• 전기의세계
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• v.24 no.6
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• pp.35-38
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• 1975

금속과 원소반도체의 접촉으로 이루어진 점접촉트란지스터를 출발점으로 한 P-N접합트란지스터는 4반세기동안 반도체전자 소자의 중심이었다. 이와 같은 반도체소자는 단결정반도체의 특성을 이용한 것으로 그 제작에 있어 거의 완전에 가까운 결정구조와 극도의 화학적순수성이 요구되는 것이다. 이와 같은 요구조건은 접합형 반도체소자제작에 큰 제한을 주게 된다. Gunn Diode, Impatt Diode등으로 반도체소자는 Bulk형식의 것이 각광을 받게 되었으며 MOS형식의 FET에 이르러 신기원을 이루게 되었다. 이리하여 MOS기술은 Sapphire기반을 도입함으로써 SOS기법으로 발전을 거듭하게 되었다. 그러나 정질반도체의 이용이라는 근본적 개념에서는 이탈치못하고 있다. 이상과 같은 정질반도체소자에 대응하여 반대적 입장에서 불순물농도의 영향이 적은 비정질반도체의 연구가 70년이후 미국을 중심으로 활발하게 전개되고 있다. 그 연구 및 개발결과는 2년마다 이루어지는 액체비정질반도체국제회의에서 종합되고 있다. 이 분야에서의 연구는 1968년 Ovshinsky가 비산화물 Chalcogenide glass 비정질박막에서의 빠른 응답속도의 양극대칭성 Switching 현상 발견을 계기로 신국면을 개척하게 된 것이다. 이들 비정질반도체에 대한 물성론적 흥미와 응용면에 관한 기대로부터 전도기구의 해명과 응용회로의 개발연구가 급속히 진전되고 있다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.135-138
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• 2001

We report the structural ,optical and electrical properties of ZnO thin films depending on the variation of the film thickness. The properties of the films deposited on sapphire (001) substrates using a pulsed laser deposition technique (PLD) were characterized with XRD, hall measurement and photoluminescence (PL). In our study, the increase of the thickness of ZnO thin films shows the improvement of the structural and optical properties. The electric properties of the films were also well matched with the structural and optical properties

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.574-577
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• 2001

GaN thin films on sapphire were grown by rf magnetron sputtering with ZnO buffer layer. The dependence of GaN film quality on ZnO buffer layer was investigated by X-ray diffraction(XRD). The improved film quality has been obtained by using thin ZnO buffer layer. Using Auger electron spectroscopy(AES), it was observed that the annealing process improved the GaN film quality. The surface roughness according to the annealing temperatures(700, 900, 1100$^{\circ}C$) were investigated by AFM(atomic force microscopy) and it was confirmed that the crystallization was improved by increasing the annealing temperature. Photoluminescence at 8K shows a near-band-edge peak at 3.2eV with no deep level emission.

• Proceedings of the KIEE Conference
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• 2001.07b
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• pp.760-761
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• 2001

We have studied quench characteristics for current limiting elements of YBCO films in applied fields of 0 - 130 mT. The films were deposited on sapphire substrates and covered by gold top layer. The current limiting element consists of 2 mm wide YBCO stripes connected in series. The electric field - current density (E-J) measurements showed that the presence of applied magnetic fields induces uniform quench distribution for the stripes, otherwise non-uniform quenches were observed. We suggest that suppressing the critical current by increased fields due to fault current effectively forced the stripes of higher Jc(0) to quench, resulting in equalizing quench times.

• Journal of the Semiconductor & Display Technology
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• v.5 no.2 s.15
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• pp.1-5
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• 2006

The GaN thin film on the 8 periods InGaN/GaN multi-quantum well structure was grown on the sapphire substrate using metal-organic chemical vapor deposition. The nano-scaled triangular-lattice holes with the diameter of 150 nm were patterned on a polymethylmethacrylate blocking film using an electron beam nano-lithography system. The thin slab and two-dimensional photonic crystals with the thickness of 28 nm were fabricated on the GaN layer for the blue light diffraction sources. The photonic crystal with the lattice parameter of 460 nm enhances spectral intensity of photoluminescence indicating that the photonic crystals provides the source of nano-diffraction for the blue light of the 450-nm wavelength.

• The Journal of Information Systems
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• v.20 no.3
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• pp.111-127
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• 2011

This study is intended for international cooperation in the field of LED were analyzed. The results, LED wide coverage areas, and a promising future is expected to grow fast enough to occupancy for a major national technology is a competitive situation. Chip Scale Package, including our country, such as LED manufacturing technology that might be competitive in parts, but new technologies such as renal substrate R&D and technology development still active preemption is not the situation. Renal substrate, particularly, large-diameter sapphire, large size/large LED manufacturers, such as a promising area for future research and development support will be needed. To do this, previous research in this area and the U.S., Japan cooperation in such studies also will need to expand. Bibliometrics way through this study, analytical techniques and analytical tools used in the integrated analysis of the usefulness and necessity of the system development were found.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.11 no.3
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• pp.106-111
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• 2001

The freestanding GaN substrates were grown by hydride vapor phase epitaxy (HVPE) on (0001) sapphire substrate and prepared by using laser induced lift-off. After a mechanical polishing on both Ga and N-surfaces of GaN films with 100$\mu\textrm{m}$ thick, their polarities have been investigated by using chemical etching in phosphoric acid solution, 3 dimensional surface profiler and Auger electron spectroscopy (AES). The composition of the GaN film measured by AES indicted that Ga and N terminated surfaces have the different N/Ga peak ratio of 0.74 and 0.97, respectively. Ga-face and N-face of GaN revealed quite different chemical properties: the polar surfaces corresponding to (0001) plane are resistant to a phosphoric acid etching whereas N-polar surfaces corresponding to(0001) are chemically active.

• Proceedings of the Korea Association of Crystal Growth Conference
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• 1998.06a
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• pp.77-79
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• 1998

Metallic chromium was diffused in the{0001},{1120} white sapphires which were grown by the Verneuil method to enhance the physical properties of the sapphires. Chromium metal vapour pressure and {{{{ { N}_{2 } }}}} pressure were kept by {{{{ { 1$\times$10}^{-4 } }}}} torr at 21 50 $^{\circ}C$ and 6 atm in the quartz-tube, respectively. The color do the Cr-doped sapphires was changed to light red. Chromium was diffused faster in the {1120} than 수 the {0001} plane. It was speculated that the planar density was one the factors determining diffusion coeffcient

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.1145-1148
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• 2008

The present status and trend of oxide phosphor thin-film development for thin-film electroluminescent (TFEL) device application are presented in this paper. Recently, several newly developed types of bendable or bendable see-through oxide TFEL lamps have been fabricated using the TFEL technology with a newly developed bendable ceramic sheet, glass sheet or sapphire sheet substrate, which has become available on the market. Stable operation at high temperatures was obtained in double-insulating-layer-type TFEL lamps fabricated with a $Zn_2Si_{0.6}Ge_{0.}4O_4$:Mn thin-film emitting layer forming on translucent or transparent bendable sheet substrates.

• Proceedings of the Korea Association of Crystal Growth Conference
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• 1999.06a
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• pp.403-418
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• 1999

Fiber growth of Al2O3/R-Al-O(R=Y, Gd, Dy, Ho, Er) eutectic by the micro-pulling down methods is described. The thermal stability and strength at elevated temperature of each material is evaluated in relation to the microstructure. PACS: 81.05 Mh, 81.10 Fq, 81.30-t.