• Title/Summary/Keyword: silicon defects

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Heteroepitaxial Growth of Single 3C-SiC Thin Films on Si (100) Substrates Using a Single-Source Precursor of Hexamethyldisilane by APCVD

  • Chung, Gwiy-Sang;Kim, Kang-San
    • Bulletin of the Korean Chemical Society
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    • v.28 no.4
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    • pp.533-537
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    • 2007
  • This paper describes the heteroepitaxial growth of single-crystalline 3C-SiC (cubic silicon carbide) thin films on Si (100) wafers by atmospheric pressure chemical vapor deposition (APCVD) at 1350 oC for micro/nanoelectromechanical system (M/NEMS) applications, in which hexamethyldisilane (HMDS, Si2(CH3)6) was used as a safe organosilane single-source precursor. The HMDS flow rate was 0.5 sccm and the H2 carrier gas flow rate was 2.5 slm. The HMDS flow rate was important in obtaing a mirror-like crystalline surface. The growth rate of the 3C-SiC film in this work was 4.3 μm/h. A 3C-SiC epitaxial film grown on the Si (100) substrate was characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM), reflection high energy electron diffraction (RHEED), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and Raman scattering, respectively. These results show that the main chemical components of the grown film were single-crystalline 3C-SiC layers. The 3C-SiC film had a very good crystal quality without twins, defects or dislocations, and a very low residual stress.

Thermal and Chemical Quenching Phenomena in a Microscale Combustor (I) -Fabrication of SiOx(≤2) Plates Using ion Implantation and Their Structural, Compositional Analysis- (마이크로 연소기에서 발생하는 열 소염과 화학 소염 현상 (I) -이온 주입법을 이용한 SiOx(≤2) 플레이트 제작과 구조 화학적 분석-)

  • Kim Kyu-Tae;Lee Dae-Hoon;Kwon Se-Jin
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.30 no.5 s.248
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    • pp.397-404
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    • 2006
  • Effects of surface defect distribution on flame instability during flame-surface interaction are experimentally investigated. To examine chemical quenching phenomenon which is caused by radical adsorption and recombination processes on the surface, thermally grown silicon oxide plates with well-defined defect density were prepared. ion implantation technique was used to control the number of defects, i.e. oxygen vacancies. In an attempt to preferentially remove oxygen atoms from silicon dioxide surface, argon ions with low energy level from 3keV to 5keV were irradiated at the incident angle of $60^{\circ}$. Compositional and structural modification of $SiO_2$ induced by low-energy $Ar^+$ ion irradiation has been characterized by Atomic Force Microscopy (AFM) and X-ray Photoelectron Spectroscopy (XPS). It has been found that as the ion energy is increased, the number of structural defect is also increased and non-stoichiometric condition of $SiO_x({\le}2)$ is enhanced.

Comparative Study on Current-Voltage Characteristics and Efficiencies of Ion-Implanted and Dopant-Diffused Silicon Solar Cells

  • Lee, Hee-Yong;Kim, Jin-Kon;Park, Yoon-Hee
    • Nuclear Engineering and Technology
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    • v.7 no.2
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    • pp.95-106
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    • 1975
  • A comparative study has been carried out on three silicon solar cell samples through their current-voltage (I-V) characteristics and their efficiencies. One sample is an ion-implanted cell made by our laboratory, and the other two samples are the dopant-diffused cells made by a foreign maker. The experiments have shown that both the properties of junction formation and the efficiency of each sample depend highly on the I-V characteristic of each p-n junction. The cause of incomplete properties in the ion-implanted sample has been clarified through this comparative study to be due to the various reasons such as slightly deficient surface impurity concentrations, defects induced by both the radiation and the foreign impurities, and insufficient ohmic contacts at the electrodes. The conversion efficiency of the ion-implanted sample can be figured out to be 4.2% whereas those of the other samples to be 14.3% and 8.3%, respectively.

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Analysis of Correlation Between Silicon Solar Cell Fabrication Steps and Possible Degradation (실리콘 태양전지 제조공정과 열화의 상관관계 분석)

  • Yewon Cha;Suresh Kumar Dhungel;Junsin Yi
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.36 no.1
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    • pp.16-22
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    • 2023
  • In a solar cell, degradation refers to the decrease in performance parameters caused by defects originated due to various causes. During the fabrication process of solar cells, degradation is generally related to the processes such as passivation or firing. There exist sources of many types of degradation; however, the exact cause of Light and elevated Temperature Induced Degradation (LeTID) is yet to be determined. It is reported that the degradation and the regeneration occur due to the recombination of hydrogen and an arbitrary substance. In this paper, we report the deposition of Al2O3 and SiNX on silicon wafers used in the Passivated Emitter and Rear Contact (PERC) solar structure and its degradation pattern. A higher degradation rate was observed in the sample with single layer of Al2O3 only, which indicates that the degradation is affected by the presence or the absence of a passivation thin film. In order to alleviate the degradation, optimization of different steps should be carried out in consideration of degradation in the solar cell fabrication process.

Development of a multi-modal imaging system for single-gamma and fluorescence fusion images

  • Young Been Han;Seong Jong Hong;Ho-Young Lee;Seong Hyun Song
    • Nuclear Engineering and Technology
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    • v.55 no.10
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    • pp.3844-3853
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    • 2023
  • Although radiation and chemotherapy methods for cancer therapy have advanced significantly, surgical resection is still recommended for most cancers. Therefore, intraoperative imaging studies have emerged as a surgical tool for identifying tumor margins. Intraoperative imaging has been examined using conventional imaging devices, such as optical near-infrared probes, gamma probes, and ultrasound devices. However, each modality has its limitations, such as depth penetration and spatial resolution. To overcome these limitations, hybrid imaging modalities and tracer studies are being developed. In a previous study, a multi-modal laparoscope with silicon photo-multiplier (SiPM)-based gamma detection acquired a 1 s interval gamma image. However, improvements in the near-infrared fluorophore (NIRF) signal intensity and gamma image central defects are needed to further evaluate the usefulness of multi-modal systems. In this study, an attempt was made to change the NIRF image acquisition method and the SiPM-based gamma detector to improve the source detection ability and reduce the image acquisition time. The performance of the multi-modal system using a complementary metal oxide semiconductor and modified SiPM gamma detector was evaluated in a phantom test. In future studies, a multi-modal system will be further optimized for pilot preclinical studies.

IEEE 1500 Wrapper Design Technique for Pre/Post Bond Testing of TSV based 3D IC (TSV 기반 3D IC Pre/Post Bond 테스트를 위한 IEEE 1500 래퍼 설계기술)

  • Oh, Jungsub;Jung, Jihun;Park, Sungju
    • Journal of the Institute of Electronics and Information Engineers
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    • v.50 no.1
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    • pp.131-136
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    • 2013
  • TSV based 3D ICs have been widely developed with new problems at die and IC levels. It is imperative to test at post-bond as well as pre-bond to achieve high reliability and yield. This paper introduces a new testable design technique which not only test microscopic defects at TSV input/output contact at a die but also test interconnect defects at a stacked IC. IEEE 1500 wrapper cells are augmented and through at-speed tests for pre-bond die and post-bond IC, known-good-die and defect free 3D IC can be massively manufactured+.

Micro-Raman Spectroscopy and Cathodoluminescence Study of Cross-section of Diamond Film

  • Wang, Chun-Lei;Akimitsu Hatta;Jaihyung Won;Jaihyung Won;Nan Jinang;Toshimichi Ito;Takatomo Sasaki;Akio Hiraki;Zengsun Jin
    • The Korean Journal of Ceramics
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    • v.3 no.1
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    • pp.1-4
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    • 1997
  • Diamond film (24$\mu\textrm{m}$) were prepared by Microwave Plasma Chemical Vapor Deposition method from a reactive CO/H$_2$ mixtures. Micro-Raman spectroscopy and micro-cathodoluminescence study were carried out along the crosssection and correlated to SEM observation. CL image of cross-section was also investigated. Peak position, FWHM of Raman spectrum were determined using Lorentzing fit. The stress in this sample is 0.4~0.7 GPa compressive stress, and along the distance the compressive stress reduced. The Raman peak broadening is dominated by phonon life time reduction at grain boundaries and defect sites. Defects and impurities were mainly present inside the film, not at Silicon/Diamond interface.

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The Effect of Velocity Control Method on the Part Characteristic in Semi-Solid Die Casting (반용융 다이캐스팅 공정에 있어서 속도제어방법이 제품의 특성에 미치는 영향)

  • Seo, Pan-Ki;Kang, Chung-Gil;Son, Young-Ik
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.26 no.10
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    • pp.2034-2043
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    • 2002
  • The process design to produce a near net shape home-appliance compressor component using semi-solid die casting process is performed. In order to obtain a good component without defects such as liquid segregation and porosity, the relationship between pressure and time, and plunger tip displacement and injection velocity are proposed with repeated trial and error. The effect of the velocity variation in the process parameters on liquid segregation and extraction is investigated to produce the aluminum frame part(a kind of compressor part) with good mechanical properties. The mechanical characteristic of semi-solid die casting formed parts for AlSi7Mg0.65r(A357) and AlSi17Cu4Mg(A390) are investigated with a view to minimizing the occurrence of defects. To investigate of application possibility at industry field, A380 aluminum alloy with 8∼9% silicon contents used for the squeeze casting process. The obtained mechanical properties is compared with semi-solid die casting.

Electrical characteristics and deep-level transient spectroscopy of a fast-neutron-irradiated 4H-SiC Schottky barrier diode

  • Junesic Park;Byung-Gun Park;Hani Baek;Gwang-Min Sun
    • Nuclear Engineering and Technology
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    • v.55 no.1
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    • pp.201-208
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    • 2023
  • The dependence of the electrical characteristics on the fast neutron fluence of an epitaxial 4H-SiC Schottky barrier diode (SBD) was investigated. The 30 MeV cyclotron was used for fast neutron irradiation. The neutron fluences evaluated through Monte Carlo simulation were in the 2.7 × 1011 to 1.45 × 1013 neutrons/cm2 range. Current-voltage and capacitance-voltage measurements were performed to characterize the samples by extracting the parameters of the irradiated SBDs. Neutron-induced defects in the epitaxial layer were identified and quantified using a deep-level transient spectroscopy measurement system developed at the Korea Atomic Energy Research Institute. As the neutron fluence increased from 2.7 × 1011 to 1.45 × 1013 neutrons/cm2, the concentration of the Z1/2 defects increased by approximately 20 times. The maximum defect concentration was estimated as 1.5 × 1014 cm-3 at a neutron fluence of 1.45 × 1013 neutrons/cm2.

Wire Electric Discharge Machining Process of Various Crystalline Silicon Wafers (다양한 실리콘 웨이퍼 제조를 위한 와이어 전기 방전가공)

  • Moon, Hee-chan;Choi, Sun-ho;Park, Sung-hee;Jang, Bo-yun;Kim, Jun-soo;Han, Moon-hee
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.5
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    • pp.301-306
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    • 2017
  • Wire electrical discharge machining (WEDM) process was evaluated to slice Silicon (Si) for various applications. Specifically, various Si workpieces with various resistances, such as single and multi crystalline Si bricks and wafers were used. As conventional slicing processes, such as slurry-on or diamond-on wire slicing, are based on mechanical abrasions between Si and abrasive, there is a limitation to decrease the wafer thickness as well as kerf-loss. Especially, when the wafer thickness is less than $150{\mu}m$, wafer breakage increases dramatically during the slicing process. Single crystalline P-type Si bricks and wafers were successively sliced with considerable slicing speed regardless of its growth direction. Also, typical defects, such as microcracks, craters, microholes, and debris, were introduced when Si was sliced by electrical discharge. Also, it was found that defect type is also dependent on resistance of Si. Consequently, this study confirmed the feasibility of slicing single crystalline Si by WEDM.