• Proceedings of the Korean Vacuum Society Conference
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• 2001.07a
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• pp.129-129
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• 2001

• Journal of the Korean Vacuum Society
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• v.12 no.4
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• pp.201-206
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• 2003

A residual gas analyzer was used to study the outgassing behavior of stainless steel 304 chamber as a function of bake-out temperature up to $235 ^{\circ}C$ and to identify the gas species evolved during turn on and degassing of the three different types of hot cathode ionization gauges. It was found that $H_2O$, CO, and $H_2O$ were the dominent outgassing species in the vacuum chamber during bake-out but finally $H_2$ and CO(mass 28) persisted at room temperature. Dominant outgassing species were also $H_2$ and $H_2O$ while fuming on the ionizations and then $H_2$,$H_2O$ and CO were found to be the main species degassed gauges. It was appeared that the outgassing species and quantity were not agreed to the three different types of hot cathode ionization gauges.

• Proceedings of the Korean Vacuum Society Conference
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• 1997.07a
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• pp.35-35
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• 1997

• Proceedings of the Korean Vacuum Society Conference
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• 2004.08a
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• pp.126-126
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• 2004

• Journal of the Semiconductor & Display Technology
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• v.12 no.2
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• pp.45-50
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• 2013

This paper focuses on the fundamental issues for improving the efficiency and throughput of the AC PDP (Plasma Display Panel) manufacturing. The properties of the MgO protective layer affect the PDP efficiency. Especially, the secondary electron emission efficiency was affected on the deposition rate of MgO during the evaporation. In this study, the deposition rate of 5 $\AA$/s has given the maximum efficiency value of 0.05 It is demonstrated that the impurity gases such as $H_2O$, $CO_2$, CO or $N_2$, and $O_2$ can be remained inside the PDP panel before sealing and the amount of the impurity gases decreased rapidly as the base vacuum level increased, especially near $10^{-5}$ torr. The fundamental solution in order to overcome these problems is the vacuum in-line sealing process from the MgO evaporation to the final sealing of the panel without breaking the vacuum. We have demonstrated this fundamental process technology and shown the feasibility. The firing voltage was reduced down to 285 V at the base vacuum value of $10^{-6}$ torr, whreras it was about 328 V at the base vacuum value of $10^{-3}$ torr.

• Food Science and Preservation
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• v.3 no.1
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• pp.55-60
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• 1996

To obtain the basic data on precooling effects for establishment the suitable postharvest handling technique or method of keeping high quality of vegetalble corn, the sweet, supersweet and waxy corn, (Danok #2, Cocktail #86 and Chalok #1), being mainly consumed as vegetables in Korea, were precooled with ice or vacuum cooling method immediately after harvest. The vacuum cooling was the most effective for the field heat removal of vegetable corn. It took only 30 min. at 4 to 5 torr of cold chamber pressure of vacuum precooler to lower the corn temperature from 30 to 2$^{\circ}C$. The ice cooling was also thought to be a useful precooling method with relatively short cooling time of 6 hrs. The vegetable corn treated with vacuum or ice cooling showed low and stable respiration rates of 25.5 to 43.5 CO2 mg/kg/hr. when stored at 0∼2$^{\circ}C$ while the samples stored at room temperature (20∼25$^{\circ}C$) without precooling were as high as 64.1 to 245 CO, mg/kg/hr.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.71.2-71.2
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• 2013

천연가스를 화학적 전환에 의해 부가가치를 높이기 위해서는 리포밍에 의해 합성가스(CO/H2)를 경유하는 간접전환경로가 현재로서는 가장 현실적인 방법이라 할 수 있다. 천연가스를 이용한 합성가스 제조기술은 수증기개질법(SRM), 이산화탄소 개질법(CDR, dry reforming), 부분산화법, 촉매 부분 산화법, 자열개질법 등으로 구분되며, 최근에는 각각의 제조방법의 장점을 고려하여 혼합개질법 또는 일련의 리포머 조합 방법이 개발되고 있다. CDR은 촉매 하에서 메탄과 이산화탄소의 직접접촉에 의해 반응이 일어나며, 수소와 일산화탄소의 비가 같은 합성가스가 제조된다. SRM에 비하여 고온에서 반응이 일어나고 전환율이 더 낮으므로 에너지 소비가 상대적으로 높다. 하지만, SRM과 함께 사용하면 합성가스 비율을 F-T합성이나 메탄올 합성에 적절한 비율로 조절이 가능한 장점이 있으며, 온실가스를 저감시킬 수 있는 전환기술로도 각광받고 있다. 본 발표에서는 최근의 CDR을 이용한 가스로부터 합성석유(GTL)와 메탄올을 고효율로 생산하는 기술 개발 동향에 대해서 소개하고자 한다.

• Journal of the Korean Vacuum Society
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• v.4 no.S2
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• pp.24-29
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• 1995

The magnetic amd magneto-optical(MO)properties of Co-based multilayered(ML)films are known to vary sensitively according to the manufacturing methods and the film microstructures. Co/Pd and Co/Pt ML films with ultrathin layers of Co were prepared by alternating deposition in an ultrahigh-vacuum physical-vapor-deposition system. The individual layer thicknesses of the samples were estimated making use of the angular positions of x-ray diffraction peaks. The magnetic and MO properties were investigated, and correlated systematically to the structural parameters of the films. A Kerr spectrometer was self-manufactured to measure the MO properties such as Kerr rotation angle, ellipticity and reflectivity. The rms surface roughness was also measured using atomic force microscopy. Some of the samples showed good properties for MO medium, such as large perpendicular magnetic anisotropy and Kerr rotation, and perfect squareness of the magnetic hysteresis loop.

• Journal of the Korean Society for Heat Treatment
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• v.37 no.4
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• pp.172-181
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• 2024

In this study, the effect of addition of Ti and Co elements on microstructural evolution and characteristics of vacuum-casted Cu-25%Cr electrical contact material was investigated. The coarse and insoluble Cr phases with an average size of 300 ㎛ in commercial Cu-25%Cr alloy were reduced to tens of micrometers in vacuum casted Cu-25%Cr-X(X=Ti, Co) alloy, which can be interpreted as result controlling coarsening and the work-frame structure of the insoluble Cr phase by the formation of intermetallic compounds such as Cr₂Ti or Cr_0.5Co_1.5Ti around the Cr phase As a result, the electrical properties such as weight loss and fusion resistance against the repeated arc generation of the electrical contact material as well as the mechanical properties were greatly improved.

• Journal of the Korean institute of surface engineering
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• v.43 no.2
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• pp.80-85
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• 2010

The surfaces of WC-Co and SCM415 were etched to form a micro size protrusion for oil based ultra low friction applications using an ion bombardment process in a filtered vacuum arc plasma. WC-Co species showed that a self-patterned surface was available by the ion bombarding process due to the difference of sputtering yield of WC and Co. And the increasing rate of roughness was 0.6 nm/min at -600 V substrate bias voltage. The increasing rate of roughness of SCM415 species was 1.5 nm/min at -800 V, but the selfpatterning effect as shown in WC-Co was not appeared. When the SCM415 species pretreated by electrical discharge machining is etched, the increasing rate of roughness increased from 1.5 nm/min to 40 nm/min at -800 V substrate bias voltage and the uniform surface treatment was available.