• 제목/요약/키워드: selective patterning

검색결과 78건 처리시간 0.028초

Integration of solution-processed polymer thin-film transistors for reflective liquid crystal applications

  • Kim, Sung-Jin;Kim, Min-Hoi;Suh, Min-Chul;Mo, Yeon-Gon;Chang, Seung-Wook;Lee, Sin-Doo
    • Journal of Information Display
    • /
    • 제12권4호
    • /
    • pp.205-208
    • /
    • 2011
  • Herein, the integration of solution-processed polymer thin-film transistors (TFTs) that were fabricated using selective wettability through ultraviolet (UV) exposure into a reflective liquid crystal display is demonstrated. From the experimental results of energy-dispersive spectroscopy, the composition of carbon and fluorine enhancing the hydrophobicity in the polymer chains was found to play a critical role in the wetting selectivity upon UV exposure. The polymer TFTs fabricated through the wettability-patterning process exhibited long-term stability and reliability. This wetting-selectivity-based patterning technique will be useful for constructing different types of solution-processed electronic and optoelectronic devices.

구리 나노 입자에 산-보조 레이저 공정을 적용한 구리 전극 제작 공정 개발 및 투명·유연 전극으로 활용 (Cu Electrode Fabrication by Acid-assisted Laser Processing of Cu Nanoparticles and Application with Transparent·Flexible Electrode)

  • 조현민;권진형;하인호;고승환
    • 한국표면공학회:학술대회논문집
    • /
    • 한국표면공학회 2018년도 춘계학술대회 논문집
    • /
    • pp.121-121
    • /
    • 2018
  • Copper is a promising electronic material due to low cost and high electrical conductivity. However, the oxidation problem in an ambient condition makes a crucial issue in practical applications. In here, we developed a simple and cost-effective Cu patterning method on a flexible PET film by combining a solution processable Cu nanoparticle patterning and a low temperature post-processing using acetic acid treatment, laser sintering process and acid-assisted laser sintering process. Acid-assisted laser sintering processed Cu electrode showed superior characteristics in electrical, mechanical and chemical stability over other post-processing methods. Finally, the Cu electrode was applied to the flexible electronics applications such as flexible and transparent heaters and touch screen panels.

  • PDF

Patterning of liquid crystal alignment layers using selective dewetting process in a thermoplastic polymer film

  • Kim, Hak-Rin;Shin, Min-Soo;Lee, You-Jin;Kim, Jae-Hoon
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
    • /
    • pp.1719-1722
    • /
    • 2006
  • We proposed a soft-lithographic method for aligning a liquid crystal (LC) in patterned azimuthal orientations. It is demonstrated that a thermoplastic polystyrene layer is patterned from a thermally stable polyimide layer via pressure-assisted capillary force lithography, which provides multidirectional LC alignment condition simply followed by a unidirectional rubbing process.

  • PDF

Fuzzy-based Field-programmable Gate Array Implementation of a Power Quality Enhancement Strategy for ac-ac Converters

  • Radhakrishnan, N.;Ramaswamy, M.
    • Journal of Electrical Engineering and Technology
    • /
    • 제6권2호
    • /
    • pp.233-238
    • /
    • 2011
  • In the present work, a new approach is proposed for via interconnects of semiconductor devices, where multi-wall carbon nanotubes (MWCNTs) are used instead of conventional metals. In order to implement a selective growth of carbon nanotubes (CNTs) for via interconnect, the buried catalyst method is selected which is the most compatible with semiconductor processes. The cobalt catalyst for CNT growth is pre-deposited before via hole patterning, and to achieve the via etch stop on the thin catalyst layer (ca. 3nm), a novel 2-step etch scheme is designed; the first step is a conventional oxide etch while the second step chemically etches the silicon nitride layer to lower the damage of the catalyst layer. The results show that the 2-step etch scheme is a feasible candidate for the realization of CNT interconnects in conventional semiconductor devices.

마스크에 대한 기계적 가공을 이용한 단결정 실리콘의 미세 패턴 가공 (Selective Removal of Mask by Mechanical Cutting for Micro-patterning of Silicon)

  • 진원혁;김대은
    • 한국정밀공학회지
    • /
    • 제16권2호통권95호
    • /
    • pp.60-67
    • /
    • 1999
  • Micro-fabrication techniques such as lithography and LIGA processes usually require large investment and are suitable for mass production. Therefore, there is a need for a new micro-fabrication technique that is flexible and more cost effective. In this paper a novel, economical and flexible method of producing micro-pattern on silicon wafer is presented. This method relies on selective removal of mask by mechanical cutting. Then micro-pattern is produced by chemical etching. V-shaped grooved of about 3 ${\mu}m$ wide and 2 ${\mu}m$ deep has been made on ${SiO_2}m$ coated silicon wafer with this method. This method may be utilized for making microstructures in MEMS application at low cost.

  • PDF

Chemical Solution Deposition of PZT/Oxide Electrode Thin Film Capacitors and Their Micro-patterning by using SAM

  • Suzuki, Hisao
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
    • /
    • pp.907-912
    • /
    • 2005
  • Micro-patterns of $Pb(Zr_{0.53}Ti_{0.47})O_3$, PZT, thin films with a MPB composition were deposited on $Pt/Ti/SiO_2/Si$ substrate from molecular-designed PZT precursor solution by using self-assembledmonolayer(SAM) as a template. This method includes deposition of SAM followed by the optical etching by exposing the SAM to the UV-light, leading to the patterned SAM as a selective deposition template. The pattern of SAM was formed by irradiating UV-light to the SAM on a substrate and/or patterned PZT thin film through a metal mask for the selective deposition of patterned PZT or lanthanum nickel oxide (LNO) precursor films from alkoxide-based precursor solutions. As a result, patterned ferroelectric PZT and PZT/LNO thin film capacitors with good electrical properties in micrometer size could be successfully deposited.

  • PDF

Fabrication of Poly(diallyldimethylammonium chloride) - Patterned Substrates for Patterning of Single Strand DNA Using Ion Implantation

  • Ahn, Mi-Young;Hwang, In-Tae;Jung, Chan-Hee;Choi, Jae-Hak;Nho, Young-Chang
    • 방사선산업학회지
    • /
    • 제5권3호
    • /
    • pp.243-247
    • /
    • 2011
  • In this study, a convenient method for the selective immobilization of single strand DNA (ssDNA) on a polymer surface was described. A positively charged polyelectrolyte, poly(diallyldimethylammonium chloride) (PDDA), was spin-coated on a tissue culture petridish and the micropatterns of the PDDA were formed by selective ion implantation through a pattern mask. The surface property of the implanted PDDA was investigated by using a surface profiler and FT-IR spectrometer. Cy3-labeled ssDNA was selectively immobilized on the PDDA patterns through ionic interaction and thus, well-defined ssDNA patterns were obtained.

태양전지 2 단계 전극형성 공정을 위한 마스크 패턴공정 및 효율에 대한 영향성 연구 (Mask Patterning for Two-Step Metallization Processes of a Solar Cell and Its Impact on Solar Cell Efficiency)

  • 이창준;신동윤
    • 대한기계학회논문집B
    • /
    • 제36권11호
    • /
    • pp.1135-1140
    • /
    • 2012
  • 마스크를 이용하여 니켈 시드층의 형성 후 실버 도금을 통해 태양전지 상부전극을 형성하는 2 단계 전극형성 공정이 태양전지의 고효율화 방안으로 제안되었다. 본 연구에서는, 자외선 경화형 혹은 상변화 잉크를 고비용의 인쇄공정을 통해 마스크를 형성하는 방법을 대신하여, 코팅과 레이저의 복합공정을 통해 마스크를 형성하는 방법에 대해 제안하도록 한다. 마스크를 형성하는 물질로서 저비용의 저융점 왁스 혹은 플루오르카본 용액을 태양전지 웨이퍼 상에 코팅 후 레이저로 선택적으로 제거하여 전극패턴을 형성하였으며, 플루오르카본 용액 코팅이 왁스 코팅보다 패턴 균일도 측면에서 우수할 뿐만 아니라 통계적으로 0.16% 태양전지 효율증대를 유발한다는 점이 발견되었다.