• Journal of Sensor Science and Technology
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• v.11 no.3
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• pp.183-190
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• 2002

Photoluminescence(PL) properties of $Si^+$-implanted $SiO_2$ film, which was thermally grown on c-Si substrate, is reported. We have compared room temperature photoluminescence (PL) spectra of the samples which was made in several kinds of implantation, subsequent annealing and $SiO_2$ film thickness. XRD data was correlated with the PL spectra. Silicon nanocrystals in $SiO_2$ film is considered as the origin of the photoluminescence. PL spectra was investigated after wet etching of the $SiO_2$ film by using BOE (Buffered Oxide Etchant) at every one minute. PL peak wavelength was varied as the etching is proceeded. These results indicate that the quantity and the distribution of dominant size of Si nanocrystals in $SiO_2$ film seem to have a direct effect on PL spectrum.

• Journal of the Korean institute of surface engineering
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• v.44 no.5
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• pp.226-231
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• 2011

Graphene was coated on STS 316L by electro spray coating method to improve its properties of corrosion resistance and contact resistance. Exfoliated graphite (graphene) was made of the graphite by chemical treatment. Graphene is distributed using dispersing agent, and STS 316L was coated with diffuse graphene solution by electro spray coating method. The structure of the exfoliated graphite was analyzed using XRD and the coating layer of surface was analyzed by using SEM. Analysis showed that multi-layered graphite structure was destroyed and it was transformed into fine layers graphene structure. And the result of SEM analysis on the surface and the cross section, graphene layer was uniformly formed with 3~5 ${\mu}m$ thickness on the surface of substrate. Corrosion resistance test was applied in the corrosive solution which is similar to the PEM fuel cell stack inside. And interfacial contact resistance test was measured to simulate the internal operating conditions of PEM fuel cell stack. The results of measurements show that stainless steel coated with graphene was improved in corrosion resistance and surface contact resistance than stainless steel without graphene coating layer.

• Journal of the Korean Ceramic Society
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• v.41 no.1
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• pp.30-35
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• 2004

PMW-PZT thick films of about $30{\mu}m$ thickness were fabricated on Pt/$TiO_2$/$SiN_x$Si substrate by the hybrid method of screen printing and PZT sol application. With the increase of the number of the sol application times, the sintered density and electrical properties of PMW-PZT thick films were evidently increased. For the PMW-PZT thick film with PZT sol application of 10-times, the dielectric constant ($\varepsilon_r$) was 745 at the frequency of 100 KHz and thepiezoelectric coefficient ($d_33$) was 155 pC/N at the applied pressure of 1 atm.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.18 no.3 s.118
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• pp.298-304
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• 2007

In this paper, the antenna which has a multiband operation (GSM850, EGSM, DCS1800, USPCS, W-CDMA) is proposed. This antenna was designed by the commercial software HFSS 3-D EM simulator, and it is organized by using a meander branch structure which has a via and lines on FR-4$(\varepsilon_r=4.4)$ substrate. Especially, it has a gap feeding structure which makes good operation at overall bandwidth. The designed antenna is manufactured by PCB processing, and measured by using a network analyzer and a test chamber. The manufactured antenna with the dimension of 8 mm width, 20 mm height and 3.2 mm thickness is able to applied as an internal antenna for multiband mobile phones.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.42 no.1
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• pp.286-290
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• 2017

In this paper, we have proposed a hexagonal patch UWB antenna with a band notch characteristic where the notch band of 5.15 ~ 5.85 GHz band of WLAN was induced by inserting a circular slit in the patch. The impedance bandwidth of the proposed antenna meet the band width criteria of UWB communication system where is mentioned as frequencies range form 3.1 ~ 11.8 GHz. The characteristic band at 5.2 ~ 5.8 GHz notch band was observed. The radiation pattern of the antenna shows a directinal radiation pattern at $0^{\circ}$ and $180^{\circ}$ in XZ-plane and YZ-plane is an omni-directional pattern, respectively. In addition, it is observed that increase in frequency results in increases of the antenna gain whereas the notch band section is decreased. The proposed antenna was designed TRF-45 substrate with thickness of 1.62 mm, a loss tangent of 0.0035, a relative permittivity of 4.5 and designed were used Ansys Inc. HFSS.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.11
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• pp.1043-1047
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• 2005

To investigate the electrical properties of the ZnO films which are interested in the next generation of short wavelength LEDs and Lasers, our ZnO thin films were deposited by RF sputtering system. At sputtering process of ZnO thin films, substrate temperature, work pressure respectively is $300^{\circ}C$ and 5.2 mTorr, and the purity of target is ZnO 5N. The thickness of ZnO thin films was about $2.1\;{\mu}m$ at SEM analysis after sputtering process. Phosphorus (P) and arsenic (As) were diffused into the undoped ZnO thin films sputtered by RF magnetron sputtering system in ampoule tube which was below $5\times10^{-7}$ Torr. The dopant sources of phosphorus and arsenic were $Zn_3P_2$ and $ZnAs_2$. Those diffusion was perform at 500, 600, and $700^{\circ}C$ during 3 hr. We found the diffusion condition of the conductive ZnO films which had n- and p-type properties. Our ZnO thin film has not only very high carrier concentration of above $10^{17}/cm^3$ but also low resistivity of below $2.0\times10^{-2}\;{\Omega}cm$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.11a
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• pp.163-166
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• 2002

We investigated structural and electrical properties of Metal-Oxide-Semiconductor(MOS) structure using Hafnium $oxide(HfO_{2})$ as high-k gate dielectric material. $HfO_{2}$ films are ultrathin gate dielectric material witch have a thickness less than 2.0nm， so it is spotlighted to be substituted $SiO_{2}$ as gate dielectric material. In this paper We have grown $HfO_{2}$ films with pt electrode on P-type Silicon substrate by RF magnetron sputtering system using $HfO_{2}$ target and oserved the property of semiconductor-oxide interface. Using pt electrode, it is necessary to be annealed at ${300^{\circ}C}$. This process is to increase an adhesion ratio between $HfO_{2}$ films with pt electrode. In film deposition process, the deposition time of $HfO_{2}$ films is an important parameter. Structura1 properties are invetigated by AES depth profile, and electrical properties by Capacitance-Voltage characteristic. Interface trap density are measured to observe the interface between $HfO_{2}$ with Si using High-frequency(1MHz) C-V and Quasi - static C-V characteristic.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.08a
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• pp.85-88
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• 2003

$Sr_xBa_{1-x}Nb_2O_6$(SBN, $025{\leq}x{\leq}0.75$) ceramic is a ferroelectric material with tetragonal tungsten bronze (TTB) type structure, which has a high pyroelectric coefficient and a nonlinear electro-optic coefficient value. In spite of its advantages, SBN has not been investigated well compared to other ferroelectric materials with perovskite structure. In this study, SBN thin film was manufactured by ion beam sputtering technique using the prepared SBN target in Ar/$O_2$ atmosphere. SBN30 thin film of 500 ${\AA}$ was pre-deposited as a seed layer on Pt(l00)/$TiO_2$/$SiO_2$/Si substrate followed by SBN60 deposition up to 4500 ${\AA}$ in thickness. SBN60/SBN30 layer was deposited at different Oxygen amount of 0, 8.1, 17, and 31.8 sccm, respectively. The crystallinity and orientation behavior as well as electric properties of SBN60/SBN30 multi-layer were examined. The deposited layer was uniform and the orientation was shown primarily along (001) plane from XRD pattern. The crystal structure and the electric properties depended on the Oxygen amount, heating temperature and was the best at O2 = 8.1 seem, $750^{\circ}C$. In electric properties of Pt/SBN60/SBN30/Pt thin film capacitor prepared, the remnant polarization (2Pr) value was 13 ${\mu}C/cm^2$, the coercive field (Ec) 75 kV/cm, and the dielectric constant 1492, respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.05a
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• pp.9-9
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• 2009

Coated conductor is required to have good critical current property for high efficiency of electric power applications. Until now, long coated conductor does not show high Jc over 3 MA/$cm^2$ in thick superconducting layer because of texture degradation by thick superconducting layer. In this study, in order to overcome this issue, thicker superconducting layer was deposited with optimized conditions to reduce the degradation of critical current density. SmBCO superconducting coated conductor was deposited with 1~3 um of thickness at $750\sim850^{\circ}C$ under 15~20 mTorr of oxygen partial pressure using batch type EDDC( evaporation using drum in dual chamber). The buffered substrate for superconducting layer deposition was used IBAD-MgO template with the architecture of $LaMnO_3/MgO/Y_2O_3/Al_2O_3$/Hastelloy. After fabrication of coated conductor, critical current was measured by 4-prove method under self-magnetic field and 77K. In addition, surface morphology and texture were analyzed by SEM and XRD, respectively. 3 um thick SmBCO coated conductor shows highest $I_C$ values of 638A/cm-w in 1 m long in the world.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.25 no.1
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• pp.39-46
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• 2014

In this paper, to operate 2.4 GHz Inverted-L antenna with On-Board Broadband characteristics is proposed. The antenna was designed on the system board, the bandwidth by adjusting the reactance of the antenna that was formed common-mode and differential-mode on the antenna stubs has been improved. The system size is $80mm{\times}60mm$, the size of the antenna was limited to $30mm{\times}60mm$, the thickness of FR4 dielectric substrate is 0.8 mm, FR4 dielectric constant 4.4 is used. The experimental results, the bandwidth from 17.2 to 24.1 %, the gain is 3.01~4.71 dB, omni-directional radiation pattern characteristics were obtained. By a mobile terminal design applying the results of the paper, the handset's price competitiveness and production efficiency can be improved.