconductor materials, because of its good optical, electrical, and piezoelectrical properties. The ZnO nanorods were synthesized using vapor-solid (VS) mechanism on soda lime glass substrate without the presence of metal catalyst. ZnO nanorods were prepared thermal evaporation of a Zn powder at 500. As-fabricated ZnO nanorods had an average diameter and length of 40nm and 3$\mu\textrm{m}$. Transmission electron microscopy revealed that the ZnO nanorods were single crystalline with the growth direction perpendicular to the (101) lattice plane. The influences of reaction time on the formation of the ZnO nanorods were investigated. The Photoluminescence measurements showed that the ZnO nanorods had a strong ultraviolet emission at around 380nm and a green emission at around 500nm.

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탄화규소 휘스커의 (II): 적층결함 (Synthesis of Silicon Carbide Whiskers (II): Stacking Faults)

  • 최헌진;이준근
    • 한국세라믹학회지
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    • 제36권1호
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    • pp.36-42
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    • 1999
  • 2단계 열탄소환원법으로 탄화규소 휘스커를 기상-고상, 2단계, 기상-액상-고상 성장기구로 각각 합성하였다. 그리고 휘스커에 있는 적층결합을 X-ray와 투과전자현미경을 이용하여 분석하였다. 탄화규소 휘스커에 있는 적층결함은 휘스커의 지름과 상관관계가 있는 것으로 나타났다. 즉, 기상-고상, 2단계 성장, 기상-액상-고상 성장기구에 상관없이 지름이 1$\mu\textrm{m}$이하로 작아지는 경우 적층결합이 많아지고, 기상-액상-고상 기구로 성장한 지름이 2$\mu\textrm{m}$보다 큰 경우 적층결함이 거의 없는 것으로 나타났다. 이같은 현상은 휘스커 지름이 작아짐에 따라 휘스커의 비표면적이 증가하는 때문인 것으로 판단되었다.

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Morphologically Controlled Growth of Aluminum Nitride Nanostructures by the Carbothermal Reduction and Nitridation Method

  • Jung, Woo-Sik
    • Bulletin of the Korean Chemical Society
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    • 제30권7호
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    • pp.1563-1566
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    • 2009
  • One-dimensional aluminum nitride (AlN) nanostructures were synthesized by calcining an Al(OH)(succinate) complex, which contained a very small amount of iron as a catalyst, under a mixed gas flow of nitrogen and CO (1 vol%). The complex decomposed into a homogeneous mixture of alumina and carbon at the molecular level, resulting in the lowering of the formation temperature of the AlN nanostructures. The morphology of the nanostructures such as nanocone, nanoneedle, nanowire, and nanobamboo was controlled by varying the reaction conditions, including the reaction atmosphere, reaction temperature, duration time, and ramping rate. Iron droplets were observed on the tips of the AlN nanostructures, strongly supporting that the nanostructures grow through the vapor-liquid-solid mechanism. The variation in the morphology of the nanostructures was well explained in terms of the relationship between the diffusion rate of AlN vapor into the iron droplets and the growth rate of the nanostructures.

열화학기상증착법을 이용한 Si 기판 위의 $SnO_2$ 나노와이어 제작 및 물성평가 (Synthesis and characterization of $SnO_2$ nanowires on Si substrates in a thermal chemical vapor deposition process)

  • 이득희;박현규;이삼동;정순욱;김상우
    • 한국결정성장학회지
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    • 제17권3호
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    • pp.91-94
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    • 2007
  • Vapor liquid solid 기구에 의한 열화학기상증착법을 이용하여 Si (001) 기판 위에 $SnO_2$ 나노와이어를 성장시켰다. Au 박막 (3 nm)을 성장을 위한 촉매로 사용하여 Si(001) 기판 이에 순수 SnO powder (purity, 99.9%)를 반응 원료로 대기압 하 $950{\sim}100^{\circ}C$ 온도 범위, $750{\sim}800\;sccm$ 아르곤 분위기에서 $SnO_2$ 나노와이어를 성장시켰다. X-ray diffraction 분석을 통해 성장한 $SnO_2$ 나노와이어가 tetragonal rutile 구조임을 확인하였고, transmission electron microscopy 분석을 통해 단일 나노와이어의 결정 특성을 분석하였다. 또한, 상온 photoluminescence 분석을 통해 나노와이어 샘플로부터 600 nm 부근에서 나타나는 defect level 천이에 의한 넓은 emission band를 확인함으로써 성장한 나노와이어 $SnO_2$임을 확인하였다.