• Title/Summary/Keyword: reverse bias

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Twin Target Sputtering System with Ladder Type Magnet Array for Direct Al Cathode Sputtering on Organic Light Emitting Diodes

  • Moon, Jong-Min;Kim, Han-Ki
    • Journal of Information Display
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    • v.8 no.3
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    • pp.5-10
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    • 2007
  • Twin target sputtering (TTS) system with a configuration of vertically parallel facing Al targets and a substrate holder perpendicular to the Al target plane has been designed to realize a direct Al cathode sputtering on organic light emitting diodes (OLEDs). The TTS system has a linear twin target gun with ladder type magnet array for effective and uniform confinement of high density plasma. It is shown that OLEDs with Al cathode deposited by the TTS show a relatvely lower leakage current density $({\sim}1{\times}10^{-5}mA/cm^2)$ at reverse bias of -6V, compared to that ($1{\times}10^{-2}{\sim}10^{-3}$ $mA/cm^2$ at -6V) of OLEDs with Al cathodes grown by conventional DC magnetron sputtering. In addition, it was found that Al cathode films prepared by TTS were amorphous structure with nanocrystallines due to low substrate temperature. This demonstrates that there is no plasma damage caused by the bombardment of energetic particles. This indicates that the TTS system with ladder type magnet array could be useful plasma damage free deposition technique for direct Al cathode sputtering on OLEDs or flexible OLEDs.

The Fabrication and Characteristics of ITO Thin Films and ITO/p-InP Solar Cells (ITO박막과 ITO/p-InP 태양전지의 제작 및 특성)

  • 맹경호;문동찬;송복식;김선태
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1992.05a
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    • pp.105-109
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    • 1992
  • ITO film, 1500${\AA}$ of thickness, onto glass and p-InP wafer was prepared by e-beam evaporator. The bet ITO film had the resistivity 5.3${\times}$10$\^$-3/ $\Omega$-cm, the concentration 6.5${\times}$10$\^$20/cm$\^$-3/, the transmittance above 80%, and the optical energy gap about 3.5eV. The higher pressure of injected oxygen, the less reverse bias saturation current and the more open circuit voltage. Under the optimum evaporation conditions, the efficiency was 7.19% and the series resistance, and the shunt resistance were respectively 8.5%, 3${\alpha}$, and 26K$\Omega$. The interdependence between activation energy and pre-exponential factor was found. We found he surface of the p-InP became n-type and consquently supposed that the buried homojunction formation, that is, n+-ITO/n-InP/p-InP was caused by Sn diffusion or loss of phosphorus in the interface layer.

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옥외 태양광 발전 시스템의 Potential Induced Degradation 진단 및 야간 역전압 회복 연구

  • Choe, Hun-Ju;Kim, Gwang-Hyeon;Jang, Dong-Sik;Bae, Su-Hyeon;Park, No-Chang;O, Won-Uk
    • Bulletin of the Korea Photovoltaic Society
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    • v.3 no.2
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    • pp.42-47
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    • 2017
  • The potential induced degradation (PID) phenomenon shows severe power loss within several years from the initial installation of solar power system. The accumulated power loss by PID is inevitable because the PID is suspected only if the power loss exceeds several percent. In this paper, we analyzed the cases of PID diagnosis and recovery by visiting the suspected PID site about 17 months after the installation of the 100kW PV system. The power difference of the two 50kW inverters was more than 20kWh, and the PR difference was more than 8%. From the beginning of the installation, the difference in power gradually increased. The recovery was observed for about 7 months by applying 1000V in the reverse bias at night. As a result, the power difference of the two inverters was recovered to within 2kWh. In the case of a power station suffering from PID in the field, it will be helpful for stable development operation by quick diagnosis and problem solving.

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A Study on JFET and FLR Optimization for the Design and Fabrication of 3.3kV SiC MOSFET (3.3kV SiC MOSFET 설계 및 제작을 위한 JFET 및 FLR 최적화 연구)

  • YeHwan Kang;Hyunwoo Lee;Sang-Mo Koo
    • Journal of the Semiconductor & Display Technology
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    • v.22 no.3
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    • pp.155-160
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    • 2023
  • The potential performance benefits of Silicon Carbide(SiC) MOSFETs in high power, high frequency power switching applications have been well established over the past 20 years. In the past few years, SiC MOSFET offerings have been announced by suppliers as die, discrete, module and system level products. In high-voltage SiC vertical devices, major design concerns is the edge termination and cell pitch design Field Limiting Rings(FLR) based structures are commonly used in the edge termination approaches. This study presents a comprehensive analysis of the impact of variation of FLR and JFET region on the performance of a 3.3 kV SiC MOSFET during. The improvement in MOSFET reverse bias by optimizing the field ring design and its influence on the nominal operating performance is evaluated. And, manufacturability of the optimization of the JFET region of the SiC MOSFET was also examined by investigating full-map electrical characteristics.

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Dual-Band VCO using Composite Right/Left-Handed Transmission Line and Tunable Negative Resistanc based on Pin Diode (Composite Right/Left-Handed 전송 선로와 Pin Diode를 이용한 조절 가능한 부성 저항을 이용한 이중 대역 전압 제어 발진기)

  • Choi, Jae-Won;Seo, Chul-Hun
    • Journal of the Institute of Electronics Engineers of Korea TC
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    • v.44 no.12
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    • pp.16-21
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    • 2007
  • In this paper, the dual-band voltage-controled oscillator (VCO) using the composite right/left-handed (CRLH) transmission line (TL) and the tunable negative resistance based on the fin diode is presented. It is demonstrated that the CRLH TL can lead to metamaterial transmission line with the dual-band tuning capability. The dual-band operation of the CRLH TL is achieved by the frequency offset and the phase slope of the CRLH TL, and the frequency ratio of the two operating frequencies can be a non-integer. Each frequency band of VCO has to operate independently, so we have used the tunable negative resistance based on the pin diode. When the forward bias has been into the pin diode, the phase noise of VCO is $-108.34\sim-106.67$ dBc/Hz @ 100 kHz in the tuning range, $2.423\sim2.597$ GHz, whereas when the reverse bias has been fed into the pin diode, that of VCO is $-114.16\sim-113.33$ dBc/Hz @ 100 kHz in the tuning range, $5.137\sim5.354$ GHz.

Effects of Cognition Improvement Programs on Normal Elderly in Korea: A Systematic Review and Meta-Analysis (국내 노인의 인지기능 향상 프로그램의 효과연구: 체계적 문헌고찰과 메타분석)

  • Kim, Kyoungyun;Lee, Eunjoo
    • 한국노년학
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    • v.37 no.2
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    • pp.431-444
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    • 2017
  • This study identified effect size of cognition improvement programs developed for normal elderly in Korea. By searching four databases, 9,624 studies published from 2000 to 2016 were identified. Finally, 14 studies which satisfied the inclusion criteria were selected for meta-analysis. Quality assessment of included studies was conducted using controlled trial checklist of Scottish Intercollegiate Guidelines Network. R version 3.3.2 (2016-10-31) with "meta" and "metafor" package was used to calculate effect sizes, identify the reasons of heterogeneity, and check publication bias. Total effect size of cognition improvement program was middle (SMD=0.759, p<.001, $I^2=34%$). For heterogeneity, moderator analysis was executed and combined program with exercise had the largest effect size (SMD=1.231, p<.001, $I^2=40.8%$). Publication bias was exist by funnel plot and Egger 's regression test, but trim and fill analysis showed that there was no serious error to reverse study results. Therefore, Combined program with exercise for the normal elderly was expected to improve the cognitive function of the normal elderly.

Potential barrier height of Metal/SiC(4H) Schottky diode (Metal/SiC(4H) 쇼트키 다이오드의 포텐셜 장벽 높이)

  • 박국상;김정윤;이기암;남기석
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.8 no.4
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    • pp.640-644
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    • 1998
  • We have fabricated Sb/SiC(4H) Schottky barrier diode (SBD) of which characteristics compared with that of Ti/SiC(4H) SBD. The donor concentration of the n-type SiC(4H) obtained by capacitance-voltage (C-V) measurement was about $2.5{\times}10 ^{17}{\textrm}cm^{-3}$. The ideality factors of 1.31 was obtained from the slope of forward current-voltage (I-V) characteristics of Sb/SiC(4H) SBD at low current density. The breakdown field of Sb/SiC(4H) SBD under the reverse bias voltage was about $4.4{\times}10^2V$/cm. The built-in potential and the Schottky barrier height (SBH) of Sb/SiC(4H) SBD were 1.70V and 1.82V, respectively, which were determined by the analysis of C-V characteristics. The Sb/SiC(4H) SBH of 1.82V was higher than Ti/SiC(4H) SBH of 0.91V. However, the current density and reverse breakdown field of Sb/SiC(4H) were low as compared with those of Ti/SiC(4H). The Sb/SiC(4H), as well as the Ti/SiC(4H), can be utilized as the Shottky barrier contact for the high-power electronic device.

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Analysis of Mechanism for Photovoltaic Properties and Bypass Diode of Crystalline Silicon and CuInxGa(1-x)Se2 Module in Partial Shading Effect (결정질 실리콘 및 CuInxGa(1-x)Se2 모듈의 부분음영에 따른 태양전지 특성 변화 및 바이패스 다이오드의 작동 메커니즘 분석)

  • Lee, Ji Eun;Bae, Soohyun;Oh, Wonwook;Kang, Yoonmook;Kim, Donghwan;Lee, Hae-Seok
    • Korean Journal of Materials Research
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    • v.25 no.4
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    • pp.196-201
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    • 2015
  • This paper presents the impact of partial shading on $CuIn_xGa_{(1-x)}Se_2(CIGS)$ photovoltaic(PV) modules with bypass diodes. When the CIGS PV modules were partially shaded, the modules were under conditions of partial reverse bias. We investigated the characterization of the bypass diode and solar cell properties of the CIGS PV modules when these was partially shaded, comparing the results with those for a crystalline silicon module. In crystalline silicon modules, the bypass diode was operated at a partial shade modules of 1.67 % shading. This protected the crystalline silicon module from hot spot damage. In CIGS thin film modules, on the other hand, the bypass diode was not operated before 20 % shading. This caused damage because of hotspots, which occurred as wormlike defects in the CIGS thin film module. Moreover, the bypass diode adapted to the CIGS thin film module was operated fully at 60% shading, while the CIGS thin film module was not operated under these conditions. It is known that the bypass diode adapted to the CIGS thin film module operated more slowly than that of the crystalline silicon module; this bypass diode also failed to protect the module from damage. This was because of the reverse saturation current of the CIGS thin film, $1.99{\times}10^{-5}A/cm^2$, which was higher than that of crystalline silicon, $8.11{\times}10^{-7}A/cm^2$.

A Parametric Study of Pulsed Gamma-ray Detectors Based on Si Epi-Wafer (실리콘 에피-웨이퍼 기반의 펄스감마선 검출센서 최적화 연구)

  • Lee, Nam-Ho;Hwang, Young-Gwan;Jeong, Sang-Hun;Kim, Jong-Yeol;Cho, Young
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.18 no.7
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    • pp.1777-1783
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    • 2014
  • In this paper, we designed and fabricated a high-speed semiconductor sensor for use in power control devices and analyzed the characteristics with pulsed radiation tests. At first, radiation sensitive circular Si PIN diodes with various diameters(0.1 mm ~5.0 mm) were designed and fabricated using Si epitaxial wafer, which has a $42{\mu}m$ thick intrinsic layer. The reverse leakage current of the diode with a radius of 2 mm at a reverse bias of 30 V was about 20.4 nA. To investigate the characteristic responses of the developed diodes, the pulsed gamma-radiation tests were performed with the intensity of 4.88E8 rad(Si)/sec. From the test results showing that the output currents and the rising speeds have a linear relationship with the area of the sensors, we decided that the optimal condition took place at a 2 mm diameter. Next, for the selected 2 mm diodes, dose rate tests with a range of 2.47E8 rad(Si)/sec to 6.21E8 rad(Si)/sec were performed. From the results, which showed linear characteristics with the radiation intensity, a large amount of photocurrent over 60mA, and a high speed response under 350ns without saturation, we can conclude that the our developed PIN diode can be a good candidate for the sensor of power control devices.

Investigation of Structural and Optical Properties of III-Nitride LED grown on Patterned Substrate by MOCVD (Patterned substrate을 이용하여 MOCVD법으로 성장된 고효율 질화물 반도체의 광특성 및 구조 분석)

  • Kim, Sun-Woon;Kim, Je-Won
    • Korean Journal of Materials Research
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    • v.15 no.10
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    • pp.626-631
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    • 2005
  • GaN-related compound semiconductors were grown on the corrugated interface substrate using a metalorganic chemical vapor deposition system to increase the optical power of white LEDs. The patterning of substrate for enhancing the extraction efficiency was processed using an inductively coupled plasma reactive ion etching system and the surface morphology of the etched sapphire wafer and that of the non-etched surface were investigated using an atomic force microscope. The structural and optical properties of GaN grown on the corrugated interface substrate were characterized by a high-resolution x-ray diffraction, transmission electron microscopy, atomic force microscope and photoluminescence. The roughness of the etched sapphire wafer was higher than that of the non-etched one. The surface of III-nitride films grown on the hemispherically patterned wafer showed the nano-sized pin-holes that were not grown partially. In this case, the leakage current of the LED chip at the reverse bias was abruptly increased. The reason is that the hemispherically patterned region doesn't have (0001) plane that is favor for GaN growth. The lateral growth of the GaN layer grown on (0001) plane located in between the patterns was enhanced by raising the growth temperature ana lowering the reactor pressure resulting in the smooth surface over the patterned region. The crystal quality of GaN on the patterned substrate was also similar with that of GaN on the conventional substrate and no defect was detected in the interface. The optical power of the LED on the patterned substrate was $14\%$ higher than that on the conventional substrate due to the increased extraction efficiency.