• 제목/요약/키워드: transfer layer

검색결과 1,533건 처리시간 0.155초

UV 나노임프린트 공정에서의 수지 액적 증발 거동 분석 (Analysis of the Evaporation Behavior of Resin Droplets in UV-Nanoimprint Process)

  • 최두순;김기돈
    • 소성∙가공
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    • 제18권3호
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    • pp.268-273
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    • 2009
  • Ultraviolet nanoimprint lithography (UV-NIL), which is performed at a low pressure and at room temperature, is known as a low cost method for the fabrication of nano-scale patterns. In the patterning process, maintaining the uniformity of the residual layer is critical as the pattern transfer of features to the substrate must include the timed etch of the residual layer prior to the etching of the transfer layer. In pursuit of a thin and uniform residual layer thickness, the initial volume and the position of each droplet both need to be optimized. However, the monomer mixtures of resin had a tendency to evaporate. The evaporation rate depends on not only time, but also the initial volume of the monomer droplet. In order to decide the initial volume of each droplet, the accurate prediction of evaporation behavior is required. In this study, the theoretical model of the evaporation behavior of resin droplets was developed and compared with the available experimental data in the literature. It is confirmed that the evaporation rate of a droplet is not proportional to the area of its free surface, but to the length of its contact line. Finally, the parameter of the developed theoretical model was calculated by curve fitting to decide the initial volume of resin droplets.

도공층의 공극성이 인쇄후 잉크의 잔류 거동에 미치는 영향 - 안료와 잉크의 효과 - (Investigation on Relationship Between Pore Structure of Coating Layer and Ink Residual Behavior - Focused on the Effect of Pigments and Inks -)

  • 김병수;정현채;박종열
    • 펄프종이기술
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    • 제34권3호
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    • pp.53-58
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    • 2002
  • This paper was performed to investigate the effect of pore structure on ink residual behavior. To prepare different coating structures as substrates against inks, fine, medium and coarse calcium carbonate were used in the coating color. It is well known ink properties can affect to print qualities. After printing on the coated paper, ink layer can consider as third structure addition to paper and coating layer. To compare effect of ink properties on the surface structure and print qualities, several properties of ink were also adopted as raw material. Particle size of pigment effect on gloss evaluation of coated paper increased with calendering. It was shown that ink transfer rate increased as surface of the sample was smooth. The ink contained low viscosity resin evaluated more print gloss. Finer pigment particle size, smaller pore size and higher porosity. Pore volume of coated paper was slightly decreased with printing as the coating was prepared with the finest particle size. However, it founded that ink resin could not affect on pore volume and distribution of printed paper

무전해 니켈 도금을 이용한 절연기판상의 미세전도성 패턴 제조 (Microfabrication of Micro-Conductive patterns on Insulating Substrate by Electroless Nickel Plating)

  • 이봉구;문준희
    • 대한금속재료학회지
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    • 제48권1호
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    • pp.90-100
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    • 2010
  • Micro-conductive patterns were microfabricated on an insulating substrate ($SiO_2$) surface by a selective electroless nickel plating process in order to investigate the formation of seed layers. To fabricate micro-conductive patterns, a thin layer of metal (Cu.Cr) was deposited in the desired micropattern using laser-induced forward transfer (LIFT). and above this layer, a second layer was plated by selective electroless plating. The LIFT process. which was carried out in multi-scan mode, was used to fabricate micro-conductive patterns via electroless nickel plating. This method helps to improve the deposition process for forming seed patterns on the insulating substrate surface and the electrical conductivity of the resulting patterns. This study analyzes the effect of seed pattern formation by LIFT and key parameters in electroless nickel plating during micro-conductive pattern fabrication. The effects of the process variables on the cross-sectional shape and surface quality of the deposited patterns are examined using field emission scanning electron microscopy (FE-SEM) and an optical microscope.

Characteristics of Infrared Blocking, Stealth and Color Difference of Aluminum Sputtered Fabrics

  • Han, Hye Ree
    • 한국의류학회지
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    • 제43권4호
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    • pp.592-604
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    • 2019
  • This study examines the stealth function of sputtered fabric with an infrared thermal imaging camera in terms of the thermal and infrared (IR) transmittance characteristics. Various base fabrics were selected, infrared imaging was performed, and infrared transmittance was measured. By infrared camera experiment it was found that the sample was concealed because it had a similar color to the surroundings when the aluminum layer was directed toward the outside. In addition, a comparison of the infrared thermographic image of the untreated sample and the sputtered sample in the laboratory showed that the difference in ${\Delta}E$ value ranged from 31 to 90.4 and demonstrated effective concealment. However, concealment was not observed in the case of the 3-layer (Nylon-Al-Nylon) model when a sputtered aluminum layer existed between two nylon layers. The direction of the sputtering layer did not affect the infrared transmittance in the infrared transmittance experiment. Therefore, it seems better to interpret the concealing effect in the infrared thermographic images by using thermal transfer theory rather than infrared transmittance theory. We believe that the results of this study will be applicable to developing high performance smart clothing and military uniforms.

UNIST-DISNY 설비 피복관에 침적된 크러드의 열전달 모델링 (Modelling Heat Transfer Through CRUD Deposited on Cladding Tube in UNIST-DISNY Facility)

  • 유선오;김지용;방인철
    • 한국압력기기공학회 논문집
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    • 제19권2호
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    • pp.109-116
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    • 2023
  • This study presents a CRUD modelling to simulate the thermal resistance behavior of CRUD, deposited on the surface of a cladding tube of a fuel assembly. When heat produced from fuels transfers to a coolant through a cladding tube, the CRUD acting as an additional thermal resistance is expressed as two layers, i.e., a solid oxide layer and an imaginary fluid layer, which are added to the experimental tube's heat structure of the MARS-KS input data. The validation calculation for the experiments performed in UNIST-DISNY facility showed that the center and surface temperatures of the cladding tube increased as the porosity and the steam amount inside pores of the CRUD got higher. In addition, the temperature gradient in the imaginary fluid layer was calculated to be larger than that in the solid oxide part, indicating that the steam amount inside the layer acted more largely as thermal resistance. It was also evaluated through sensitivity calculations that the cladding tube temperature was more sensitive to the CRUD porosity and the steam amount in pores than to the inlet flow rate of the coolant.

Simultaneous Transfer and Patterning of CVD-Grown Graphene with No Polymeric Residues by Using a Metal Etch Mask

  • 장미;정진혁;;이내응
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.642-642
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    • 2013
  • Graphene, two dimensional single layer of carbon atoms, has tremendous attention due to its superior property such as high electron mobility, high thermal conductivity and optical transparency. Especially, chemical vapor deposition (CVD) grown graphene has been used as a promising material for high quality and large-scale graphene film. Unfortunately, although CVD-grown graphene has strong advantages, application of the CVD-grown graphene is limited due to ineffective transfer process that delivers the graphene onto a desired substrate by using polymer support layer such as PMMA(polymethyl methacrylate). The transferred CVD-grown graphene has serious drawback due to remaining polymeric residues generated during transfer process, which induces the poor physical and electrical characteristics by a p-doping effect and impurity scattering. To solve such issue incurred during polymer transfer process of CVD-grown graphene, various approaches including thermal annealing, chemical cleaning, mechanical cleaning have been tried but were not successful in getting rid of polymeric residues. On the other hand, lithographical patterning of graphene is an essential step in any form of microelectronic processing and most of conventional lithographic techniques employ photoresist for the definition of graphene patterns on substrates. But, application of photoresist is undesirable because of the presence of residual polymers that contaminate the graphene surface consistent with the effects generated during transfer process. Therefore, in order to fully utilize the excellent properties of CVD-grown graphene, new approach of transfer and patterning techniques which can avoid polymeric residue problem needs to be developed. In this work, we carried out transfer and patterning process simultaneously with no polymeric residue by using a metal etch mask. The patterned thin gold layer was deposited on CVD-grown graphene instead of photoresists in order to make much cleaner and smoother surface and then transferred onto a desired substrate with PMMA, which does not directly contact with graphene surface. We compare the surface properties and patterning morphology of graphene by scanning electron microscopy (SEM), atomic force microscopy(AFM) and Raman spectroscopy. Comparison with the effect of residual polymer and metal on performance of graphene FET will be discussed.

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평판 핀에서의 강제대류 열전달에 미치는 복사효과 (Radiative Effect on the Conjugated Forced Convection-Conduction Heat Transfer in a Plate Fin)

  • 손병진;민묘식;최상경
    • 대한기계학회논문집
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    • 제14권2호
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    • pp.453-462
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    • 1990
  • The interaction of forced convection-conduction with thermal radiation in laminar boundary layer over a plate fin is studied numerically. The analysis is based on complete solution whereby the heat conduction equation for the fin is solved simultaneously with the conservation equations for mass, momentum and energy in the fluid boundary layer adjacent to the fin. The fluid is a gray medium and diffusion(Rosseland) approximation is used to describe the radiative heat flux in the energy equation. The resulting boundary value problem are convection-conduction parameter N$_{c}$ and radiation-conduction parameter m, Prandtl number Pr. Numerical results are presented for gases with the Prandtl numbers of 0.7 & 5 with values of N$_{c}$ and M ranging from 0 to 10 respectively. The object of this study is to provide the first results on forced convection-radiation interaction in boundary layer flow over a semi-infinite flay plate which can be used for comparisons with future studies that will consider a more accurate expression for the radiative heat flux. The agreement of the results from the complete solution presented by E. M. Sparrow and those from this paper for the special case of M=0 is good. The overall rate of heat transfer from the fin considering radiative effect is higher than that from the fin neglecting radiative effect. The local heat transfer coefficient with radiative effect is higher than that without radiative effect. In the direction from tip to base, those coefficients decrease at first, attain minimum, and then increase. The larger values of N$_{c}$ M, Pr give rise to larger fin temperature variations and the fin temperature without radiative effect is always higher than that with radiative effect.

초박형 태양전지의 Porous Si Layer Transfer 기술 적용을 위한 전기화학적 실리콘 에칭 (Electrochemical Etching of Silicon in Porous Silicon Layer Transfer Process for Thin Film Solar Cell Fabrication)

  • 이주영;한원근;이재호
    • 마이크로전자및패키징학회지
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    • 제16권4호
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    • pp.55-60
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    • 2009
  • 불산과 에탄올 혼합용액에서 전기화학적 에칭을 통하여 다공성 실리콘 층을 제작하였다. 에칭 시 인가된 초음파의 주파수, 전류밀도, 에칭시간의 변화에 따른 다공성 실리콘 층의 변화를 확인하였다. 초음파를 가해주지 않은 시편은 표면에 특별한 변화가 일어나지 않았으나, 초음파 진동자의 주파수가 40 kHz와 130 kHz인 초음파 발생조에서 실험한 시편을 관찰한 결과, 가해준 초음파의 주파수가 높을수록 다공성 실리콘 층의 기공의 크기가 더 커지고 실리콘 표면에서의 에칭이 더 균일하게 일어났다. 후면접촉 에칭조와 current shield를 이용한 결과 다공성 실리콘 층 전면에 걸쳐 균일하게 기공이 발생하였다. 다공성 실리콘 층의 기공의 크기는 전류밀도가 증가함에 따라 함께 증가하였고, 에칭 시간에는 영향을 받지 않았다.

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