• 제목/요약/키워드: subwavelength structure

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Subwavelength 결함접지구조(defected grounded structure : DGS)를 이용한 Homogeneous Dual Composite Right/Left-Handed 메타물질 구현 (Homogeneous Dual Composite Right/Left-Handed Metamaterial Using Subwavelength Defected Ground Structure(DGS))

  • 박우영;임성준
    • 전기학회논문지
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    • 제58권11호
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    • pp.2242-2246
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    • 2009
  • In this paper, a homogeneous dual composite right/left-handed (D-CRLH) transmission line (TL) is proposed by using a defected ground structure (DGS) on the ground plane. In order to satisfy a homogeneity condition of metamaterial, a subwavelength unit cell is designed by way of a spiral DGS and a meander stub. From a dispersion diagram, it is expected that the frequency bands for the left-handed (LH) property is 3.5 - 4.4 GHz. At 3.8 GHz in the LH band, backward propagating phenomenon is observed from full-wave analysis. The experimental results show that the proposed TL has a stop-band in 1.75 - 3.6 GHz.

Subwavelength Focusing of Light From a Metallic Slit Surrounded by Grooves with Chirped Period

  • Yoon Jaewoong;Choi Kiyoung;Song Seok Ho;Lee Gwansu
    • Journal of the Optical Society of Korea
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    • 제9권4호
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    • pp.162-168
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    • 2005
  • Extraordinary phenomena related to the transmission of light via metallic films with subwavelength holes and grooves are known to be due to resonant excitation and interference of surface waves. These waves make various surface structures to have optically effective responses. Further, a related study subject involves the control of light transmitted from a single hole or slit by surrounding it with diffractive structures. This paper reports on the effects of controlling light with a periodic groove structure with Fresnel-type chirping. In Fresnel-type chirping, diffracted surface waves are coherently converged into a focus, and it is designed considering the conditions of constructive interference and angular spectrum optimization under the assumption that the surface waves are composite diffracted evanescent waves with a well-defined in-plane wavenumber. The focusing ability of the chirped periodic structures is confirmed experimentally by two-beam attenuated total reflection coupling. Critical factors for achieving subwavelength foci and bounds on size of focal spots are discussed in terms of the simulation, which uses the FDTD algorithm.

Modulator of surface plasmon polariton based cycle branch graphene waveguide

  • Zhu, Jun;Xu, Zhengjie;Xu, Wenju;Wei, Duqu
    • Carbon letters
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    • 제25권
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    • pp.84-88
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    • 2018
  • At present, an important research area is the search for materials that are compatible with CMOS technology and achieve a satisfactory response rate and modulation efficiency. A strong local field of graphene surface plasmon polariton (SPP) can increase the interaction between light and graphene, reduce device size, and facilitate the integration of materials with CMOS. In this study, we design a new modulator of SPP-based cycle branch graphene waveguide. The structure comprises a primary waveguide of graphene-$LiNbO_3$-graphene, and a secondary cycle branch waveguide is etched on the surface of $LiNbO_3$. Part of the incident light in the primary waveguide enters the secondary waveguide, thus leading to a phase difference with the primary waveguide as reflected at the end of the branch and interaction coupling to enhance output light intensity. Through feature analysis, we discover that the area of the secondary waveguide shows significant localized fields and SPPs. Moreover, the cycle branch graphene waveguide can realize gain compensation, reduce transmission loss, and increase transmission distance. Numerical simulations show that the minimum effective mode field area is about $0.0130{\lambda}^2$, the gain coefficient is about $700cm^{-1}$, and the quality factor can reach 150. The structure can realize the mode field limits of deep subwavelength and achieve a good comprehensive performance.

소형 개구의 투과효율 향상을 위한 일반 이론 (General Theory for Enhancing the Transmission Efficiency through Small Apertures)

  • 조영기
    • 한국전자파학회논문지
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    • 제25권11호
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    • pp.1113-1120
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    • 2014
  • 본 논문에서는 무한 평판에 위치한, 파장에 비하여 작은 개구의 투과효율을 향상시키는 두 가지 방법으로서 첫째, 리지가 있는 소형 원형 개구와 같은 투과공진개구 구조를 이용하는 방법, 둘째, 투과공진기 구조를 이용하는 일반적인 방법을 생각해 보았다. 특히 상기 두 가지 구조의 경우, 최대 투과 단면적이 공통적으로 $\frac{2G{\lambda}^2}{4{\pi}}[m^2]$(G는 개구의 이득)이 됨을 보였다. 그리고 두 구조의 근접장 현미경의 탐침 구조에의 적용 가능성을 검증하기 위하여 구형 도파관의 종단면에 장착된 구조로서 임피던스 정합 특성을 조사하였다. 또한, 상보적인 문제로서 파장에 비하여 충분히 작은 공진 산란체의 경우에도 관찰되는, 앞서 다룬 투과 공진 현상과 본질적으로 유사한 산란 공진 현상에 대하여도 논의하였다. 이러한 논의는 원자 물리 분야에서 원자 구조의 산란 단면적이 실제 원자 구조의 물리적인 단면적에 비하여 매우 큰 현상에 대한 이해를 하는데 도움이 될 것으로 사료된다.

음향메타물질 단위격자 축소를 통한 소리 차단 (Sound Blocking Using Acoustic Metamaterial Scaling)

  • 박성준;송경준;김제도
    • 한국음향학회지
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    • 제34권5호
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    • pp.371-376
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    • 2015
  • 본 연구는 지그재그 형상의 음향메타물질 구조체를 1:1, 1:2와 1:4의 축척으로 구성하여 순차배치시킴으로써 나타나는 광대역 음파차단 현상을 유한요소법을 이용하여 분석하였다. 그 결과 단위격자를 축소시킨 구조체의 투과 음압레벨(Sound Pressure Level, SPL)은 각 구조체의 독립적인 투과 특성을 중첩한 것과 같은 효과를 얻었으며 이로인해 음파차단 대역폭과 크기가 현저히 증가하는 것을 볼 수 있다. 또한 유효물질 이론을 이용하여 음향메타물질이 매질의 임피던스와 굴절률을 높이는 것을 확인 하였다. 본 연구를 통해 다양한 메타물질을 이용하고 이를 단위격자를 축소시킴으로써 효과적인 광대역 소리차단을 실현 할 수 있을 것으로 기대된다.

Reduction of reflection from PET (polyethylene terephthalate) film surface by natural plasma etching

  • Oh, Hoon;Song, Yu-Jin;Whang, Ki-Woong
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.1419-1424
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    • 2006
  • We could reduce the reflection from PET(polyethylene terephthalate) film surface by natural plasma etching which does not use etch masks. The plasma etched PET film showed lower reflectance and higher transmittance which is resulted by making subwavelength structure(SWS) on the film surface by the plasma etch rate difference between the amorphous and crystalline region in the surface of PET film.

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Fabrication of Gallium Phosphide Tapered Nanostructures on Selective Surfaces

  • Song, Young Min;Park, Hyun Gi
    • Applied Science and Convergence Technology
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    • 제23권5호
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    • pp.284-288
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    • 2014
  • We present tapered nanostructures fabricated on a selective area of gallium phosphide substrates for advanced optoelectronic device applications. A lithography-free fabrication process was accomplished by dry etching of metal nanoparticles. Thermal dewetting of micro-patterned metal thin films provides etch masks for tapered nanostructures. This simple process also allows the formation of plasmonic surfaces with corrugated shapes. Rigorous coupled-wave analysis calculations provide design guidelines for tapered nanostructures on gallium phosphide substrates.

Fabrication of Optically Active Nanostructures for Nanoimprinting

  • Jang, Suk-Jin;Cho, Eun-Byurl;Park, Ji-Yun;Yeo, Jong-Souk
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.393-393
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    • 2012
  • Optically active nanostructures such as subwavelength moth-eye antireflective structures or surface enhanced Raman spectroscopy (SERS) active structures have been demonstrated to provide the effective suppression of unwanted reflections as in subwavelength structure (SWS) or effective enhancement of selective signals as in SERS. While various nanopatterning techniques such as photolithography, electron-beam lithography, wafer level nanoimprinting lithography, and interference lithography can be employed to fabricate these nanostructures, roll-to-roll (R2R) nanoimprinting is gaining interests due to its low cost, continuous, and scalable process. R2R nanoimprinting requires a master to produce a stamp that can be wrapped around a quartz roller for repeated nanoimprinting process. Among many possibilities, two different types of mask can be employed to fabricate optically active nanostructures. One is self-assembled Au nanoparticles on Si substrate by depositing Au film with sputtering followed by annealing process. The other is monolayer silica particles dissolved in ethanol spread on the wafer by spin-coating method. The process is optimized by considering the density of Au and silica nano particles, depth and shape of the patterns. The depth of the pattern can be controlled with dry etch process using reactive ion etching (RIE) with the mixture of SF6 and CHF3. The resultant nanostructures are characterized for their reflectance using UV-Vis-NIR spectrophotometer (Agilent technology, Cary 5000) and for surface morphology using scanning electron microscope (SEM, JEOL JSM-7100F). Once optimized, these optically active nanostructures can be used to replicate with roll-to-roll process or soft lithography for various applications including displays, solar cells, and biosensors.

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