• The Transactions of the Korean Institute of Electrical Engineers P
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• v.64 no.4
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• pp.277-280
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• 2015

In this paper, we have studied the surface property and transmittance of n- and p-type thin film deposited on ITO substrate. In n-type samples, the average particle size was large and uniform as RF power was increased, and the best results were shown at the condition of the temperature of $300^{\circ}C$ and 200 W of RF power. The transmittance of the sample deposited for 20 minutes was 74.82% and the light wave was increased to 800 nm. In p-type samples, the results were 71.21% and 789 nm at the deposition condition of the RF power of 250 W and the temperature of $250^{\circ}C$.

• Journal of the Korean Graphic Arts Communication Society
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• v.21 no.1
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• pp.1-10
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• 2003

Printing ink is faced various shear stress situation until it transfer to the printed substrate through the press. And in each shear stress condition the ink is needed to keep the appropriate viscosity according to the condition. The change of printing ink viscosity has been explained by well-known through the viscosity profile curve. But actually, the quality of printed paper depends on the ink behavior after transfer the substrates. Like this, to look into the behaviour of the ink on the printed substrate, it is needed the experiment of the ink structure recovering by rheology study. In this study, by controling the $CaCO_3$ content in the ink, after investigating the effect of the ink's structure recovery of the pigment concentration, we intend to predict the printing quality of the ink behvior on the substrate depending on pigment content.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.52 no.9
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• pp.378-382
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• 2003

Transparent conductive oxides (TCO) are necessary as front electrode for most thin film solar cell. In our paper, transparent conducting aluminum-doped Zinc oxide films (ZnO:Al) were prepared by rf magnetron sputtering on glass (Corning 1737) substrate as a variation of the deposition condition. After deposition, the smooth ZnO:Al films were etched in diluted HCI (0.5%) to examine the electrical and surface morphology properties as a variation of the time. The most important deposition condition of surface-textured ZnO films by chemical etching is the processing pressure md the substrate temperature. In low pressures (0.9mTorr) and high substrate temperatures ($\leq$$300^{\circ}C$), the surface morphology of films exhibits a more dense and compact film structure with effective light-trapping to apply the silicon thin film solar cells.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07a
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• pp.391-394
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• 2002

Transparent conductive oxides (TCO) are necessary as front electrode for most thin film solar cell. In our paper, transparent conducting aluminum-doped Zinc oxide films (ZnO:Al) were prepared by rf magnetron sputtering on glass (Corning 1737) substrate as a variation of the deposition condition. After deposition, the smooth ZnO:Al films were etched in diluted HCl (0.5%) to examine the electrical and surface morphology Properties as a variation of the time. The most important deposition condition of surface-textured ZnO films by chemical etching is the processing pressure and the substrate temperature. In low pressures (0.9 mTorr) and high substrate temperatures ($\leq$30$0^{\circ}C$), the surface morphology of films exhibits a more dense and compact film structure with effective light-trapping to apply the silicon thin film solar cells.

• Proceedings of the Korea Institute of Applied Superconductivity and Cryogenics Conference
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• 2002.02a
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• pp.138-140
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• 2002

We fabricated textured Ni substrate for YBCO coated film and evaluated the degree of texture in terms of rolling condition and annealing time. The substrate was compacted from pure Ni powder and reduced the thickness to 100 $\mu$m by rolling followed by heat treatment. As decreasing the thickness of substrate, it was observed that the non-uniform deformation such as ‘wave edge’ or ‘wave buckle’ developed locally on it, causing reduced texture. On the other hand, uniformly deformed substrate showed better cube texture indicating the FWHM of in-plane and out-of-plane of about $11^{\circ}$ ~ $14^{\circ}$. In addition, annealing at $1000^{\circ}C$ for 1~ 8 hr did not make a remarkable difference on the texture.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.56 no.10
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• pp.1782-1785
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• 2007

In this paper, the effect of substrate temperature on structural, electrical and optical properties of aluminium-doped zinc oxide (AZO) films were investigated. AZO thin films were prepared on glass substrate by pulsed DC magnetron sputtering technique. The properties of AZO were measured by using XRD, AFM, UV spectrophotometer, and hall effect measurement system. The resistivity of AZO films was improved under the condition of high substrate temperature. The resistivity decreased from $9.95{\times}10^{-2}\;{\Omega}-cm\;to\;1.1{\times}10^{-3}\;{\Omega}-cm$ as a result of high substrate temperature and the average transmittances in visible range were above 80%.

• Proceedings of the KIEE Conference
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• 2015.07a
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• pp.1134-1135
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• 2015

In this paper, we reported fabrication of sealing the glass substrate using laser treatment at low temperature for electrochemical luminescence (ECL) cell. The laser treatment at temperature is using laser diode. The glass substrate sealing by laser treatment tested at 1-5 W, 1-5 mm/s for builted and tested. The sealing laser treatment method will allow associate coordination between the two glass substrate was enclosed. The effect of laser treatment to sealing the glass substrate was found to have cracks and air gap at best thickness of about $845-780{\mu}m$ for condition 5 W, 1-5 mm/s. The surface of sealing was roughness which was not influent to electrodes So, it is more effective viscosity between two glasses substrate.

• Transactions of the Korean Society of Automotive Engineers
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• v.10 no.2
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• pp.40-47
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• 2002

Because UV wavelength lights can activate photocatalysts, plasma is used as a light source of a photocatalytic reactor. Even though plasma has good intensity for photo reaction, substrate of catalyst coating was limited by the geometry of plasma generator. Usually bead type substrate was used for a pack bed type reactor. Honeycomb monolith type substrate was used with UV lamps instead plasma, due to the light penetration the honeycomb monolith length was too short to show good activity In this study a photocatalytic reactor, which is using a honeycomb monolith substrate, was investigated with plasma as an activation light source. As a parametric study the effects of 1311owing factors on plasma generation and power consumption are examined; supply voltage, substrate length, environment condition, catalyst loading and ratio. Using the test results, the practicability test was done with simulated synthetic gases representing bad smells and automotive exhaust gases.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.29 no.12
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• pp.28-32
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• 2015

In this work, we reported fabrication of sealing the glass substrate using laser treatment at low temperature for electrochemical luminescence (ECL) cell. The laser treatment at temperature is using laser diode. The glass substrate sealing by laser treatment tested at 3-10W, 2-5 mm/s for build and tested. The sealing laser treatment method will allow associate coordination between the two glass substrate was enclosed. The effect of laser treatment to sealing the glass substrate was found to have cracks and air gap at best thickness of about 550-600 im for condition 3 W, 3 mm/s. The surface of sealing was roughness which was not influent to electrodes It can reduce the cracks, crevices and air gaps as well, improves the performance viscosity in butter bus bar electrodes. Therefore, it is more effective viscosity between two FTO glasses substrate.

• Journal of the Semiconductor & Display Technology
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• v.5 no.2 s.15
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• pp.33-36
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• 2006

Many issues arose to use the Pb-free solder as adhesive materials in MEMS ICs and packaging. Then this study for easy and simple sealing method using adhesive materials was carried out to maintain hermetic characteristic in MEMS Package. In this study, Hermetic characteristic using negative PR (XP SU-8 3050 NO-2) as adhesive at the interface of Si test coupon/glass substrate and Si test coupon/LTCC substrate was examined. For experiment, the dispenser pressure was 4 MPa and the $200\;{\mu}m{\Phi}$ syringe nozzle was used. 3.0 mm/sec as speed of dispensing and 0.13 mm as the gap between Si test coupon and nozzle was selected to machine condition. 1 min at $65^{\circ}C$ and 15 min at $95^{\circ}C$ as Soft bake, $200\;mj/cm^2$ expose in 365 nm wavelength as UV expose, 1 min at $65^{\circ}C$ and 6 min at $95^{\circ}C$ as Post expose bake, 60 min at $150^{\circ}C$ as hard bake were selected to activation condition of negative PR. Hermetic sealing was achieved at the Si test coupon/ glass substrate and Si test coupon/LTCC substrate. The leak rate of Si test coupon/glass substrate was $5.9{\times}10^{-8}mbar-l/sec$, and there was no effect by adhesive method. The leak rate of Si test coupon/LTCC substrate was $4.9{\times}10^{-8}mbar-l/sec$, and there was no effect by dispensing cycle. Better leak rate value could be achieved to use modified substrate which prevent PR flow, to increase UV expose energy and to use system that controls gap automatically with vision.