• 한국의류산업학회지
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• 제3권4호
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• pp.344-350
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• 2001

Wool fabrics were treated with dichloro isocyanuric acid (DCCA) and dyed with acid dyes (C.I. Acid Red 18), and then, they were treated by sputter etching. Wool fabrics had been sputtered with aluminium under various conditions such as sputter etching time and discharge power in the presence of argon gas. We compared mechanical properties, colour difference and fastness properties of these samples one another: Mechanical properties and colour difference of sputtered wool fabrics changed by sputter etching time, discharge power and DCCA concentration. Light fastness showed a rising tendency but rubbing fastness showed a downward tendency when sputter etching time was 7 minutes.

• 한국염색가공학회지
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• 제6권3호
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• pp.44-51
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• 1994

Wool and silk fabrics dyed with C.l. Acid Black 155 were subjected to sputter etching and exposed to a low temperature argon plasma. Color depth of shade of the fabrics increased considerably, but sputter etching was more effectively than argon low temperature plasma treatment. And measured for any significant chemical modification by ESCA (XPS). Sputter etching and argon low temperature plasma treatments incorporated oxygen atoms into the surface.

• 한국염색가공학회지
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• 제8권2호
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• pp.56-63
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• 1996

Low-temperature plasma treatment or sputter etching is of interest as one of the techniques to modify polymer surface. In this study, poly(ethylene terephthalate)(PET), nylon 6 and cotton fabrics dyed three black dyes were subjected to low-temperature argon plasma and also sputter etching. In relation to bathochromic effect, the surface characteristics of the treated fabrics and films were investigated by means of critical surface tension, SEM and ESCA measurement. The depth of shade of fabrics more increased by the sputter etching technique than argon plasma treatment. Many microcraters on the fiber surface formed by the sputter etching resulted in increase of surface area of the fiber and wettability, but the hydrophobic group was increased by the results of ESCA analysis. In particular the change in reflective index of the fibers was much more effective than the chemical composition of the fiber surface on increasing of the depth of shade.

• 한국염색가공학회지
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• 제9권1호
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• pp.15-22
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• 1997

The alkali treated and black dyed PET fabrics were sputter etched under Ar gas atmosphere. The color depth of PET fabrics were increased with sputter etching time only under some limits of discharge power. And above that limits of discharge power the color depth of PET fabrics was decreased by increasing discharge power and treatment time. Minute cracks were made by sputter etching in the whole surface of fabrics to the direction of perpendicular to the longitudinal side of yarns. The fineness and density of minute crack were increased with lowering discharge power. And the size of crack was far smaller than that of microcrater which was obtained by alkali treatment. It is considered that the increase of color depth is related to the minute crack. The water permeation time of sputter etched fabrics was increased with increasing discharge power and treating time. The increase of color depth attained by sputter etching was fully kept through repeated laundering.

• 한국염색가공학회지
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• 제9권6호
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• pp.10-17
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• 1997

In order to improve the anti-static property of several hydrophobic fibers by sputter etching, polyester, polypropylene and poly(p-phenylene sulfide) have been etched by sputtering in the presence of argon gas and the resulting anti-static property investigated by half time decay, the time of water permeation, weight loss rate and scanning electron microscope(SEM). The temporary change and durability of anti-static property of samples treated with sputter etching were evaluated. The results were as follows; 1) Half time decay of samples treated with sputter etching were decreased about 18~38%. According to increasing sputter etching time, half time decay is decreased. 2) The wettability and weight loss rate of treated samples were increased remarkably. According to the SEM photographs, many microcraters on the substrate surface by the sputter etching were observed. 3) Although the washing treatment and the time elapsed after treatment are allowed longer, the variation of half time decay hardly can find.

• 한국염색가공학회지
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• 제9권2호
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• pp.50-56
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• 1997

Poly(ethylene terephthalate) (PET) has been etched by sputtering in the presence of argon gas and the resulting surface modifications investigated via weight loss, time of water permeation, half value period, scanning electron microscope(SEM) and color difference measurements. According to increasing sputter etching time, weight loss increased, the time of water permeation and half value period of the sputter etched PET fabrics decreased. Color depth of fabrics increased by increasing sputter etching time. We investigated the fabric surface modification by SEM. Many microcraters on the fabric surface formed by the sputter etching resulted in increase of surface area of the fabric and wettability.

• 한국재료학회:학술대회논문집
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• 한국재료학회 1996년도 재료학회 추계학술발표회
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• pp.129-131
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• 1996

• 한국염색가공학회지
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• 제3권2호
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• pp.25-33
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• 1991

Poly(ethylene terephthalate)(PET) and nylon 6 films stretched uniaxially and biaxially were sputter etched in the presence of argon gas. The surface of the etched films was investigated using a scanning electron microscope(SEM). While cracks perpendicular to the stretched direction were observed in the uniaxil stretched films sputter etched for 30 min., many protrusions were formed in the biaxial stretched films at the height of 0.3-0.4 gm for PET and $0.1-0.2\mum$ for nylon 6. The tops of two or three protrusions merged etching time increased to 60 min. The contact angle to water of the sputter etched PET and nylon 6 films decreased steeply when etched for one to 3 min. In order to investigate chemical changes on the surface ESCA analysis was carried out. In both films sputter etched $C_{1s}$ intensity decreased and $O_{1s}$ intensity increased compared with the unetched ones.

• 대한치과보철학회:학술대회논문집
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• 대한치과보철학회 1996년도 추계학술대회
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• pp.59-59
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• 1996

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.145.1-145.1
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• 2014

변형된 end-Hall type의 이온 소스를 사용하여 이온 소스의 형태에 따라 달라지는 이온 빔의 변화를 측정하였다. 이온 소스 cathode의 wehnelt mask를 세 가지 종류로 제작하였으며, 생성된 이온 빔을 이용하여 Al이 sputter 방식으로 증착된 유리 기판을 etching 하였다. 실험 결과 wehnelt mask의 모양에 따라 focus, broad, strate의 형태로 이온 빔이 생성되는 것을 확인하였다. Al이 증착된 유리 기판의 제작을 위하여 Al target을 사용하여 RF power로 150 W, 2분간 sputtering을 하였고, 이온 소스와 기판사이의 거리를 1 cm씩 증가시켜가며 이온 빔을 2,500 V로 3분간 유리 기판을 etching한 후, 유리 기판이 etching된 모양을 통해 이온 빔의 형태를 분석하였다. 본 연구를 위하여 sputtering과 이온 빔 처리가 가능한 챔버를 제작하였으며, scroll pump와 turbo molecular pump를 사용하였다. Base pressure $1.5{\times}10^{-6}Torr$에서 실험이 진행되었고, 불활성 기체 Ar을 사용하였다. Ar 기체를 주입시 pressure는 $2.6{\times}10^{-3}Torr$였다.