Acknowledgement
Supported by : National Research Foundation
Journal of Radiation Industry (방사선산업학회지)
- Volume 5 Issue 3
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- Pages.243-247
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- 2011
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- 1976-2402(pISSN)
Fabrication of Poly(diallyldimethylammonium chloride) - Patterned Substrates for Patterning of Single Strand DNA Using Ion Implantation
- Ahn, Mi-Young (Advanced Radiation Technology Institute, Korea Atomic Energy Research Institute) ;
- Hwang, In-Tae (Advanced Radiation Technology Institute, Korea Atomic Energy Research Institute) ;
- Jung, Chan-Hee (Advanced Radiation Technology Institute, Korea Atomic Energy Research Institute) ;
- Choi, Jae-Hak (Advanced Radiation Technology Institute, Korea Atomic Energy Research Institute) ;
- Nho, Young-Chang (Advanced Radiation Technology Institute, Korea Atomic Energy Research Institute)
- Received : 2011.08.26
- Accepted : 2011.09.09
- Published : 2011.09.30
Abstract
In this study, a convenient method for the selective immobilization of single strand DNA (ssDNA) on a polymer surface was described. A positively charged polyelectrolyte, poly(diallyldimethylammonium chloride) (PDDA), was spin-coated on a tissue culture petridish and the micropatterns of the PDDA were formed by selective ion implantation through a pattern mask. The surface property of the implanted PDDA was investigated by using a surface profiler and FT-IR spectrometer. Cy3-labeled ssDNA was selectively immobilized on the PDDA patterns through ionic interaction and thus, well-defined ssDNA patterns were obtained.
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