• Advances in Energy Research
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• v.4 no.2
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• pp.147-161
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• 2016

To start with, finding a sustainable method to produce sweet water and electricity by using renewable energies is one of the most important issues at this time. So, experimental and theoretical analysis of the performance of a closed solar powered still, which is jointed to photovoltaic cells and vacuum pump and equipped by nano plate, as the principle stage of zero discharge desalination process is investigated in this project. Major goal of this work is to reuse the concentrated brine of the Mobin petrochemical complex in order to produce potable, sweet water from effluent saline wastewater and generating electricity in the same time by using solar energy instead of discharging them to the environment. It is observed the increase in brackish water temperature increases the average daily production of solar desalination still considerably. Therefore, the nano plate and vacuum pump are added to augment the evaporation rate. The insolation rate, evaporation rate, the average brackish temperature, ambient temperature, density are investigated during a year 2013. In addition to obtain the capacity of solar powered still, the highest and lowest amount of water and electricity generation are reported during a twelvemonth (2013). Results indicate the average daily production is increased 16%, which represents 7.78 kW.h energy saving comparing with traditional solar still.

• Journal of the Korean Ceramic Society
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• v.54 no.4
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• pp.331-339
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• 2017

Porous alumina-based ceramics are of special interest due to their outstanding mechanical properties and their thermal and chemical stability. Nevertheless, the high electrical resistance of alumina-based ceramics, due to the generation of static electricity, leads to difficulty in applying a vacuum chuck in the semi-conductor process. Therefore, development of alumina-based ceramics for applications with vacuum chucks aims to have primary properties of low electrical resistance and high air permeability. In this study, we tailored the electrical resistance of porous alumina-based ceramics by adjusting the amount of $MnO_2$ (with $TiO_2$ fixed at an amount of 2 wt%) and by using coarse alumina powder for high air permeability. The characteristics of the specimens were studied using scanning electron microscopy, mercury porosimeter, capillary flow porosimetry, universal testing machine, X-ray diffraction and high-resistance meter.

• Journal of the Korean Vacuum Society
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• v.12 no.S1
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• pp.70-73
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• 2003

Sum-frequency vibrational spectroscopy has recently been used to investigate the surface of the various polymers and was able to find the chemical compositions and structures specific to the surface. Here we report our studies on two specific polymer samples to demonstrate its capability. Polyimide thin films were made by spin coating on fused quartz and $CaF_2$ substrates. The sum-frequency signal originating mainly from the air/polymer interface showed markedly different spectra, indicating the structural change of the polymer surface depending on the underlying substrate. Various polyethylene surfaces were also investigated by sum-frequency vibrational spectroscopy. The surface of polyethylene samples in the CH-region showed different sum-frequency spectra, presumably due to the trace amount of additives having much higher concentration at the air/polymer interface. These examples demonstrate the surface and interface of the polymer could have different structure and chemical composition from those of a bulk, which can be studied effectively by surface nonlinear optical spectroscopy.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.124-124
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• 2010

Currently, extreme ultraviolet lithography (EUVL) is being investigated for next generation lithography. EUVL is one of competitive lithographic technologies for sub-22nm fabrication of nano-scale Si devices that can possibly replace the conventional photolithography used to make today's microcircuits. Among the core EUVL technologies, mask fabrication is of considerable importance due to the use of new reflective optics having a completely different configuration compared to those of conventional photolithography. Therefore, new materials and new mask fabrication process are required for high performance EUVL mask fabrication. This study investigated the etching properties of SnO2 (Tin Oxide) as a new absorber material for EUVL binary mask. The EUVL mask structure used for etching is SnO2 (absorber layer) / Ru (capping / etch stop layer) / Mo-Si multilayer (reflective layer) / Si (substrate). Since the Ru etch stop layer should not be etched, infinitely high selectivity of SnO2 layer to Ru ESL is required. To obtain infinitely high etch selectivity and very low LER (line edge roughness) values, etch parameters of gas flow ratio, top electrode power, dc self - bias voltage (Vdc), and etch time were varied in inductively coupled Cl2/Ar plasmas. For certain process window, infinitely high etch selectivity of SnO2 to Ru ESL could be obtained by optimizing the process parameters. Etch characteristics were measured by on scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) analyses. Detailed mechanisms for ultra-high etch selectivity will be discussed.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.240.2-240.2
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• 2014

Characteristics of pulse-discharged plasma in liquid and its biological applications to proteins are investigated by making use of high voltage Marx generator. The Marx generator has been consisted of 5 stages, where each charging capacitor is $0.5{\mu}F$ to generate a high voltage pulse with rising time of $1{\mu}s$. We have applied an input voltage of 6 kV to the each capacitor of $0.5{\mu}F$. The high voltage pulsed plasma has been generated inside a polycarbonate tube by a single-shot operation, where the breakdown voltage is measured to be 7 kV, current of 1.2 kA, and pulse width of ${\sim}1{\mu}s$ between the two electrodes of anode-cathode made of stainless steel, which are immersed into the liquids. For the investigation of the influence of pulsed plasma on biomolcules, we have focused on the amino acids, DNA, proteins, cell and cholesterol.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.469.2-469.2
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• 2014

All-solid-state solar cell based on Chloride doped organometallic halide perovskite, (CH3NH3)PbIxCl3-x, has achieved a highly power conversion efficiency (PCE) to over 15% [1] and further improvements are expected up to 20% [2]. In this way, solar cells using novel light absorbing perovskite material are actively being studied as a next generation solar cells. However, making solution-process require high temperature up to $500^{\circ}C$ to form compact hole blocking layer and sinter the mesoporous oxide scaffold layer. Because of this high temperature process, fabrication of flexible solar cells on plastic substrate is still troubleshooting. In this study, we fabricated highly efficient flexible perovskite solar cells with PCE in excess of 11%. Atomic layer deposition (ALD) is used to deposit dense $TiO_2$ as hole blocking layer on ITO/PEN substrate. The all fabrication process is done at low temperature below $150^{\circ}C$. This work shows that one of the important blueprint for commercial use of perovskite solar cells.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.375-375
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• 2014

Layered semiconductor materials can be a promising candidate for large-area thin film transistors (TFTs) due to their relatively high mobility, low-power switching, mechanically flexibility, optically transparency, and amenability to a low-cost, large-area growth technique like thermal chemical vapor deposition (CVD). Unlike 2D graphene, series of transition metal dichalcogenides (TMDCs), $MX_2$ (M=Ta, Mo, W, X=S, Se, Te), have a finite bandgap (1~2 eV), which makes them highly attractive for electronics switching devices. Recently, 2D $MoS_2$ materials can be expected as next generation high-mobility thin-film transistors for OLED and LCD backplane. In this paper, we investigate in detail the electrical characteristics of 2D layered $MoS_2$ local bottom-gated transistor with the same device structure of the conventional thin film transistor, and expect the feasibility of display application.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.467.1-467.1
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• 2014

Quantum dots (QD) solar cells has received considerable attention due to their potential of improving the overall conversion efficiency by harvesting excess energy via multiple excitons generation (MEG). Although there have been many reports which show MEG phenomena by using optical measurement of quantum dots themselves, carrier multiplication in real QD photovoltaic devices has been sparsely reported due to difficulty in dissociation of excitons and charge collection. In this reports, heterojunction QD solar cells composed of PbS QD monolayer on highly crystalline $TiO_2$ thin films were fabricated by using Langmuir-Blodgett deposition technique to significantly reduce charge recombination at the interfaces between each QD. The PbS CQDs monolayer was characterized by using UV-vis, transmission electron microscopy (TEM) and atomic force microscopy (AFM). The internal quantum efficiency (IQE) for the monolayer QD solar cells was obtained by measurement of external quantum efficiency and determining light absorption efficiency of active layer. Carrier multiplication was observed by measuring IQE greater than 100% over threshold photon energy. Our findings demonstrate that monolayer QD solar cell structure is potentially capable of realizing highly efficient solar cells based on carrier multiplication.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.445.1-445.1
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• 2014

Dye-sensitized solar cells (DSSCs) have been widely investigated as a next-generation solar cell because of their simple structure and low manufacturing cost. The $TiO_2$ film with thickness of $8{\sim}10{\mu}m$, which consists of nanoparticles, acts as both a scaffold with a high surface-to-volume ratio for the dye loading and a pathway to remove the electrons. However, charge carriers have to move across many particle boundaries by a hopping mechanism. So, one dimensional nanostructures such as nanotubes, nanorods and nanowires should improve charge carrier transportation by providing a facile direct electron pathway and lowering the diffusion resistance. However, the efficiencies of DSSCs using one dimensional nanostructures are less than the $TiO_2$ nanoparticle-based DSSCs. In this work, the patterned $TiO_2$ film with thickness of $3{\mu}m$ was deposited using photolithography process to decrease of electron pathway and increase of surface area and transmittance of $TiO_2$ films. Properties of the patterned $TiO_2$ films were investigated by various analysis method such as X-ray diffraction, field emission scanning electron microscopy (FESEM) and UV-visible spectrophotometer.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.341.1-341.1
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• 2014

In the advanced material for the next generation display device, transparent amorphous oxide semiconductors (TAOS) are promising materials as a channel layer in thin film transistor (TFT). The TAOS have many advantages for large-area application compared with hydrogenated amorphous silicon TFT (a-Si:H) and organic semiconductor TFT. For the reasonable characteristics of TAOS, The a-IGZO has the excellent performances such as low temperature fabrication (R.T~), high mobility, visible region transparent, and reasonable on-off ratio. In this study, we investigated how the electric characteristics and physical properties are changed as various oxygen ratio when magnetron sputtering. we analysis a-IGZO film by AFM, EDS and I-V measurement. decreasing the oxygen ratio, the threshold voltage is shifted negatively and mobility is increasing. Through this correlation, we confirm the effect of oxygen ratio. We fabricated the bottom-gate a-IGZO TFTs. The gate insulator, SiO2 film was grown on heavily doped silicon wafer by thermal oxidation method. a-IGZO channel layer was deposited by RF magnetron sputtering. and the annealing condition is $350^{\circ}C$. Electrode were patterned Al deposition through a shadow mask(160/1000 um).