• 제목/요약/키워드: threshold variation

검색결과 369건 처리시간 0.027초

Effects of Offset Gate on Programing Characteristics of Triple Polysilicon Flash EEPROM Cell

  • Kim, Nam-Soo;Choe, Yeon-Wook;Kim, Yeong-Seuk
    • Journal of Electrical Engineering and information Science
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    • 제2권3호
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    • pp.132-138
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    • 1997
  • Electrical characteristics of split-gate flash EEPROM with triple polysilicon is investigated in terms of effects of floating gate and offset gate. In order to search for t the effects of offset gate on programming characteristics, threshold voltage and drain current are studied with variation of control gate voltage. The programming process is believed to depend on vertical and horizontal electric field as well as offset gate length. The erase and program threshold voltage are found to be almost constant with variation of control gate voltage above 12V, while endurance test indicates degradation of program threshold voltage. With increase of offset gate length, program threshold voltage becomes smaller and the drain source voltage just after program under constant control gate voltage becomes higher.

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대면적 고해상도를 위한 AMOLED(Active Matrix Organic Light Emitting Diode)의 문턱전압 보상회로 (A New AMOLED Pixel Structure Compensating Threshold Voltage of TFT for Large-Sized and High Resolution Display)

  • 유장우;정민철;황상준;성만영
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.529-530
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    • 2005
  • A voltage driving AMOLED(Active Matrix Organic Light Emitting Diode) is useful for large-sized, high resolution OLED display. The conventional 2-TFTs, 1-CAP AMOLED circuit suffer from the threshold voltage variation of TFT. In this paper, a new AMOLED structure is proposed. It is composed of 5-TFTs and 2-capacitors. It is described that the operating principle and the characteristics of the proposed structure and is verified the performance by HSPICE simulation. The result of simulation shows that the effect of the threshold voltage variation in this circuit, is able to neglect.

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저전압에서 다결정 실리콘 TFT의 불균일한 특성을 보상한 새로운 AMOLED 구동회로 (A Novel Poly-Si TFT Pixel circuit for AMOLED to Compensate Threshold Voltage Variation of TFT at Low Voltage)

  • 김나영;이문석
    • 대한전자공학회논문지SD
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    • 제46권8호
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    • pp.1-5
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    • 2009
  • 본 논문에서는 저전압에서 다결정 실리콘(Polycrysta1line Silicon: Poly-Si) 박막 트랜지스터 (Thin Film Transistors: TFTs) 의 문턱전압(threshold voltage)의 불균일성을 보상한 새로운 AMOLEDs(Active Matrix Organic Light Diodes) 구동 회로를 제안한다, 제안한 회로는 6개의 스위칭, 1개의 드라이빙 TFT와 1개의 저장 콘덴서로 구성되어 있으며, SPICE 시뮬레이션을 통해 구동회로의 동작을 검증하였다. 시뮬레이션 결과 5V정도의 낮은 구동 전압($V_{DD}$)에서 제안한 화소 구동회로의 OLED 출력 전류는 0.8%정도의 오차를 갖는 반면 기본적인 구동회로의 경우 약20%정도의 오차를 갖는 것을 확인할 수 있었다. 본 논문에서 제안한 화소 구동회로는 OLED의 전류를 결정하는 driving TFT의 threshold voltage 변화에 따른 전류의 변화를 성공적으로 보상하였고, 안정화된 전류를 OLED를 흘려주어 기본적인 화소 회로가 가지고 있던 불균일화의 문제를 해결함을 알 수 있다.

n-채널 다결정 실리콘 박막 트랜지스터의 문턱전압 변동 보상을 위한 전압 기입 AMOLED 화소회로 (A Voltage Programming AMOLED Pixel Circuit Compensating Threshold Voltage Variation of n-channel Poly-Si TFTs)

  • 정훈주
    • 한국전자통신학회논문지
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    • 제8권2호
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    • pp.207-212
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    • 2013
  • 본 논문에서는 n-채널 저온 다결정 실리콘 박막 트랜지스터의 문턱전압 변동을 보상할 수 있는 전압 기입 AMOLED 화소회로를 제안하였다. 제안한 6T1C 화소회로는 5개의 스위칭 박막 트랜지스터, 1개의 OLED 구동 박막 트랜지스터 및 1개의 정전용량으로 구성되어 있다. SmartSpice 시뮬레이션 결과, 구동 트랜지스터의 문턱전압이 ${\pm}0.33$ V 변동시 최대 OLED 전류의 오차율은 7.05 %이고 Vdata = 5.75 V에서 OLED 양극 전압 오차율은 0.07 %로 제안한 6T1C 화소회로가 구동 트랜지스터의 문턱전압 변동에도 균일한 OLED 전류를 공급함을 확인하였다.

Robust Two-Phase Clock Oxide TFT Shift Register over Threshold Voltage Variation and Clock Coupling Noises

  • Nam, Hyoungsik;Song, Eunji
    • ETRI Journal
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    • 제36권2호
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    • pp.321-324
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    • 2014
  • This letter describes a two-phase clock oxide thin-film transistor shift register that executes a robust operation over a wide threshold voltage range and clock coupling noises. The proposed circuit employs an additional Q generation block to avoid the clock coupling noise effects. A SMART-SPICE simulation shows that the stable shift register operation is established for the clock coupling noises and the threshold voltage variation from -4 V to 5 V at a line time of $5{\mu}s$. The magnitude of coupling noises on the Q(15) node and Qb(15) node of the 15th stage is respectively -12.6 dB and -26.1 dB at 100 kHz in the proposed circuit, compared to 6.8 dB and 10.9 dB in a conventional one. In addition, the estimated power consumption is 1.74 mW for the proposed 16-stage shift registers at $V_{TH}=-1.56V$, compared to 11.5 mW for the conventional circuits.

Threshold Voltage Dependence on Bias for FinFET using Analytical Potential Model

  • Jung, Hak-Kee
    • Journal of information and communication convergence engineering
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    • 제8권1호
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    • pp.107-111
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    • 2010
  • This paper has presented the dependence of the threshold voltage on back gate bias and drain voltage for FinFET. The FinFET has three gates such as the front gate, side and back gate. Threshold voltage is defined as the front gate bias when drain current is 1 micro ampere as the onset of the turn-on condition. In this paper threshold voltage is investigated into the analytical potential model derived from three dimensional Poisson's equation with the variation of the back gate bias and drain voltage. The threshold voltage of a transistor is one of the key parameters in the design of CMOS circuits. The threshold voltage, which described the degree of short channel effects, has been extensively investigated. As known from the down scaling rules, the threshold voltage has been presented in the case that drain voltage is the 1.0V above, which is set as the maximum supply voltage, and the drain induced barrier lowing(DIBL), drain bias dependent threshold voltage, is obtained using this model.

Computing-Inexpensive Matrix Model for Estimating the Threshold Voltage Variation by Workfunction Variation in High-κ/Metal-gate MOSFETs

  • Lee, Gyo Sub;Shin, Changhwan
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제14권1호
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    • pp.96-99
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    • 2014
  • In high-${\kappa}$/metal-gate (HK/MG) metal-oxide-semiconductor field-effect transistors (MOSFETs) at 45-nm and below, the metal-gate material consists of a number of grains with different grain orientations. Thus, Monte Carlo (MC) simulation of the threshold voltage ($V_{TH}$) variation caused by the workfunction variation (WFV) using a limited number of samples (i.e., approximately a few hundreds of samples) would be misleading. It is ideal to run the MC simulation using a statistically significant number of samples (>~$10^6$); however, it is expensive in terms of the computing requirement for reasonably estimating the WFV-induced $V_{TH}$ variation in the HK/MG MOSFETs. In this work, a simple matrix model is suggested to implement a computing-inexpensive approach to estimate the WFV-induced $V_{TH}$ variation. The suggested model has been verified by experimental data, and the amount of WFV-induced $V_{TH}$ variation, as well as the $V_{TH}$ lowering is revealed.

다양한 보행속도와 경사각에 대한 보행수 검출을 위한 필터링 조건과 역치의 결정 (Determination of filtering condition and threshold for detection of Gait-Cycles under Various Gait Speeds and Walkway Slopes)

  • 권유리;김지원;이재호;탁계래;엄광문
    • 대한의용생체공학회:의공학회지
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    • 제30권6호
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    • pp.516-520
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    • 2009
  • The purpose of this study is to determine optimal filtering condition and threshold for the detection of gait-cycles for various walkway slopes as well as gait velocities. Ten young healthy subjects with accelerometer system on thigh and ankle walked on a treadmill at 9 conditions (three speeds and three slopes) for 5 minutes. Two direction signals, i.e. anterior-posterior (AP) and superior-inferior (SI) directions, of each sensor (four sensor orientations) were used to detect specific events of gait cycle. Variation of the threshold (from -1G to 1G) and lowpass cutoff frequency (fc) were applied to the event detection and their performance was evaluated according to the error index (EI), which was defined as the combination of the accuracy and false positive rate. Optimal fc and threshold were determined for each slope in terms of the EI. The optimal fc, threshold and their corresponding EI depended much on the walkway slope so that their coefficients of variation (CV) ranged 19~120%. When all data for 3 slopes were used in the identification of optimal conditions for each sensor, the best error indices for all sensor orientations were comparable ranging 1.43~1.76%, but the optimal fc and threshold depended much on the sensor position. The result indicates that the gait-cycle detection robust to walkway slope is possible by threshold method with well-defined filtering condition and threshold.

Analysis of Transport Characteristics for FinFET Using Three Dimension Poisson's Equation

  • Jung, Hak-Kee;Han, Ji-Hyeong
    • Journal of information and communication convergence engineering
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    • 제7권3호
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    • pp.361-365
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    • 2009
  • This paper has been presented the transport characteristics of FinFET using the analytical potential model based on the Poisson's equation in subthreshold and threshold region. The threshold voltage is the most important factor of device design since threshold voltage decides ON/OFF of transistor. We have investigated the variations of threshold voltage and drain induced barrier lowing according to the variation of geometry such as the length, width and thickness of channel. The analytical potential model derived from the three dimensional Poisson's equation has been used since the channel electrostatics under threshold and subthreshold region is governed by the Poisson's equation. The appropriate boundary conditions for source/drain and gates has been also used to solve analytically the three dimensional Poisson's equation. Since the model is validated by comparing with the three dimensional numerical simulation, the subthreshold current is derived from this potential model. The threshold voltage is obtained from calculating the front gate bias when the drain current is $10^{-6}A$.

A Methodology of Dual Gate MOSFET Dosimeter with Compensated Temperature Sensitivity

  • Lho, Young-Hwan
    • 전기전자학회논문지
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    • 제15권2호
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    • pp.143-148
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    • 2011
  • MOS (Metal-Oxide Semconductor) devices among the most sensistive of all semiconductors to radiation, in particular ionizing radiation, showing much change even after a relatively low dose. The necessity of a radiation dosimeter robust enough for the working environment has increased in the fields of aerospace, radio-therapy, atomic power plant facilities, and other places where radiation exists. The power MOSFET (Metal-Oxide Semiconductor Field-Effect Transistor) has been tested for use as a gamma radiation dosimeter by measuring the variation of threshold voltage based on the quantity of dose, and a maximum total dose of 30 krad exposed to a $^{60}Co$ ${\gamma}$-radiation source, which is sensitive to environment parameters such as temperature. The gate oxide structures give the main influence on the changes in the electrical characteristics affected by irradiation. The variation of threshold voltage on the operating temperature has caused errors, and needs calibration. These effects can be overcome by adjusting gate oxide thickness and implanting impurity at the surface of well region in MOSFET.