• Title/Summary/Keyword: substrate condition

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Sputtering법에 의한 $BaTiO_3$ 박막의 상형성에 관한 연구 (Phase Formation of $BaTiO_3$ Thin Films by Sputtering)

  • 안재민;최덕균;김영호
    • 한국세라믹학회지
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    • 제30권8호
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    • pp.657-663
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    • 1993
  • BaTiO3 sputtering targets of 3 inch diameter were prepared by sintering the CIP (Cold Isotatic Pressing) compacts at 136$0^{\circ}C$ for 3hrs. The apparent density and grain size were 97% and 30${\mu}{\textrm}{m}$, respectively. After BaTiO3 films were deposited on Si and Pt/Ti/SiO2/Si substrates using these targets, films were annealed at various conditions and the crystallization behavior, reaction with the substrate and the electrical properties were investigated. The films on both substrates required 5~20hrs furnace annealing for crystallization at the temperatures from $600^{\circ}C$ to 80$0^{\circ}C$. For the films on Si substrate, interaction between the film and the substrate was suppressed upt o $700^{\circ}C$ for 10 hrs and the relative dielectric constant was 30. As the annelaing temperature and time were increased, the relative dielectric constants of the films decreased due to the formation of silicate phases through the reaction with the substrate. For the BaTiO3 films on Pt/Ti/SiO2/Si substrate, the reaction with the substrate was further reduced when the annealing condition was identical to that for Si substrate, but the reaction between the layers in Pt electrode took place above $700^{\circ}C$. When the films were annealed at $600^{\circ}C$ where the stability of Pt electrode was sustained, relative dielectric constant was increased to 110 since the reaction with substrate was effectively reduced even for a longer annealing time and the crystallization was enhanced.

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정수압을 이용한 미세 패턴 전사 신공정 개발 (Development of New Micro Pattern Fabrication Process by U sing Isostatic Pressing)

  • 설재완;주병윤;임성한
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2009년도 추계학술대회 논문집
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    • pp.267-270
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    • 2009
  • In the present investigation, we are newly developing a new forming process which can fabricate micro patterns on large-area polymeric substrates for high speed mass production. The key idea of the new process is to pressurize multiple vacuum-packed substrate-mold stacks above the glass transition temperature ($T_g$) of the polymeric substrates. The new process is thought to be promising micro-pattern fabrication technique in three aspects; firstly, isostatic pressing ensures the uniform micro-pattern replicating condition regardless of the substrate area. Secondly, the control of forming condition such as temperature and pressure can realize well-defined process condition exploited in the conventional hot embossing research field. Thirdly, multiple substrates can be patterned at the same time. A prototype forming machine for the new process was developed with the design consideration realizing the present idea. With a developed machine, micro prismatic array patterns with 50 um in size were successfully made on the $380{\times}300{\times}6\;mm$ PMMA plate.

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Reflectivity Control at Substrate / Photoresist Interface by Inorganic Bottom Anti-Reflection Coating for Nanometer-scaled Devices

  • Kim, Sang-Yong;Kim, Yong-Sik
    • Transactions on Electrical and Electronic Materials
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    • 제15권3호
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    • pp.159-163
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    • 2014
  • More accurate CD (Critical Dimension) control is required for the nanometer-scaled devices. However, since the reflectivity between substrate and PR (Photoresist) becomes higher, the CD (Critical Dimension) swing curve was intensified. The higher reflectivity also causes PR notching due to the pattern of sub-layer. For this device requirement, it was optimized for the thickness, refractive index(n) and absorption coefficient(k) in the bottom anti-reflective coating(BARC; SiON) and photoresist with the minimum reflectivity. The computational simulated conditions, which were determined with the thickness of 33 nm, n of 1.89 and k of 0.369 as the optimum condition, were successfully applied to the experiments with no standing wave for the 0.13um-device. At this condition, the lowest reflectivity was 0.44%. This optimum condition for BARC SiON film was applied to the process for 0.13um-device. The optimum SiON film as BARC to PR and sub-layer could be formed with the accurate CD control and no standing waver for the nanometer-scaled semiconductor manufacturing process.

MOCVD법에 의한 YBCO coated conductor용 YSZ 완충층 제작 (Fabrication of YSZ buffer layer for YBCO coated conductor by MOCVD method)

  • 선종원;김형섭;정충환;전병혁;김찬중
    • 한국초전도저온공학회:학술대회논문집
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    • 한국초전도저온공학회 2003년도 학술대회 논문집
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    • pp.129-132
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    • 2003
  • Yttria stabilized zirconia (YSZ) buffer layers were deposited by a metal organic chemical vapor deposition (MOCVD) technique using single liquid source for the application of YBa$_2$Cu$_3$$O_{7-x}$ (YBCO) coated conductor. Y:Zr mole ratio was 0.2:0.8, and tetrahydrofuran (THF) was used as a solvent. The (100) single crystal MgO substrate was used for searching deposition condition. Bi-axially oriented CeO$_2$ and NiO films were fabricated on {100}〈001〉 Ni substrate by the same method and used as templates. At a constant working pressure of 10 Torr, the deposition temperatures (660~80$0^{\circ}C$) and oxygen flow rates (100~500 sccm) were changed to find the optimum deposition condition. The best (100) oriented YSZ film on MgO was obtained at 74$0^{\circ}C$ and $O_2$ flow rate of 300 sccm. For YSZ buffer layer with this deposition condition on CeO$_2$/Ni template, full width half maximum (FWHM) values of the in-plane and out-of-plane alignments were 10.6$^{\circ}$ and 9.8$^{\circ}$, respectively. The SEM image of YSZ film on CeO$_2$/Ni showed surface morphologies without microcrack.k.

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미소 인장시험을 통한 다이아몬드상 카본 박막의 안정성 및 접합력 평가 (Stability and Adhesion of Diamond-like Carbon Film under Micro-tensile Test Condition)

  • 최헌웅;이광렬;;오규환
    • 한국진공학회지
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    • 제13권4호
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    • pp.175-181
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    • 2004
  • 미소인장시험을 통해 304 스테인리스 스틸 판재 위에 증착된 DLC 박막의 안정성을 평가하였다. 모재의 소성 변형과 함께 코팅 층의 손상이 발생하기 시작하는데, 작은 규모의 모재 변형 시에는 인장축의 수직방향으로 박막의 균열이 발생하지만, 모재의 슬립변형이 발생하기 시작하면 인장 축과 $45^{\circ}C$의 각도를 갖는 슬립 면을 따라 필름의 박리가 발생하였다. DLC박막의 박리면적으로부터 필름의 접착력을 평가할 수 있었으며, 필름의 합성 전에 실시하는 Ar 플라즈마 스퍼터링 세척시간이 길수록 그리고 세척시 기판에 인가되는 전압이 높을수록 필름의 접착력은 향상되었다. 이러한 변화는 스테인리스 스틸 모재와 Si 접합 층간의 계면특성이 향상되면, 필름의 전체 접착력을 증진시킬 수 있음을 보여주고 있다.

산화철-탄소나노튜브 나노복합체의 암모니아 가스센서 응용 (Iron Oxide-Carbon Nanotube Composite for NH3 Detection)

  • 이현동;김다혜;고다애;김도진;김효진
    • 한국재료학회지
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    • 제26권4호
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    • pp.187-193
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    • 2016
  • Fabrication of iron oxide/carbon nanotube composite structures for detection of ammonia gas at room temperature is reported. The iron oxide/carbon nanotube composite structures are fabricated by in situ co-arc-discharge method using a graphite source with varying numbers of iron wires inserted. The composite structures reveal higher response signals at room temperature than at high temperatures. As the number of iron wires inserted increased, the volume of carbon nanotubes and iron nanoparticles produced increased. The oxidation condition of the composite structures varied the carbon nanotube/iron oxide ratio in the structure and, consequently, the resistance of the structures and, finally, the ammonia gas sensing performance. The highest sensor performance was realized with $500^{\circ}C/2h$ oxidation heat-treatment condition, in which most of the carbon nanotubes were removed from the composite and iron oxide played the main role of ammonia sensing. The response signal level was 62% at room temperature. We also found that UV irradiation enhances the sensing response with reduced recovery time.

유리기판에 sol-gel법으로 제조된 나노입자 Co-ferrite 박막의 특성 (Nanoparticulate Co-Ferrite Thin Films on Glass Substrate Prepared by Sol-Gel Method)

  • 오영제;최현석;최세영
    • 한국세라믹학회지
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    • 제37권5호
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    • pp.425-431
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    • 2000
  • Cobalt ferrite thin films on Corming glass substrate were fabricated by a sol-gel method. Cobalt ferrite thin films with the grain size of 20-35 nm and thickness of 50nm were obtained. Rapid thermal annealing (RTA) and Annealing processes were adopted for comparison of characteristics of the films. Coercivity values were changed with thermal condition and magnetization values were increased as a function of soaking time. With prolonged soaking time, however, it was decreased because of the diffusion of cations from the glass substrate. The RTA process in preparation of cobalt ferrite thin film was the effective way to prevent and to form a single spinel phase in reduced soaking time. The film heated at 600$^{\circ}C$ for 30 minutes by RTA had coercivity of 2,600 Oe, saturation magnetization 460 emu/㎤, and Mr$.$$\delta$ of 1.43 memu/$\textrm{cm}^2$.

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노즐 형상과 기판의 위치 변화가 초음속 유동에 미치는 영향에 관한 수치해석 연구 (Numerical study on the effects of nozzle geometry and substrate location in the supersonic flow)

  • 박정재;윤석구;김호영
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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    • pp.58.2-58.2
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    • 2010
  • This paper deals with the simulation of solid particle coating technology via supersonic nozzle in vacuum environment to devote as an aerosol-deposition device. In order to improve efficiencies of nozzle and coating process, effects of shockwave, nozzle geometry, and substrate location were studied computationally under a fixed chamber pressure of 0.01316 bar which is nearly vacuous. Shockwave is the important factor affect to entire flow because shockwave in the jet flow dissipates the kinetic energy of the flow in the supersonic condition. Results show that various nozzle geometries have significant effect on the supersonic flow and we know that the supersonic nozzle should be optimized to minimize the loss of the flow. Another parameter, the distance between substrate and nozzle tip, shows little effect in this study.

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Arc Sprayed부의 Erosion 특성평가 (An evaluation of arc sprayed layer on the erosion property)

  • 배강열;김희진
    • Journal of Welding and Joining
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    • 제5권2호
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    • pp.27-34
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    • 1987
  • The characteristics of arc sprayed layer were studied with hardness test and microstructural observation. The erosion resistance of arc sprayed layer was also evaluated using a method of steel ball blasting test which was proposed in this study as a test method for measuring the erosion properties in the impact wear condition. By an impact of the molten droplets on the redeposited substrate, lamella structure was formed which contains laminated oxide layers, fissures, and porosities. As a result of mechanical tests, it was shown that the sprayed specimen showed higher hardness than the substrate, but it resulted in higher erosion rate than the substrate. The poor erosion property obtained with a sprayed coating was considered to be attributable to easy flaking off the the layers laminated with brittle oxide layers.

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RF 스퍼터링 법에 의한 사파이어 기판상의 ZnO 박막의 성장 (ZnO film growth on sapphire substrate by RF magnetron sputtering)

  • 강승민
    • 한국결정성장학회지
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    • 제14권5호
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    • pp.215-219
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    • 2004
  • ZnO 에피박막을 사파이어 기판의 (0001)면 상에 RF magnetron sputtering 법으로 성장하였다. 박막의 성장속도는 약 0.1~0.2$\mu\textrm{m}$/hr 였으며, 기판온도가 $600^{\circ}C$일 때, 약 400~500nm두께의 단결정상의 박막을 성장할 수 있었다. 성장된 단결정상 박막에 대하여 XRD분석과 TEM을 이용하여 박막의 품질과 미세구조를 평가하였다.