• Title/Summary/Keyword: thin film resonator

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The Study of Near-field Scanning Microwave Microscope for the Nondestructive Detection System (비파괴 측정을 위한 근접장 마이크로파 현미경 연구)

  • Kim, Joo-Young;Kim, Song-Hui;Yoo, Hyun-Jun;Yang, Jong-Il;Yoo, Hyung-Keun;Yu, Kyong-Son;Kim, Seung-Wan;Lee, Kie-Jin
    • Journal of the Korean Society for Nondestructive Testing
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    • v.24 no.5
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    • pp.508-517
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    • 2004
  • We described a near-field scanning microwave microscope which uses a high-quality dielectric resonator with a tunable screw. The operating frequency is f=4.5 5GHz. The probe tip is mounted in a cylindrical resonant cavity coupled to a dielectric resonator We developed a hybrid tip combining a reduced length of the tapered part with a small apex. In order to understand the function of the probe, we fabricated three different tips using a conventional chemical etching technique and observed three different NSMM images for patterened Cr films on glass substrates. We measured the reflection coefficient of different metal thin film samples with the same thickness of 300m and compared with theoretical impedance respectly. By tuning the tunable screw coming through the top cover, we could improve sensitivity, signal-to-noise ratio, and spatial resolution to better than $1{\mu}m$. To demonstrate the ability of local microwave characterization, the surface resistance of metallic thin films has been mapped.

Polymer Optical Microring Resonator Using Nanoimprint Technique (나노 임프린트 기술을 이용한 폴리머 링 광공진기)

  • Kim, Do-Hwan;Im, Jung-Gyu;Lee, Sang-Shin;Ahn, Seh-Won;Lee, Ki-Dong
    • Korean Journal of Optics and Photonics
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    • v.16 no.4
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    • pp.384-391
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    • 2005
  • A polymer optical microring resonator, which is laterally coupled to a straight bus waveguide, has been proposed and demonstrated using a nanoimprint technique. The propagation loss of the ring waveguide and the optical power coupling between the ring and bus waveguides was calculated by using a beam propagation method, then the dependence of the device performance on them was investigated using a transfer matrix method. We have especially introduced an imprint stamp incorporating a smoothing buffer layer made of a silicon nitride thin film. This layer played an efficient role in improving the sidewall roughness of the waveguide pattern engraved on the stamp and thus reducing the scattering loss. As a result the overall Q factor of the resonator was greatly increased. Also it reduced the gap between the ring and bus waveguides effectively to enhance the coupling between them, without relying on the direct writing method based on an e-beam writer. As for the achieved device performance at the wavelength of 1550 nm, the quality factor, the extinction ratio, and the free spectral range were ~103800, ~11 dB, and 1.16 m, respectively.

Design and Implementation of Linear Gain Equalizer for Microwave band (초고주파용 선형 이득 등화기 설계 및 제작)

  • Kim, Kyoo-Hwan
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.17 no.11
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    • pp.635-639
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    • 2016
  • In the devices used in the microwave frequency band, the gain decreases as the frequency increases due to the parasitic component. To compensate for these characteristics, a linear gain equalizer with an opposite slope is needed in wideband systems, such as those used for electronic warfare. In this study, a linear gain equalizer that can be used in the 18 ~ 40GHz band is designed and fabricated. Circuit design and momentum design (optimizations) were carried out to reduce the errors between design and manufacturing. A thin film process is used to minimize the parasitic components within the implementation frequency band. A sheet resistance of 100 ohm/square was employed to minimize the wavelength variation due to the length of the thin film resistor. This linear gain equalizer is a structure that combines a quarter wavelength-resonator on a series microstrip line with a resistor. All three 1/4 wavelength short resonators were used. The fabricated linear gain equalizer has a loss of more than -5dB at 40GHz and a 6dB slope in the 18 ~ 40GHz band. By using the manufactured gain equalizer in a multi-stage connected device such as an electronic warfare receiver, the gain flatness degradation with increasing frequency can be reduced.

Effect of a 3C-SiC buffer layer on SAW properties of AlN films (3C-SiC 버퍼층이 AlN 박막형 SAW 특성에 미치는 영향)

  • Hoang, Si-Hong;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.235-235
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    • 2009
  • This paper describes the influence of a polycrystalline (poly) 3C-SiC buffer layer on the surface acoustic wave (SAW) properties of poly aluminum nitride (AlN) thin films by comparing the center frequency, insertion loss, the electromechanical coupling coefficient ($k^2$), andthetemperaturecoefficientoffrequency(TCF) of an IDT/AlN/3C-SiC structure with those of an IDT/AlN/Si structure, The poly-AlN thin films with an (0002)-preferred orientation were deposited on a silicon (Si) substrate using a pulsed reactive magnetron sputtering system. Results show that the insertion loss (21.92 dB) and TCF (-18 ppm/$^{\circ}C$) of the IDT/AlN/3C-SiC structure were improved by a closely matched coefficient of thermal expansion (CTE) and small lattice mismatch (1 %) between the AlN and 3C-SiC. However, a drawback is that the $k^2(0.79%)$ and SAW velocity(5020m/s) of the AlN/3C-SiC SAW device were reduced by appearing in some non-(0002)AlN planes such as the (10 $\bar{1}$ 2) and (10 $\bar{1}$ 3) AlN planes in the AlN/SiC film. Although disadvantages were shown to exist, the use of the AlN/3C-SiC structure for SAW applications at high temperatures is possible. The characteristics of the AlN thin films were also evaluated using FT-IR spectra, XRD, and AFM images.

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Microstructure Control of Tungsten Film for Bragg Reflectors of Thin Film Bulk Acoustic Wave Resonators (체적탄성파 공진기 브라그 반사층 적용을 위한 텅스텐 박막의 미세구조 조절에 대한 연구)

  • 강성철;이시형;박종완;이전국
    • Journal of the Korean Ceramic Society
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    • v.40 no.3
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    • pp.268-272
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    • 2003
  • The microstructures of tungsten films were controlled by changing the sputtering pressure and substrate temperatures during D.C. sputter deposition. As the sputtering pressures were decreased, the sputtered models of the tungsten films were changed from the zone I model to zone T model. The tungsten film having zone T model microstructure shows a resistivity of 10${\times}$10$\^$-6/ $\Omega$-cm and (110) preferred orientation. FBAR with Bragg reflector composed of $SiO_2$and tungsten films having zone T model microstructure shows quality factor, Q$\_$s/, of 494 and K$\_$eff/$\^$2/ of 5.5% due to the high acoustic impedance and the smooth surface.

TFBAR Lattice and Balanced Type Filter Topologies (격자형 및 평형 구조를 가지는 박막공진 여파기에 관한 연구)

  • 김건욱;구명권;육종관;박한규
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.13 no.10
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    • pp.1048-1053
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    • 2002
  • In this paper, thin film bulk acoustic resonator(TFBAR) lattice and balanced type filter topologies are designed and fabricated. Aluminium nitride and platinum are used for piezoelectric material and top and bottom electrodes, respectively. Air-gap is placed to avoid silicon substrate loading effect and the performance of these lattice and balanced filters is compared with ladder filters. These filters have selectivity over 15 dB for lattice type and 30 dB for balanced type and reveal wider bandwidth of the ladder filters. For balanced type filters, minor tuning procedure is not needed and they are readily available for RF filter in wireless applications.

A New Modeling Methodology of TFBAR (박막공진기에 대한 새로운 모델링 기법)

  • 김종수;구명권;육종관
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.15 no.1
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    • pp.103-109
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    • 2004
  • In this paper, a new modeling methodology of thin film bulk acoustic resonator(TFBAR) is presented and the formulations of each lumped element in the model are also introduced. The new model is based upon the Mason model that is a reasonable model to explain the physical characteristics of unit TFBAR. After simplifying the modified Mason model with an additional dielectric loss term, the new model similar to Modified Butterworth-Van Dyke(MBVD) model is complete. The proposed model has three optimization variables which is half of the MBVD model. As a result, the curve fittings for the measured data are much faster and more accurate than any other conventional models. Moreover, it is very useful to design the bandpass filters or voltage controlled oscillators due to the design parameters, such as resonant and anti-resonant frequency, which can reflect the intentions of designer in the model.

A Study on the Scribing of FTO using Pulsed Nd:YAG Laser (펄스형 Nd:YAG 레이저를 이용한 FTO 식각에 대한 연구)

  • Kim, Hee-Je;Park, Sung-Joon;Son, Min-Kyu;Lee, Dong-Kil;Lee, Kyoung-Jun
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.57 no.8
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    • pp.1407-1411
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    • 2008
  • In material processing, a laser system with optimal laser parameters has been considered to be significant. Especially, the laser scribing technology is thought to be very important for fabricating DSSC(Dye sensitized solar eel!) modules with good quality. Moreover, the $TEM_{00}$ mode laser beam is the most dominant factor to decide the IPCE(Incident photon to current conversion efficiency) characteristics. In order to get the $TEM_{00}$ mode, a pin-hole is inserted within a simple pulsed Nd:YAG laser resonator. And the spatial field distribution is measured by using three size pin-hole diameters of 2.0, 6.0mm respectively. At that moment, each case has the same laser beam energy by adjusting the discharge voltage and pps(pulse per second). From those results, it is known that the pin-hole size of 2.0mm has the perfect $TEM_{00}$ mode. In addition, at the charging voltage of 1000V, 10pps and the feeding speed of 1.11mm/sec, the SEM photo of FTO(Fluorine-doped tin oxide) thin film layers shows the best scribing trace.