Suppression of Macrostep Formation Using Damage Relaxation Process in Implanted SiC Wafer (SiC 웨이퍼의 이온 주입 손상 회복을 통한 Macrostep 형성 억제)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2002.07a
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- pp.346-349
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- 2002