• Title/Summary/Keyword: sheet deposition

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Dependance of the Process Parameters on the Characteristic of the ITO Thin Films (ITO 박막의 공정변수에 따른 특성 연구)

  • 김소라;서정은;김상호
    • Journal of the Korean institute of surface engineering
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    • v.37 no.3
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    • pp.158-163
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    • 2004
  • ITO thin film was deposited on the glass by RF magnetron sputtering. Dependance of the process parameters such as thickness, target-to-substrate distance, substrate temperature and oxygen partial pressure on the transmittance and electrical resistance of ITO film were investigated. The deposition conditions for getting better optical and electrical ITO characteristics were the 1800-$2300\AA$ thickness, 65mm substrate-to-target distance, $350^{\circ}C$ substrate temperature and 8% oxygen partial pressure. At these conditions, the transmittance and sheet resistance of the ITO film were 83.3% and 77.86Ω/$\square$, respectively.

Layer Generation for Hybrid Rapid Prototyping System Using Machining and Deposition (절삭과 적층을 복합적으로 수행하는 하이브리드방식 쾌속시작시스템을 위한 층분할)

  • Lee K.W.;Kang J.G.;Zhu H.
    • Korean Journal of Computational Design and Engineering
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    • v.10 no.6
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    • pp.421-431
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    • 2005
  • This paper introduces a new approach for saving build time of hybrid rapid prototyping by decomposing a part into minimum number of layers. In the hybrid rapid prototyping, a part of a complicated shape is realized by adding layers of a simpler shape, each of which is obtained by machining a sheet of constant thickness from its top and bottom surfaces. Thus it is desired to decompose a given part into the minimum number of layers while guaranteeing each layer to be fabricated from the given sheets using a 3-axis milling machine. To satisfy these requirements, a concave edge-based algorithm is proposed to decompose a part into layers by considering the tool accessibility, the total number of layers, and the allowable sheet thickness.

Analysis of Stacked and Multi-layer Graphene fot the Fabrication of LEDs

  • Kim, Gi-Yeong;Min, Jeong-Hong;Jang, So-Yeong;Lee, Jun-Yeop;Park, Mun-Do;Kim, Seung-Hwan;Jeon, Seong-Ran;Song, Yeong-Ho;Lee, Dong-Seon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.433.1-433.1
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    • 2014
  • The research of graphene, a monolayer of carbon atoms with honeycomb lattice structure, has explosively increased after appeared in 2004. As a result, its high transmittance, mobility, thermal conductivity, and outstanding mechanical and chemical stability have been proved. Especially, many researches were executed about the field of transparent electrode highlighting material of substituting the indium tin oxide (ITO). In addition, qualitative and quantitative improvements have been achieved due to many synthesis methods were discovered. Among them, mostly used method is chemical vapour deposition of graphene grown on copper or nickel. The transmittance, mobility, sheet resistance, and other many properties are completely changed according to these two types of synthesis method of graphene. In this research, considering the difference of characteristics as the synthesis method of graphene, what types of graphene should be used and how to use it were studied. The stacked graphene harvested on copper and multi-layer graphene harvested on nickel were compared and analyzed, as a result, the transmittance of 90% and the sheet resistance of $70{\Omega}{\square}$ was showed even though stacked graphene layers were 4 layers. The reason that could bring these results is lowered sheet resistance due to stacked monolayer graphenes. Moreover, light output power of the three stacked graphene spreading layer shows the highest value, but light-emitting diode with multi-layer graphene died out from 12mA due to also its high sheet resistance. Therefore, we need to clarify about what types of graphene and how to use the graphene in use.

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Effect of deposition parameters on structure of ZnO films deposited by an DC Arc Plasmatron

  • Penkov, Oleksiy V.;Chun, Se-Min;Kang, In-Jae;Lee, Heon-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.255-255
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    • 2011
  • Zinc oxide based thin films have been extensively studied in recent several years because they have very interesting properties and zinc oxide is non-poisonous, abundant and cheap material. ZnO films are employed in different applications like transparent conductive layers in solar cells, protective coatings and so on. Wide industrial application of the ZnO films requires of development of cheap, effective and scalable technology. Typically used technologies don't completely satisfy the industrial requirements. In the present work, we studied effect of the deposition parameters on the structure and properties of ZnO films deposited by DC arc plasmatron. The varied parameters were gas flow rates, precursor composition, substrate temperature and post-deposition annealing temperature. Vapor of Zinc acetylacetone was used as source materials, oxygen was used as working gas and argon was used as the cathode protective gas and a transport gas for the vapor. The plasmatron power was varied in the range of 700-1500 watts. Flow rate of the gases and substrate temperature rate were varied in the wide range to optimize the properties of the deposited coatings. After deposition films were annealed in the hydrogen atmosphere in the wide range of temperatures. Structure of coatings was investigated using XRD and SEM. Chemical composition was analyzed using x-ray photoelectron spectroscopy. Sheet conductivity was measured by 4-point probe method. Optical properties of the transparent ZnO-based coatings were studied by the spectroscopy. It was shown that deposition by a DC Arc plasmatron can be used for low-cost production of zinc oxide films with good optical and electrical properties. Increasing of the oxygen content in the gas mixture during deposition allow to obtain high-resistive protective and insulation coatings with high adhesion to the metallic surface.

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On Feasibility Study of the Charged Particle Beam Pretreatment Process for Non-conducting Metal Coating (무전도 금속 증착을 위한 하전 입자빔 전처리 공정의 타당성 연구)

  • Na, Myung Hwan;Park, Young Sik;Shim, Ha-Mong;Chun, Young Ho
    • Journal of Korean Society for Quality Management
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    • v.42 no.2
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    • pp.179-187
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    • 2014
  • Purpose: Since several problems were found when present non-conducting metal coating process was applied to mass production, we study and develop to improve those problems. Methods: In this paper, a couple of analysis methods such as surface hardness, XPS spectrum analysis, morphology, and reflection ratio were used. Results: This paper suggest a new possibility of Non-conducting thin metal coating method that has quality of mass production phase without UV coating process. Conclusion: By the result of analysis, we can set optimized process conditions of the electro deposition coating using electron beam.

Spray and Atomization Technologies in Pesticides Application: A Review

  • No, Soo-Young
    • Journal of ILASS-Korea
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    • v.6 no.4
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    • pp.1-13
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    • 2001
  • In the pesticides sprays, spray and atomization technologies to increase the deposition and reduce the drift are briefly reviewed. Further research is needed to deduce a measure of drift risk in sprays with different structures, velocity profiles. For flat fan nozzles, the data of breakup length and thickness of liquid sheet are essential to understand the atomization processes and develop the transport model to target. In the air-assisted spray technology to reduce drift, further works on the effect of application height on drift and air assistance on droplet size should be followed. In addition, methods for quantifying included air in the air inclusion techniques are required. A few researches on the droplet size of fallout can be found in the literature. A combined technology with electrostatic method into one of method for the reduction of drift may be an effective strategy for increasing deposition and reducing drift.

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Figure of Merit for Deposition Conditions in ITO Films

  • Kim, H.H.;Cho, M.J.;Park, W.J.;Lee, J.G.;Lim, K.J.
    • Transactions on Electrical and Electronic Materials
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    • v.3 no.2
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    • pp.6-9
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    • 2002
  • Indium tin oxide (ITO) films were deposited on unheated PET substrates by DC reactive magnetron sputtering of In-Sn (90-10 wt%) metallic alloy target. Electrical and optical properties of as-deposited films were systematically studied by control of the deposition parameters such as working pressure, DC power, and oxygen partial pressure. The figures of merit are important factors that summarize briefly the relationship between electrical and optical properties of transparent conducting films. The formulae of T/R$\_$sh/ and T$\^$10// R$\_$sh/ are expressed as a function of transmittance and sheet resistance. The best values of those figures of merit were approximately 38.6 and 8.95 ($\times$10$\^$-3/Ω$\^$-1/), respectively.

Coating effects of carbon nanotubes on metal meshes with various line-spaces and line-widths (다양한 선폭 및 선 간격을 갖는 금속 메쉬에 대한 탄소 나노튜브의 코팅 효과)

  • Hwang, Young-Jin;Kim, Bu-jong;Park, Jong-seol;Park, Jin-Seok
    • Proceedings of the KIEE Conference
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    • 2015.07a
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    • pp.1147-1148
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    • 2015
  • This study demonstrates the coating effect of carbon nanotubes on metal meshes, which have been made with various line-spaces and line-width, for touch screen panels. The CNTs have been deposited on metal meshes via electrophoretic deposition (EPD). The sheet resistances, visible transmittances, visible reflectances have been measured before and after electrophoretic deposition. The experimental results confirm that CNT coating metal meshes with various line-spaces and line width can satisfy the requirements that are required for transparent electrodes of touch screen panels.

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Control of Deposition Parameters in ITO Films: Figure of Merit

  • Kim, H.H.;Park, C.H.;Cho, M.J.;Lim, K.J.;Shin, J.H.;Park, K.J.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.398-401
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    • 2001
  • Indium tin oxide films were deposited on unheated PET substrates by DC reactive magnetron sputtering of In-Sn (90-10 wt%) metallic alloy target. Electrical and optical properties of as-deposited films were systematically studied by control of the deposition parameters such as working pressure, DC power, and oxygen partial pressure. The figures of merit are important factors that summarize briefly the relationship between electrical and optical properties of transparent conducting films. The formulae of $T/R_{sh}$ and $T^{10}/R_{sh}$ are expressed as a function of transmittance and sheet resistance. The best values of those figures of merit were approximately 38.6 and $8.95({\times}10^{-3}\Omega^{-1})$ respectively.

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Reliability Improvement of Thin Oxide by Double Deposition of Silicon (실리콘의 이중증착에 의한 산화막 신뢰성 향상)

  • 박진성;양권승
    • Journal of the Korean Ceramic Society
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    • v.31 no.1
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    • pp.74-78
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    • 1994
  • Degradation of thin oxide by doped poly-Si and its improvement were studied. The gate oxide can be degraded by phosphorous in poly-Si doped POCl3. The degradation is increased with the decrement of sheet resistance and poly-Si thickness. Oxide failures of amorphous-Si are higher than those of poly-Si. In-situ double deposition of amorphous-Si, 54$0^{\circ}C$/30 nm, and poly-Si, 6$25^{\circ}C$/220 nm, forms the mismatch structure of grain boundary between amorphous-Si and poly-Si, and suppresses the excess phosphorous on oxide surface by the mismatch structure. The control of phosphorous through grain boundary improves the oxide reliability.

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