• Journal of the Institute of Electronics Engineers of Korea SD
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• v.47 no.12
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• pp.55-67
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• 2010

The electrical properties of a back drilled via-hole (BDH) without the open-stub and the plated through via-hole (PTH) with the open-stub, which is called the conventional structure, in a high-count multi~layered (HCML) printed circuit board (PCB) were investigated for a high-speed digital system, and a selected inner layer to transmit a high-speed signal was farthest away from the side to mount the component. Within 10 GHz of the broadband frequency, a design of experiment (DOE) methodology was carried out with three cause factors of each via-hole structure, which were the distance between the via-holes, the dimensions of drilling pad and the anti-pad in the ground plane, and then the relation between cause and result factors which were the maximum return loss, the half-power frequency, and the minimum insertion loss was analyzed. Subsequently, the empirical formulae resulting in a macro model were extracted and compared with the experiment results. Even, out of the cause range, the calculated results obtained from the macro model can be also matched with the measured results within 5 % of the error.

• Journal of the Microelectronics and Packaging Society
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• v.19 no.4
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• pp.51-56
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• 2012

In order to fabricate through-Si-vias for thermal vias by using wet etching process, anisotropic etching behavior of Si substrate was investigated as functions of concentration and temperature of TMAH solution in this study. The etching rate of 5 wt%, 10 wt%, and 25 wt% TMAH solutions, of which temperature was maintained at $80^{\circ}C$, was $0.76{\mu}m/min$, $0.75{\mu}m/min$, and $0.30{\mu}m/min$, respectively. With changing the temperature of 10 wt% TMAH solution to $20^{\circ}C$ and $50^{\circ}C$, the etching rate was reduced to $0.067{\mu}m/min$ and $0.233{\mu}m/min$, respectively. Through-Si-vias of $500{\mu}m$-depth could be fabricated by etching a Si substrate for 5 hours in 10 wt% TMAH solution at $80^{\circ}C$ after forming same via-pattern on each side of the Si substrate.

• Journal of the Microelectronics and Packaging Society
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• v.21 no.4
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• pp.117-123
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• 2014

Cu through-vias, which can be used as thermal vias or vertical interconnects, were formed using bottom-up electrodeposition filling as well as top-down electrodeposition filling into open via-holes and their microstructures were observed. Solid Cu through-vias without voids could be successfully formed by bottom-up filling as well as top-down filling with direct-current electrodeposition. While chemical-mechanical polishing (CMP) to remove the overplated Cu layer was needed on both top and bottom surfaces of the specimen processed by top-down filling method, the bottomup process has an advantage that such CMP was necessary only on the top surface of the sample.

• Journal of the Microelectronics and Packaging Society
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• v.17 no.3
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• pp.79-84
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• 2010

Formation of TSV (Through-Si-Via) with an Au seed layer and Cu filling to the via, simplification of bumping process for three dimensional stacking of Si dice were investigated. In order to produce the via holes, the Si wafer was etched by a DRIE (Deep Reactive Ion Etching) process using $SF_6$ and $C_4F_8$ plasmas alternately. The vias were 40 ${\mu}m$ in diameter, 80 ${\mu}m$ in depth, and were produced by etching for 1.92 ks. On the via side wall, a dielectric layer of $SiO_2$ was formed by thermal oxidation, and an adhesion layer of Ti, and a seed layer of Au were applied by sputtering. Electroplating with pulsed DC was applied to fill the via holes with Cu. The plating condition was at a forward pulse current density of 1000 mA/$dm^2$ for 5 s and a reverse pulse current density of 190 mA/$dm^2$ for 25 s. By using these parameters, sound Cu filling was obtained in the vias with a total plating time of 57.6 ks. Sn bumping was performed on the Cu plugs without lithography process. The bumps were produced on the Si die successfully by the simplified process without serious defect.

• Journal of IKEEE
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• v.20 no.2
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• pp.174-176
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• 2016

In this study, we maximize the temperature difference between the ends of a HgTe nanoparticle(NP) thin film on a thermoelectric platform with a through-substrate via. The thermoelectric characteristics of the HgTe NP thin film show p-type behavior and its Seebeck coefficient is $290{\mu}V/K$. In addition, we demonstrate the possibility of wearable thermoelectric devices transforming body heat into electricity from through-substrate via thermoelectric platforms on human skin.

• Journal of Dental Anesthesia and Pain Medicine
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• v.17 no.2
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• pp.157-161
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• 2017

In sedation via the submucosal route, the drug is administered through the maxillary buccal submucosa. It is time saving, effective, and safe. Patients with autism, a mental disorder, often find it hard to make relationships with other people. These patients display a strong resistance to dental treatment and sedation. This study reports a successful case of behavioral management during dental treatment, using sedation via the submucosal route. The patient was strongly resistant to sedation via the oral, intramuscular, and intravenous routes. The drug used was 9 mg (0.1 mg/kg) of midazolam. Through this case report, we reaffirm the significance of sedation via the submucosal route, and expect that it will be used more frequently for patients with autism, who display behaviors that are difficult to manage, patients with other disabilities, and children.

• Journal of Korean Institute of Industrial Engineers
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• v.28 no.1
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• pp.57-62
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• 2002

The semiconductor industry has continuously been looking for the ways to improve yield and to reduce manufacturing cost. The layout modification approach, one of yield enhancement techniques, is applicable to all design styles, but it does not require any additional resources in terms of silicon area. The layout modification method for yield enhancement consists of making local variations in the layout of some layers in such a way that the critical area, and consequently the sensitivity of the layer to point defects, is reduced. Chen and Koren (1995) proposed a greedy algorithm that removes defect sensitive area using via moving, but it is easy to fall into a local minimum. In this paper, we present a via moving algorithm using simulated annealing and enhance yield by diminishing defect sensitive area. As a result, we could decrease the defect sensitive area effectively compared to the greedy algorithm presented by Chen and Koren. We expect that the proposed algorithm can make significant contributions on company profit through yield enhancement.

• JSTS:Journal of Semiconductor Technology and Science
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• v.3 no.3
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• pp.114-121
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• 2003

Through comparing stress state of TEOS and SiLK-embedded structures, the effect of low-k materials on stress and stress distribution in via-line structures were investigated using three-dimensional finite element analyses. In the case of TEOS-embedded via-line structures, hydrostatic stress was concentrated at the via and the top of the lines, where the void was suspected to nucleate. On the other hand, in the via-line structures integrated with SiLK, large von-Mises stress is maintained at the via, thus deformation of via is expected as the main failure mode. A good correlation between the calculated results and experimentally observed failure modes according to dielectric materials was obtained.

• International Journal of Internet, Broadcasting and Communication
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• v.8 no.2
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• pp.49-54
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• 2016

Data delivery is very challenging in VANETs because of its unique characteristics, such as fast topology change, frequent disruptions, and rare contact opportunities. This paper tries to explore the scope of 3G-assisted data delivery in a VANET within a budget constraint of 3G traffic. It is started from the simple S_Random (Srand) and finally reached the 3GSDD, i.e., the proposed algorithm. The performance evaluation of different algorithms is done through the two metrics delivery ratio and average delay. A third function utility is created to reflect the above two metrics and is used to find out the best algorithm. A packet can either be delivered via multihop transmissions in the VANET or via 3G. The main challenge is to decide which set of packets should be selected for 3G transmissions and when to deliver them via 3G. The aim is to select and send those packets through 3G that are most sensitive and requiring immediate attention. Through appropriate communication mechanism, these sensitive information are delivered via VANET for 3G transmissions. This way the sensitive information which could not be transmitted through normal VANET will certainly find its destination through 3G transmission unconditionally and with top priority. The delivery ratio of the packets can also be maximized by this system.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.11a
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• pp.173-174
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• 2007

Through Silicon Via ( TSV)는 향후3D integration devices (CMOS image sensors) 와 보다 더 직접화되고 진보된 memory stack에 기여 할 것이다. 이는 한층 더 진보된 microprocessors system 을 구축 하리라 본다. 해서 본문은 TSV plasma etching processing 소개와 특히 Bosch process에 대한 개선 방법을 제시하고자 한다.