• Title/Summary/Keyword: solution-deposition

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A Study on Reusing of Electroless Ni-Cu-P Waste Solution (無電解 Ni-Cu-P 廢 도금액의 재사용에 관한 연구)

  • 오이식
    • Resources Recycling
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    • v.10 no.2
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    • pp.27-33
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    • 2001
  • Reusing of electroless Ni-Cu-P waste solution was investigated in the plating time, plating rate, solution composion and deposit. Plating time of nickel-catalytic surface took longer than that of zincated-catalytic surface. Initial solution with 50f) waste solution additive at batch type was possible to reusing of waste solution. Plating time of initial solution at continuous type took longer 10 times over than that of batch type. Plating time of 50% waste solution additive at continuous type took longer 3.7 times over than that of batch type. Component change of nickel-copper for electroless deposition was greatly affected by depolited inferiority and larger decreased plating rate.

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A Study on Reusing of Electroless Ni-Cu-B Waste Solution (무전해 Ni-Cu-B 폐 도금액의 재사용에 관한 연구)

  • Oh Iee-Sik;Bai Young-Han
    • Resources Recycling
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    • v.12 no.1
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    • pp.18-24
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    • 2003
  • Reusing of electroless Ni-Cu-B waste solution was investigated in the plating time, plating rate, solution composition and deposit. Plating time of nickel-catalytic surface took longer than that of zincated-catalytic surface. Initial solution with 40% waste solution additive at batch type was possible to reusing of waste solution. Plating time of initial solution at continuous type took longer 6 times over than that of batch type. Plating time of 40% waste solution additive at continuous type took longer 2 times over than that of batch type. Component change of nickel-copper for electroless deposition was greatly affected by deposited inferiority and larger decreased plating rate.

Two-dimensional Analytic Solution of the Magnetic Field for the Ferrites of DC Magnetron Sputtering Device (DC 마그네트론 스퍼터링 장치의 영구자석에 의한 자기장의 2차원 해석적 해)

  • Yu Dong-Hun;Kwon Deuk-Chul;Lee Jong-Kyu;Yoon Nam-Sik;Kim Jung-Hyung;Shin Yong-Hyeon
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.54 no.7
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    • pp.326-331
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    • 2005
  • We obtain analytical expressions the magnetic field of ferrites for DC magnetron sputtering device, which has been widely used for vacuum thin film deposition, and suggested the equation on maximum radius of the magnetic field by analytic solution. Also, the analytic results are compared with some calculations using magnetization elements of right-angled hexahedron.

Synthesis of a new class of carbon nanomaterials by solution plasma processing for use as air cathodes in Li-Air batteries

  • Kang, Jun
    • Journal of Advanced Marine Engineering and Technology
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    • v.39 no.8
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    • pp.833-837
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    • 2015
  • Li-air batteries have a promising future for because of their high energy density, which could theoretically be equal to that of gasoline. However, substantial Li-air cell performance limitations exist, which are related to the air cathode. The cell discharge products are deposited on the surfaces of the porous carbon materials in the air electrode, which blocks oxygen from diffusing to the reaction sites. Hence, the real capacity of a Li-air battery is determined by the carbon air electrode, especially by the pore volume available for the deposition of the discharged products. In this study, a simple and fast method is reported for the large-scale synthesis of carbon nanoballs (CNBs) consisting of a highly mesoporous structure for Li-air battery cathodes. The CNBs were synthesized by the solution plasma process from benzene solution, without the need for a graphite electrode for carbon growth. The CNBs so formed were then annealed to improve their electrical conductivity. Structural characterization revealed that the CNBs exhibited both an pore structure and high conductivity.

Created cavity expansion solution in anisotropic and drained condition based on Cam-Clay model

  • Li, Chao;Zoua, Jin-Feng
    • Geomechanics and Engineering
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    • v.19 no.2
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    • pp.141-151
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    • 2019
  • A novel theoretical solution is presented for created (zero initial radius) cavity expansion problem based on CamClay model and considers the effect of initial anisotropic in-situ stress and drained conditions. Here the strain of this theoretical solution is small deformation in elastic region and large deformation in plastic region. The works for cylindrical and spherical cavities expanding in drained condition from zero initial radius are investigated. Most of the conventional solutions were based on the isotropic and undrained condition, however, the initial stress state of natural soil mass is anisotropy by soil deposition history, and drained cavity expansion calculation is closer to actual engineering in permeable soil mass. Finally, the parametric study is presented in order to the engineering significance of this work.

Fabrication of wrap-around gate nanostructures from electrochemical deposition (전기화학적 도금을 이용한 wrap-around 게이트 나노구조의 제작)

  • Ahn, Jae-Hyun;Hong, Su-Heon;Kang, Myung-Gil;Hwang, Sung-Woo
    • Journal of IKEEE
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    • v.13 no.2
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    • pp.126-131
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    • 2009
  • To overcome short channel effects, wrap-around field effect transistors have drawn a great deal of attention for their superior electrostatic coupling between the channel and the surrounding gate electrode. In this paper, we introduce a bottom-up technique to fabricate a wrap-around field effect transistor using silicon nanowires as the conduction channel. Device fabrication was consisted mainly of electron-beam lithography, dielectrophoresis to accurately align the nanowires, and the formation of gate electrode using electrochemical deposition. The electrolyte for electrochemical deposition was made up of non-toxic organic-based solution and liquid nitrogen was used as a method of maintaining the shape of polymethyl methacrylate(PMMA) during the process of electrochemical deposition. Patterned PMMA can be used as a nano-template to produce wrap-around gate nano-structures.

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Synthesis and Characterization of SnO2 Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition Using SnCl4 Precursor and Oxygen Plasma

  • Lee, Dong-Gwon;Kim, Da-Yeong;Gwon, Se-Hun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.254-254
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    • 2016
  • Tin dioxide (SnO2) thin film is one of the most important n-type semiconducting materials having a high transparency and chemical stability. Due to their favorable properties, it has been widely used as a base materials in the transparent conducting substrates, gas sensors, and other various electronic applications. Up to now, SnO2 thin film has been extensively studied by a various deposition techniques such as RF magnetron sputtering, sol-gel process, a solution process, pulsed laser deposition (PLD), chemical vapor deposition (CVD), and atomic layer deposition (ALD) [1-6]. Among them, ALD or plasma-enhanced ALD (PEALD) has recently been focused in diverse applications due to its inherent capability for nanotechnologies. SnO2 thin films can be prepared by ALD or PEALD using halide precursors or using various metal-organic (MO) precursors. In the literature, there are many reports on the ALD and PEALD processes for depositing SnO2 thin films using MO precursors [7-8]. However, only ALD-SnO2 processes has been reported for halide precursors and PEALD-SnO2 process has not been reported yet. Herein, therefore, we report the first PEALD process of SnO2 thin films using SnCl4 and oxygen plasma. In this work, the growth kinetics of PEALD-SnO2 as well as their physical and chemical properties were systemically investigated. Moreover, some promising applications of this process will be shown at the end of presentation.

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Improvement of Deposition Performance of Ultrasonic Spray Pyrolysis Deposition System through Atomizer Shape Modification (분무장치 형상 변경을 통한 초음파 열분해 증착 시스템의 증착 성능 개선)

  • Kim, Kyu-Eon;Lee, Jae-Hoo;Jeon, Jae-Keon;Park, Sung-Hwan;Lee, Chibum
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.24 no.4
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    • pp.469-474
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    • 2015
  • In ultrasonic spray pyrolysis deposition, a precursor solution is evaporated by an ultrasonic atomizer, then gas-carried into a furnace where the solute is separated from the water vapor. After condensation, polymerization, and nucleation, the solute oxide forms a thin film. To improve the deposition efficiency, the ultrasonic atomizer was studied to optimize the evaporated gas flow. The vat cover was redesigned, using three versions with different inlet factors being tested through a computational fluid dynamic analysis as well as a water evaporation experiment. The atomization rate with a hemispherical cover with a $30^{\circ}$ inlet was found to be 2.4 times higher than that with the original. This improvement was verified with fluorine-doped tin oxide spray pyrolysis deposition. The film obtained with the modified vat cover was 2.4 times thicker than that obtained with the original vat cover.

In-situ magnetization measurements and ex-situ morphological analysis of electrodeposited cobalt onto chemical vapor deposition graphene/SiO2/Si

  • Franco, Vinicius C. De;Castro, Gustavo M.B.;Corredor, Jeaneth;Mendes, Daniel;Schmidt, Joao E.
    • Carbon letters
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    • v.21
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    • pp.16-22
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    • 2017
  • Cobalt was electrodeposited onto chemical vapor deposition (CVD) graphene/Si/$SiO_2$ substrates, during different time intervals, using an electrolyte solution containing a low concentration of cobalt sulfate. The intention was to investigate the details of the deposition process (and the dissolution process) and the resulting magnetic properties of the Co deposits on graphene. During and after electrodeposition, in-situ magnetic measurements were performed using an (AGFM). These were followed by ex situ morphological analysis of the samples with ${\Delta}t_{DEP}$ 30 and 100 s by atomic force microscopy in the non-contact mode on pristine CVD graphene/$SiO_2$/Si. We demonstrate that it is possible to electrodeposit Co onto graphene, and that in-situ magnetic measurements can also help in understanding details of the deposition process itself. The results show that the Co deposits are ferromagnetic with decreasing coercivity ($H_C$) and demonstrate increasing magnetization on saturation ($M_{SAT}$) and electric signal proportional to remanence ($M_r$), as a function of the amount of the electrodeposited Co. It was also found that, after the end of the dissolution process, a certain amount of cobalt remains on the graphene in oxide form (this was confirmed by X-ray photoelectron spectroscopy), as suggested by the magnetic measurements. This oxide tends to exhibit a limited asymptotic amount when cycling through the deposition/dissolution process for increasing deposition times, possibly indicating that the oxidation process is similar to the graphene surface chemistry.